초록 ▼

A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelleted CO.sub.2 cleaning process on the acid-washed component. The inventive method has bee

A method for cleaning ceramic workpieces such as SiC boats used in semiconductor fabrication is disclosed. The method comprises washing a virgin or used ceramic workpiece with a strong acid and then using a pelleted CO.sub.2 cleaning process on the acid-washed component. The inventive method has been found to produce a workpiece having a very low level of metallic and particulate contaminants on its surface.

대표청구항 ▼

[ We claim:] [1.]1. A process for cleaning a semiconductor processing component having an inorganic surface, the process comprising the steps of:a) exposing the inorganic surface to a solvent having at least 1 v/o of an acid selected from the group consisting of HF, acids having a pKa of less than a

[ We claim:] [1.]1. A process for cleaning a semiconductor processing component having an inorganic surface, the process comprising the steps of:a) exposing the inorganic surface to a solvent having at least 1 v/o of an acid selected from the group consisting of HF, acids having a pKa of less than about one, and mixtures thereof, andb) directing a flow of frozen CO.sub.2 pellets upon the surface, wherein after steps a) and b) are performed the inorganic surface has a metallic contaminant concentration of at most about 600 ppm, as measured by SIMS at a depth of about 10 nm.