초록 ▼

An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from

An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from the body of the cleaning agent. The carrier gas flow carried by the second conduit includes cleaning agent in vapor form acquired from the body of cleaning agent. A nozzle is coupled to the second conduit to cause droplets of the cleaning agent to impinge upon a first face of the substrate to be cleaned.

대표청구항 ▼

[ What is claimed is:] [1.]1. An apparatus for cleaning a semiconductor substrate, comprising:a source of pressurized carrier gas;a supply of liquid cleaning solution containing a cleaning agent;a first line that directs the pressurized carrier gas through the liquid cleaning solution to generate a

[ What is claimed is:] [1.]1. An apparatus for cleaning a semiconductor substrate, comprising:a source of pressurized carrier gas;a supply of liquid cleaning solution containing a cleaning agent;a first line that directs the pressurized carrier gas through the liquid cleaning solution to generate a vapor that includes the carrier gas and the cleaning agent in vapor form;a second line that carries the vapor away from the supply of liquid cleaning solution; anda nozzle fluidly coupled to the second line to condense at least a portion of the vapor to produce droplets containing the cleaning agent and to cause the droplets to impinge upon at least a first surface of the substrate to remove contaminants thereon.