초록 ▼

This invention provides methods and apparatus for performing microanalytic and microsynthetic analyses and procedures. Specifically, the invention provides a microsystem platform for use with a micromanipulation device to manipulate the platform by rotation, thereby utilizing the centripetal force r

This invention provides methods and apparatus for performing microanalytic and microsynthetic analyses and procedures. Specifically, the invention provides a microsystem platform for use with a micromanipulation device to manipulate the platform by rotation, thereby utilizing the centripetal force resulting from rotation of the platform to motivate fluid movement through microchannels embedded in the microplatform. The microsystem platforms of the invention are also provided having microfluidics components, resistive heating elements, temperature sensing elements, mixing structures, capillary and sacrificial valves, and methods for using these microsystems platforms for performing biological, enzymatic, immunological and chemical assays. An electronic spindle designed rotor capable of transferring electrical signals to and from the microsystem platforms of the invention is also provided.

대표청구항 ▼

[ We claim:] [1.]1. A heat-activated wax valve in a microfluidics array of a microsystems platform comprising, in combinationa) an amount of a solid, semi-solid or viscous liquid hydrocarbon positioned to occlude a lumen of a channel or capillary;b) a wax recrystallization chamber positioned in a ch

[ We claim:] [1.]1. A heat-activated wax valve in a microfluidics array of a microsystems platform comprising, in combinationa) an amount of a solid, semi-solid or viscous liquid hydrocarbon positioned to occlude a lumen of a channel or capillary;b) a wax recrystallization chamber positioned in a channel or capillary in fluid contact therein wherein the recrystallization chamber is positioned radially more distant from the center of the platform than the wax valve;c) a resistive heater element screen-printed and in thermal contact with the wax valve and at least a portion of the wax recrystallization chamber, wherein the resistive heater element is in electrical contact with a voltage source; rein heating the resistive heater element by applying a voltage to the element produced sufficient heat to melt the wax valve, and wherein rotation of the platform motivates the melted wax valve into the wax recrystallization chamber, and wherein the resistive heater element heats the channel or capillary and a portion of the recrystallization chamber, whereby the melted wax valve does not recrystallize in the channel or capillary and thereby does not occlude the lumen of the channel or capillary.