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Mask repattern process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-023/48
  • H01L-023/52
  • H01L-029/40
출원번호 US-0610643 (2000-06-28)
발명자 / 주소
  • Farnworth Warren M.
출원인 / 주소
  • Micron Technology, Inc.
대리인 / 주소
    TraskBritt, PC
인용정보 피인용 횟수 : 12  인용 특허 : 23

초록

The present invention relates to an improved method for forming a UBM pad and solder bump connection for a flip chip which eliminates at least two mask steps required in standard UBM pad forming processes when repatterning the bond pad locations.

대표청구항

[ What is claimed is:] [1.]1. A semiconductor device, said semiconductor device comprising:a semiconductor substrate including a plurality of circuits thereon, each circuit of said plurality of circuits connected to a bond pad, a first passivation layer thereon covering said plurality of circuits an

이 특허에 인용된 특허 (23)

  1. Ichikawa Matsuo,JPX, Bonding pad structures for semiconductor integrated circuits.
  2. Akagawa Masatoshi (Nagano JPX), Chip sized semiconductor device.
  3. Honn ; James J. ; Stuby ; Kenneth P., Electrical package for LSI devices and assembly process therefor.
  4. Dux John B. (Millbrook NY) Poetzinger Janet L. (Pleasant Valley NY) Prestipino Roseanne M. (Beacon NY) Siefering Kevin L. (Cary NC), Fabrication of discrete thin film wiring structures.
  5. Pasch Nicholas F. (Pacifica CA), Fabrication of substrates for multi-chip modules.
  6. Volfson David (Worcester MA) Senturia Stephen D. (Boston MA), High-density, multi-level interconnects, flex circuits, and tape for tab.
  7. Tai King L. (Berkeley Heights NJ), Integrated circuit chip-and-substrate assembly.
  8. Wilson Arthur M. (Richardson TX), Integrated circuit product having a polyimide film interconnection structure.
  9. Moresco Larry L. (San Carlos CA) Love David G. (Pleasanton CA) Wang Wen-Chou V. (Cupertino CA), Interconnect capacitors.
  10. Farnworth Warren M., Mask repattern process.
  11. Farnworth Warren M., Mask repattern process.
  12. Reele Samuel (Rochester NY) Pian Thomas R. (Rochester NY), Method for creating substrate electrodes for flip chip and other applications.
  13. Kondo Kenji (Hoi JPX) Kunda Hachiro (Chiryu JPX) Sonobe Toshio (Okazaki JPX), Method for making a semiconductor device.
  14. Nishi Toshio (Fukuoka JPX) Wada Yoshiyuki (Onojo JPX) Kadokami Eigo (Kasuga JPX) Yoshinaga Seiichi (Kasuga JPX), Method for mounting electronic devices.
  15. Wilson Arthur M. (Richardson TX), Method for producing an integrated circuit product having a polyimide film interconnection structure.
  16. Akram Salman, Method of forming conductive bumps on die for flip chip applications.
  17. Lochon Henri (Saintry-sur-Seine FRX) Robert Georges (La Ferte-Alais FRX), Method of forming metal contact pads and terminals on semiconductor chips.
  18. Lin Paul T. (Austin TX), Method of transferring solder balls onto a semiconductor device.
  19. Wong Wah-Sang (Montebello CA) Gray William D. (Redondo Beach CA), Polyimide passivation of GaAs microwave monolithic integrated circuit flip-chip.
  20. Yerman Alexander J. (Scotia NY), Screenable power chip mosaics, a method for fabricating large power semiconductor chips.
  21. Mori Katsunobu (Nara JPX), Semiconductor device having external electrodes formed in concave portions of an anisotropic conductive film.
  22. Sudo Toshio (Kawasaki JPX), Semiconductor integrated circuit device with optical transmit-receive means.
  23. Moore Kevin D. (Schaumburg IL) Missele Carl (Elgin IL), Solder bumping of integrated circuit die.

이 특허를 인용한 특허 (12)

  1. Benson,Peter A.; Akram,Salman, Low temperature methods of forming back side redistribution layers in association with through wafer interconnects.
  2. Benson,Peter A.; Akram,Salman, Low temperature methods of forming back side redistribution layers in association with through wafer interconnects, semiconductor devices including same, and assemblies.
  3. Farnworth, Warren M., Mask repattern process.
  4. Farnworth, Warren M., Mask repattern process.
  5. Warren M. Farnworth, Mask repattern process.
  6. Cobbley, Chad A.; Brooks, Jerry M., Method of packaging semiconductor dice employing at least one redistribution layer.
  7. Chen, Yen-Ming; Lin, Chia-Fu; Hsu, Shun-Liang; Ching, Kai-Ming; Lee, Hsin-Hui; Su, Chao-Yuan; Chen, Li-Chih, Method to improve bump reliability for flip chip device.
  8. Farnworth, Warren M., Methods for mask repattern process.
  9. Kikuchi, Hidekazu, Semiconductor device and method for manufacturing.
  10. Rousseville, Lucie; Bardy, Serge; Le Duc, Philippe; Desmortreux, David, Semiconductor device and wafer with a test structure and method for assessing adhesion of under-bump metallization.
  11. Benson, Peter A; Akram, Salman, Semiconductor devices and assemblies including back side redistribution layers in association with through wafer interconnects.
  12. Cobbley, Chad A.; Brooks, Jerry M., Semiconductor dice packages employing at least one redistribution layer.
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