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Perimeter wafer lifting 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B25B-001/00
출원번호 US-0281595 (1999-03-30)
발명자 / 주소
  • Lenz Eric H.
출원인 / 주소
  • Lam Research Corporation
대리인 / 주소
    Beyer Weaver & Thomas
인용정보 피인용 횟수 : 62  인용 특허 : 6

초록

The invention relates to an apparatus for lifting a substrate from a surface of a chuck subsequent to a processing step. The apparatus includes a perimeter pin for lifting the substrate from the surface of the chuck to a first position wherein the substrate is disposed on the perimeter pin during li

대표청구항

[ What is claimed is:] [1.]1. An apparatus for lifting a substrate from a surface of a chuck subsequent to a processing step, said apparatus comprising:a perimeter pin for lifting said substrate from said surface of said chuck to a first position wherein said substrate is disposed on said perimeter

이 특허에 인용된 특허 (6)

  1. Takizawa Takeshi (Kunitachi JPX), Apparatus and method for supporting a substrate.
  2. Aoyama Masaaki (Kanagawa JPX) Kimura Keiichi (Kanagawa JPX), Holding apparatus for holding an article such as a semiconductor wafer.
  3. Yang Renyi, Method for use in bonding a chip to a substrate.
  4. Sumnitsch Franz,ATX, Rotary chuck including pins for lifting wafers.
  5. Takabayashi Yukio,JPX, Substrate holding system and exposure apparatus using the same.
  6. Getchel Paul A. ; Cole ; Sr. Kenneth M. ; Lyden Henry A. ; Stone William M. ; Lopez Robert ; Schey Thomas ; Butcher Dana G., Workpiece chuck.

이 특허를 인용한 특허 (62)

  1. Caldwell,Brian Neal; Jeffer,Raymond Walter; Kindt,Louis M., Adaptive electrostatic pin chuck.
  2. GanapathiSubramanian,Mahadevan; Sreenivasan,Sldlgata V., Adaptive shape substrate support method.
  3. GanapathiSubramanian,Mahadevan; Sreenivasan,Sidlgata V., Adaptive shape substrate support system.
  4. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  5. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  6. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  7. Cherala, Anshuman; Choi, Byung Jin; Lad, Pankaj B.; Shackleton, Steven C., Chucking system comprising an array of fluid chambers.
  8. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  9. Lee, William D.; Purohit, Ashwin M.; LaFontaine, Marvin R.; Rzeszut, Richard J., De-clamping wafers from an electrostatic chuck.
  10. Spady,Blaine R.; Blaufus,Christopher W.; Page,Douglas A.; Colban,Dan M., Edge grip chuck.
  11. Litman,Alon; Krivts,Igor, Electrostatic chuck for wafer metrology and inspection equipment.
  12. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  13. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
  14. Jones, William D., High pressure fourier transform infrared cell.
  15. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  16. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  17. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  18. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  19. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
  20. Fangli J. Hao ; Dean Jay Larson, Lift pin impact management.
  21. Donders, Sjoerd Nicolaas Lambertus; Smulders, Patrick Johannes Cornelus Hendrik; Smits, Peter, Lithographic apparatus and device manufacturing method.
  22. Willwerth, Michael D.; Palagashvili, David, Low force substrate lift.
  23. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  24. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  25. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  26. Gary L. Anderson ; Judy Schmidt ; Brent Teasley ; Dennis Buese ; James Callahan ; Randy Gene Loeschen, Method and apparatus to place wafers into and out of machine.
  27. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  28. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  29. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  30. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  31. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  32. Shang,Quanyuan; Harshbarger,William R.; Greene,Robert L.; Shimizu,Ichiro, Method for dechucking a substrate.
  33. Choi, Byung-Jin; GanapathiSubramanian, Mahadevan; Choi, Yeong-jun; Meissl, Mario J., Method for expelling gas positioned between a substrate and a mold.
  34. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  35. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian Matthew; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  36. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  37. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  38. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  39. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
  40. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  41. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  42. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
  43. Eric H. Lenz, Perimeter wafer lifting.
  44. Hao, Fangli J., Pin lifting system.
  45. Okita, Shogo; Asakura, Hiromi; Watanabe, Syouzou; Wada, Toshihiro; Okune, Mitsuhiro; Hiroshima, Mitsuru, Plasma processing apparatus and plasma processing method.
  46. Lee, William Davis, Platen with multiple shaped grounding structures.
  47. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  48. Wuester,Christopher D., Process flow thermocouple.
  49. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  50. Ben-Abu, Yehuda, Selective vacuum printing machine.
  51. Okuda, Masakazu, Semiconductor wafer chuck assembly for a semiconductor processing device.
  52. Shibata, Motojiro; Ushijima, Akira, Semiconductor-chip exfoliating device and semiconductor-device manufacturing method.
  53. Iwashita, Yasuharu; Hirakawa, Osamu; Manabe, Eiji; Tamura, Takeshi; Fukutomi, Akira, Substrate holding apparatus and substrate holding method.
  54. Chen,Hung Chih; Zuniga,Steven M.; Siu,Tsz Sin, Substrate removal from polishing tool.
  55. Okabe, Akira; Mori, Yoshinobu, Susceptor support portion and epitaxial growth apparatus including susceptor support portion.
  56. Okabe, Akira; Mori, Yoshinobu, Susceptor support portion and epitaxial growth apparatus including susceptor support portion.
  57. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  58. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  59. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  60. Suzuki, Masaru, Unloading method of object, program storage medium, and mounting mechanism.
  61. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
  62. Heo, Sung Soo, Wafer loading apparatus.
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