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Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/34
출원번호 US-0400662 (1999-09-20)
발명자 / 주소
  • Holst Mark
  • Carpenter Kent
  • Lane Scott
  • Arya Prakash V.
출원인 / 주소
  • Advanced Technology Materials, Inc.
대리인 / 주소
    Fuierer
인용정보 피인용 횟수 : 13  인용 특허 : 31

초록

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrot

대표청구항

[ What is claimed is:] [1.]1. An apparatus for treating an effluent fluid stream from one or more semiconductor manufacturing process tools, comprising:a pre-treatment unit, downstream from at least one semiconductor manufacturing process tool, arranged to remove water-soluble components from the ef

이 특허에 인용된 특허 (31)

  1. Bartz David (Santa Clara CA) Kendall Robert M. (Sunnyvale CA) Moreno Frederick E. (Los Altos CA), Apparatus for combustive destruction of troublesome substances.
  2. Klinzing George E. (Pittsburgh PA) Dhodapkar Shrikant (Midland MI), Apparatus for facilitating solids transport in a pneumatic conveying line and associated method.
  3. Itoh Fumio (Sakai JPX) Sasaki Tutomu (Takarazuka JPX) Kanoh Ikuhisa (Osaka JPX) Fukumoto Takaaki (Kishiwada JPX), Apparatus for removing at least one acidic component from a gas.
  4. Imamura Hiroshi (Suita JPX), Apparatus for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process.
  5. Reichardt Horst (Dresden DEX) Ritter Lothar (Dresden DEX) Labs Lutz (Dresden DEX) Gehmlich Konrad (Dresden DEX) Hentrich Michael (Dresden DEX) Firkert Gunter (Dresden DEX) Hennig Volkmar (Dresden DEX, Apparatus for the purification of waste gas.
  6. Bartz David (Santa Clara CA) Kendall Robert M. (Sunnyvale CA) Moreno Frederick E. (Los Altos CA), Combustive destruction of halogenated compounds.
  7. Smith James R. (Bristol GBX) Timms Peter L. (Bristol GBX), Dry exhaust gas conditioning.
  8. Ibaraki Yoshihiro,JPX ; Ina Hidekazu,JPX ; Makioka Takayuki,JPX, Exhaust gas treatment unit.
  9. Ibaraki Yoshihiro,JPX ; Ina Hidekazu,JPX ; Kawanaka Hideji,JPX, Exhaust gas treatment unit and method.
  10. Martinelli Robert (Doylestown OH) Johnson Dennis W. (Barberton OH) Myers Robert B. (Copley OH) Owens ; II Fred C. (North Canton OH) Smith Peter V. (North Canton OH), Flue gas conditioning for the removal of acid gases, air toxics and trace metals.
  11. Laslo Dennis J. (Lebanon PA), Flue gas scrubbing apparatus.
  12. Suzumura Hiroshi,JPX ; Ogushi Yasuyuki,JPX ; Ukawa Naohiko,JPX ; Hino Masao,JPX ; Tao Koosoo,JPX ; Kojima Nobuo,JPX ; Okazoe Kiyoshi,JPX ; Suyama Kyozo,JPX, Flue gas treatment system.
  13. Sheu David,TWX ; Tseng Ling-Hsin,TWX ; Wong Ka-Hing,TWX ; Sheu D. Y.,TWX, Gas exhaust apparatus.
  14. Mott ; Lambert H., Gas transport system for powders.
  15. Tarancon Gregorio (High Springs FL), Gas-scrubber apparatus for the chemical conversion of toxic gaseous compounds into non-hazardous inert solids.
  16. Anderson Lawrence B. (Encinitas CA) Hammon Timothy E. (Cardiff CA) Frieler Cliff (Highland Park CA), Incinerator for complete oxidation of impurities in a gas stream.
  17. Johnsgard Mark W. (Campbell CA), Inlet system for gas scrubber.
  18. Holst Mark R. (Concord CA) Martin Richard J. (Sunnyvale CA) Stilger John D. (San Jose CA) Yee Samson C. (Fremont CA), Method and apparatus for control of fugitive VOC emissions.
  19. Imamura Hiroshi,JPX, Method for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process.
  20. Yoneda Noriyuki (Tokyo JPX) Kudoh Hidehiko (Yokohama JPX) Iwamoto Norio (Yokohama JPX) Nakamura Munekazu (Yokohama JPX) Kojima Chiaki (Yokohama JPX) Kaneko Kunio (Yokohama JPX) Mori Yoshifumi (Chiba , Method for the combustion treatment of toxic gas-containing waste gas.
  21. Hauser H. William (Marietta GA), Method of manufacturing aluminum sulfate from flue gas.
  22. Weinberg Norman L. (Amherst NY) Genders John D. (Lancaster NY) Minklei Alfred O. (Grand Island NY), Methods for purification of air.
  23. Murray Charles M. (Silver Spring MD) Thompson Joel L. (College Park MD) Hentz ; Jr. Lawrence H. (Hampstead MD), Methods of and apparatus for removing odors from process airstreams.
  24. Holst Mark R. ; Olander W. Karl ; Tom Glenn M., Point-of-use catalytic oxidation apparatus and method for treatment of voc-containing gas streams.
  25. Hirase Ikuo (Ibaraki IL JPX) Rufin Denis (Hinsdale IL), Process for treating gaseous effluents coming from the manufacture of electronic components and incineration apparatus f.
  26. Shiban Samir S. (Beaverton OR) Morgan Daniel G. (Tigard OR), Pyrophoric gas neutralization chamber.
  27. Boldish Steven I. (Plano TX) Toor Irfan A. (Plano TX), Removing arsine from gaseous streams.
  28. Spink Donald R. (Waterloo CAX) Nguyen Kim D. (Waterloo CAX), Solute gas-absorbing procedure.
  29. Tajima Masahiro (Shinnanyo JPX) Harada Masashi (Shinnanyo JPX), Treatment equipment of exhaust gas containing organic halogen compounds.
  30. Vickery Earl (San Jose CA) Yates Mark (Morgan Hill CA), Turbulent incineration of combustible materials supplied in low pressure laminar flow.
  31. Coleman Larry M. (Tonawanda NY) Tambo William (Chelmsford MA), Waste treatment in silicon production operations.

