$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Active pyrometry with emissivity extrapolation and compensation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01K-005/06
출원번호 US-0521113 (2000-03-07)
발명자 / 주소
  • Ish-Shalom Yaron,ILX
  • Baharav Yael
출원인 / 주소
  • C. I. Systems LTD, ILX
대리인 / 주소
    Friedman
인용정보 피인용 횟수 : 29  인용 특허 : 50

초록

A method and apparatus for active pyrometric measurement of the temperature of a body whose emissivity varies with wavelength. The emissivity is inferred from reflectivity measured at two wavelengths in an irradiation wavelength band and extrapolated to a wavelength in an emission wavelength band. T

대표청구항

[ What is claimed is:] [1.]1. A method for determining a temperature of a body that emits radiation at a plurality of wavelengths, the body having an emissivity that varies with wavelength, the body being located in an environment, the body having an absorption edge that depends on the environment,

이 특허에 인용된 특허 (50)

  1. Crowley John L. (Fremont CA) Kermani Ahmad (Sunnyvale CA) Lassig Stephan E. (Milpitas CA) Johnson Noel H. (San Jose CA) Rickords Gary R. (Fremont CA), Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal.
  2. Evans Dan (Kingston CAX) Fairlie Matthew J. (Kingston CAX) Kang Karam (Kingston CAX) Zouikin Serge (Kingston CAX), Apparatus and method for remote temperature measurement.
  3. Champetier Robert J. ; Egozi David,ILX, Apparatus for determining the temperature of a semi-transparent radiating body.
  4. Stein Alexander (Secaucus NJ), Apparatus for remote measurement of temperatures.
  5. Gat Arnon (Palo Alto CA) French Michael (San Jose CA), Bichannel radiation detection apparatus.
  6. Gat Arnon (Palo Alto CA) Mordo David (San Jose CA), Bichannel radiation detection method.
  7. O'Neill James Anthony ; Singh Jyothi, Combined emissivity and radiance measurement for determination of temperature of radiant object.
  8. O'Neill James Anthony ; Singh Jyothi, Combined emissivity and radiance measurement for the determination of the temperature of a radiant object.
  9. Cha Chang Y. (Bakersfield CA), Decreasing hydrocarbon, hydrogen and carbon monoxide concentration of a gas.
  10. Puram Chith K. (Yorktown VA) Daryabeigi Kamran (Virginia Beach VA) Wright Robert (Newport News VA) Alderfer David W. (Newport News VA), Directional emittance surface measurement system and process.
  11. Jensen Earl M., Electro-optical board assembly for measuring the temperature of an object surface from infra-red emissions thereof, inc.
  12. Nulman Jaim (Palo Alto CA) Bacile Nick J. (San Jose CA) Blonigan Wendell T. (Sunnyvale CA), Emissivity correction apparatus and method.
  13. Khan Mansoor A. (Grafton MA) Allemand Charly (Newtonville MA) Eagar Thomas W. (Belmont MA), Emissivity independent multiwavelength pyrometer.
  14. Nakos James S. (Essex VT) Bakeman ; Jr. Paul E. (South Burlington VT) Hallock Dale P. (Bristol VT) Lasky Jerome B. (Essex Junction VT) Pennington Scott L. (South Burlington VT), Emissivity independent temperature measurement systems.
  15. Crane Kenneth (New South Wales AUX) Beckwith Peter J. (Strathmore AUX), I. R. Radiation pyrometer.
  16. Stein Alexander (Secaucus NJ) Rabinowitz Paul (Old Bethpage NY) Kaldor Andrew (Watchung NJ), Laser radiometer.
  17. De Vries ; Martin ; Fitzgerald ; II ; Harold A. ; Nyhof ; Eldon J. ; VAN Putten ; Jr. ; James D., Light reflectivity and transmission testing apparatus and method.
  18. Patton Evan E. (Portland OR), Method and apparatus for active pyrometry.
  19. Maurer Michael,DEX ; Lerch Wilfried,DEX ; Gschwandtner Alexander,DEX, Method and apparatus for determining emissivity of semiconductor material.
  20. Yam Mark, Method and apparatus for infrared pyrometer calibration in a thermal processing system.
