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Lithographic printing method using a low surface energy layer 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007/00
출원번호 US-0198627 (1998-11-24)
발명자 / 주소
  • Mancini David P.
  • Resnick Douglas J.
출원인 / 주소
  • Motorola, Inc.
대리인 / 주소
    Koch
인용정보 피인용 횟수 : 17  인용 특허 : 16

초록

A method of contact printing on a device using a partially transparent mask (18) having first and second surfaces, comprises the steps of applying a layer of low surface energy polymeric material (22) to the first surface of the mask; placing the first surface (24) of the mask contiguous to the devi

대표청구항

[ What is claimed is:] [1.]1. A method of contact printing on a device using a mask that is partially transparent having first and second surfaces, comprising the steps of:(a) applying a layer of low surface energy amorphous fluoropolymer material to the first surface of the mask;(b) placing the fir

이 특허에 인용된 특허 (16)

  1. Squire Edward N. (Spring Hill FL), Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole.
  2. Keys Dalen E. (Towanda PA), Amorphous fluoropolymer pellicle films.
  3. Yundt Albert P. (Medfield MA), Amorphous monomolecular surface coatings.
  4. Laubacher Daniel Bruce ; Pang Philip Shek Wah, Fluoropolymer protectant layer for high temperature superconductor film and photo-definition thereof.
  5. Kolbe Hartmut F. (Boeblingen DEX) Schwarzbach Frank A. (Hildrizhausen DEX), Mask for imaging a pattern of a photoresist layer, method of making said mask, and use thereof in a photolithographic pr.
  6. Dinella Donald (Berkeley Heights NJ) Wong Ching-Ping (West Windsor Township ; Mercer County NJ), Mask for selectively transmitting therethrough a desired light radiant energy.
  7. Franco Jack R. (Poughkeepsie NY) Havas Janos (Hopewell Junction NY) Rompala Lewis J. (Wappingers Falls NY), Method for forming patterned films utilizing a transparent lift-off mask.
  8. Yen Yung-Tsai ; Bih Qoang Rung, Optical pellicle mounting system.
  9. Shea ; Vincent ; Wojcik ; Walter J., Pellicle cover for projection printing system.
  10. Kubota Yoshihiro (Gunma JPX) Kashida Meguru (Gunma JPX) Nagata Yoshihiko (Gunma JPX) Noguchi Hitoshi (Gunma JPX), Pellicle for photolithographic mask.
  11. Garcia Carlos N. (Tolleson AZ) Rigg Bryan C. (Phoenix AZ) Tanner Sally A. (Phoenix AZ), Photolithography process.
  12. Nakane Hisashi (Kawasaki JPX), Photomasks for photolithographic fine patterning.
  13. Hauser William P. (Cranbury NJ), Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit.
  14. Heinecke Rudolf August Herbert (Harlow EN), Selective plasma etching and deposition.
  15. Kawasaki Toru (Ichihara JPX) Unoki Masao (Yokohama JPX) Nakamura Masaru (Tokyo JPX), Stainproof protector made from fluorine-containing aliphatic cyclic polymer for preventing staining of lithographic mask.
  16. Piwcyzk Bernhard P. (No. 6 Lismer Court Kanata ; Ontario CA K2K 1A2), Vacuum deposition methods and masking structure.

이 특허를 인용한 특허 (17)

  1. Cok, Ronald S.; Boroson, Michael L.; O'Toole, Terrence R., Desiccant structures for OLED displays.
  2. Sheu, Victor Shi-Yueh, IMR (in-mold roller or in-mold release)/IMF (in-mold forming) making method using a digital printer printing and pre-forming technique.
  3. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  4. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  5. Sun, Zhiyi; Zhang, Ran, Mask and manufacturing method thereof.
  6. Cok, Ronald S.; Boroson, Michael L.; O'Toole, Terrence R., Method of manufacturing a top-emitting OLED display device with desiccant structures.
  7. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  8. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  9. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larkin E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography.
  10. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  11. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  12. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
  13. Nam, Seung-Hee; Yoo, Soon-Sung, Pattern transcription device and method of fabricating cliche for the same.
  14. Nam, Seung-Hee; Kim, Nam-Kook; Yoo, Soon-Sung; Chang, Youn-Gyong, Pattern transcription device and method of fabricating cliché for the same.
  15. Free,M. Benton; Pekurovsky,Mikhail L., Patterned coating method employing polymeric coatings.
  16. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
  17. Lu,David D.; Pellerite,Mark J.; Flynn,Richard M., Phototool coating.
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