이 특허를 인용한 특허 (13)

  1. Curry, Mark W.; Page, Barry; Crawford, Shaun W.; Vermeulen, Robbert; Pyzel, William D.; Loldj, Youssef; Correa, Rene T.; Brown, Daniel S.; Fox, Allen, Apparatus and methods for ambient air abatement of electronic manufacturing effluent.
  2. Shiban, Samir S., Apparatus for dynamic oxidation of process gas.
  3. Shiban,Samir S., Combined chemical agent and dynamic oxidation treatment of hazardous gas.
  4. Kawamura, Kotaro; Arai, Hiroyuki; Muroga, Yasutaka, Combustion-type exhaust gas treatment apparatus.
  5. Shiban, Samir S., Dynamic oxidation of process gas.
  6. Holst, Mark; Carpenter, Kent; Lane, Scott; Arya, Prakash V., Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases.
  7. Kawamura, Kohtaro; Nakamura, Rikiya; Okuda, Kazutaka; Ishikawa, Keiichi; Tsuji, Takeshi, Exhaust gas treating device.
  8. Shiban, Samir S., Hazardous gas abatement system using electrical heater and water scrubber.
  9. Shiban, Samir S., Hazardous gas abatement system using electrical heater and water scrubber.
  10. Imahori, Osamu; Hirai, Toshihisa; Hirai, legal representative, Kishiko; Sugawa, Akihide; Mihara, Fumio; Akisada, Shousuke; Yoshioka, Hirokazu; Katayama, Kousuke; Yamauchi, Toshiyuki; Suda, Hiroshi; Matsui, Yasunori, Heating blower with electrostatic atomizing device.
  11. Kumada, Masayuki; Mukai, Keiji, Method and device for temperature reduction of exhaust gas by making use of thermal water.
  12. Williams, Michael; Barthman, Michael, Method for abating effluent from an etching process.
  13. Johnsgard, Mark, Reactive gas control.
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