  21. Mock Kenneth John (Inglewood CA) Mozic Joseph Daniel (Playa Del Rey CA), Method and apparatus for measuring high energy laser beam power.
  22. Moslehi Mehrdad M. (Dallas TX), Method and apparatus for real-time wafer temperature measurement using infrared pyrometry in advanced lamp-heated rapid.
  23. Kirillov Dimitry M. (Redwood City CA) Powell Ronald A. (Redwood City CA), Method and apparatus for temperature measurements.
  24. Arima Jiro (Osaka JPX) Tsujimura Hiroji (Osaka JPX) Narita Tomonori (Tokyo JPX) Takebuchi Hiroki (Kawasaki JPX), Method for measuring surface temperature of semiconductor wafer substrate, and heat-treating apparatus.
  25. Yomoto Masahiko (Kawasaki JPX) Uehara Makoto (Tokyo JPX) Ichikawa Hajime (Yokohama JPX) Kato Shigeru (Hoya JPX), Method for measuring temperature of semiconductor substrate and apparatus therefor.
  26. Stein Alexander, Method for remotely measuring temperatures which utilizes a two wavelength radiometer and a computer.
  27. Adams Mark J. (Kennesaw GA) Crisman ; Jr. Elton M. (Blairsville GA), Method of and apparatus for detecting corrosion utilizing infrared analysis.
  28. Adams Mark J. (Kennesaw GA) Crisman ; Jr. Elton M. (St. Cloud FL) Khan Asrar A. (Marietta GA), Method of and apparatus for thermographic identification of parts.
  29. Moslehi Mehrdad M. (Dallas TX) Najm Habib N. (Dallas TX), Multi-point pyrometry with real-time surface emissivity compensation.
  30. Cabib Dario,ILX ; Buckwald Robert A.,ILX ; Adel Michael E.,ILX, Multipoint temperature monitoring apparatus for semiconductor wafers during processing.
  31. Ng Daniel L. P. (Shaker Heights OH), Multiwavelength pyrometer for gray and non-gray surfaces in the presence of interfering radiation.
  32. Schietinger Charles W. (Portland OR) Adams Bruce E. (Portland OR), Non-contact optical techniques for measuring surface conditions.
  33. Schietinger Charles W. (Portland OR) Adams Bruce E. (Portland OR), Non-contact optical techniques for measuring surface conditions.
  34. Schietinger Charles W. ; Adams Bruce E., Non-contact optical techniques for measuring surface conditions.
  35. Schietinger Charles W. (Portland OR) Adams Bruce E. (Portland OR), Non-contact techniques for measuring temperature of radiation-heated objects.
  36. Schietinger Charles W. (Portland OR) Adams Bruce E. (Portland OR), Non-contact techniques for measuring temperature or radiation-heated objects.
  37. Arima Jiro (Osaka JPX) Tsujimura Hiroji (Osaka JPX), Pyrometer.
  38. Makino Toshiro (Kyoto JPX) Tsujimura Hiroji (Osaka JPX) Arima Jiro (Osaka JPX), Pyrometer.
  39. Brisk Richard (Wayland MA) Kasindorf Barry (Framingham MA) Stein Alexander (Secaucus NJ), Pyrometer #2.
  40. Wadman Sipke (Eindhoven NLX), Pyrometer including an emissivity meter.
  41. Tanaka Fumio (Fukuoka IN JPX) DeWitt David P. (West Lafayette IN), Radiation thermometry.
  42. Dawson Robert ; Hause Frederick N. ; May Charles E., Rapid thermal anneal system and method including improved temperature sensing and monitoring.
  43. Walter Martin J. (Lee NY), Reflection technique for thermal mapping of semiconductors.
  44. Kleinerman Marcos (24 Jerome St. Southbridge MA 01550), Remote measurement of physical variables with fiber optic systems - methods, materials and devices.
  45. Fiory Anthony T. (Summit NJ), Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies.
  46. Small ; IV Ward ; Celliers Peter, Single-fiber multi-color pyrometry.
  47. Christensen Douglas A. (Salt Lake City UT), Spectroscopic method and apparatus for optically measuring temperature.
  48. Felice Ralph A., Temperature determining device and process.
  49. Anderson, Alan S., Temperature measuring apparatus.
  50. Amith Avraham (Roanoke VA) Naselli Charles (Roanoke VA) Nevin C. Scott (Albion IN), Transmission method to determine and control the temperature of wafers or thin layers with special application to semico.

