초록 ▼

Processing methods and systems using vapor phase processing streams made from a liquid phase source and feed gas. Some versions use multiple liquid sources and multiple vapor generators which each produce vapors which are mixed. Some of the vapor generators use metering pumps to inject a controlled

Processing methods and systems using vapor phase processing streams made from a liquid phase source and feed gas. Some versions use multiple liquid sources and multiple vapor generators which each produce vapors which are mixed. Some of the vapor generators use metering pumps to inject a controlled flow of liquid into a controlled flow of feed gas. In some embodiments the vapors are exsiccated to reduce saturation before being introduced as a processing chamber vapor mixture into a processing chamber. The semiconductor pieces are preferably rotated within the processing chamber and can be processed in batches.

대표청구항 ▼

[ What is claimed is:] [1.]1. A method for processing a semiconductor piece, comprising the steps of:placing the piece in a processing vessel;contacting a feed gas with a source liquid to generate a vapor;supplying the vapor to the processing vessel;rotating the semiconductor piece within the proces

[ What is claimed is:] [1.]1. A method for processing a semiconductor piece, comprising the steps of:placing the piece in a processing vessel;contacting a feed gas with a source liquid to generate a vapor;supplying the vapor to the processing vessel;rotating the semiconductor piece within the processing vessel; andspraying the vapor onto the semiconductor piece while the semiconductor piece is rotating.