이 특허를 인용한 특허 (29)

  1. Ranish, Joseph M.; Koelmel, Blake; Hunter, Aaron, Apparatus and method for measuring radiation energy during thermal processing.
  2. Ranish, Joseph M.; Koelmel, Blake; Hunter, Aaron Muir, Apparatus and method for measuring radiation energy during thermal processing.
  3. Volf,Boris; Belousov,Mikhail; Gurary,Alexander, Calibration wafer and method of calibrating in situ temperatures.
  4. Volf,Boris; Belousov,Mikhail; Gurary,Alexander I., Calibration wafer and method of calibrating in situ temperatures.
  5. Berson,William, Information encoding on surfaces by varying spectral emissivity.
  6. Berson,William, Information encoding on surfaces by varying spectral emissivity.
  7. Berson, William, Label for receiving indicia having variable spectral emissivity values.
  8. Berson, William, Label for receiving indicia having variable spectral emissivity values.
  9. Berson,William, Label for receiving indicia having variable spectral emissivity values.
  10. Shibata, Satoshi; Nambu, Yuko, Method for predicting temperature, test wafer for use in temperature prediction, and method for evaluating lamp heating system.
  11. Shibata, Satoshi; Nambu, Yuko, Method for predicting temperature, test wafer for use in temperature prediction, and method for evaluating lamp heating system.
  12. Palfenier, Ronald A.; Nystrom, Patrick J., Method of optical pyrometry that is independent of emissivity and radiation transmission losses.
  13. Clabes,Joachim Gerhard; Powell, Jr.,Lawrence Joseph; Stasiak,Daniel Lawrence; Wang,Michael Fan, Method to calibrate a chip with multiple temperature sensitive ring oscillators by calibrating only TSRO.
  14. Berson, William, Printing system ribbon including print transferable circuitry and elements.
  15. Berson, William, Radio frequency identification labels and systems and methods for making the same.
  16. Berson, William, Radio frequency identification labels and systems and methods for making the same.
  17. Palfenier, Ronald A.; Nystrom, Patrick J., Radiometric temperature measurement system.
  18. Palfenier, Ronald A.; Nystrom, Patrick J., Radiometric temperature measurement system.
  19. Naor, Yoram; Brosilow, Benjamin J, Reflectivity/emissivity measurement probe insensitive to variations in probe-to-target distance.
  20. Small IV, Ward; Celliers, Peter, Single-fiber multi-color pyrometry.
  21. Wegerich,Stephan W., Subband domain signal validation.
  22. Barron, Jr., William R.; Larrick, Thomas, System and method for non-contact temperature sensing.
  23. Pei, Cheng-Wei; Emadi, Arvin, System including distance sensor for non-contact temperature sensing.
  24. Poulsen, Peter, Systems and methods for integrated emissivity and temperature measurement of a surface.
  25. Berson, William, Systems and methods for reading indicium.
  26. Berson, William, Systems and methods for reading indicium.
  27. Krampert, Jeffrey E.; Fish, Roger B., Technique for temperature measurement and calibration of semiconductor workpieces using infrared.
  28. Takashi Shigeoka JP; Takeshi Sakuma JP, Temperature measuring method, temperature control method and processing apparatus.
  29. Schietinger, Charles W.; Palfenier, Ronald A., Wafer temperature measurement method for plasma environments.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로