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Laser delivery system and method for photolithographic mask repair 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03B-027/54
  • G03B-027/42
  • G03B-027/32
  • G01N-021/88
출원번호 US-0512580 (2000-02-24)
발명자 / 주소
  • John O'Connor
  • Qiang Fu
출원인 / 주소
  • Quantronix Corporation
대리인 / 주소
    Nixon Peabody LLP
인용정보 피인용 횟수 : 45  인용 특허 : 64

초록 ▼

A system and method for photolithographic mask repair. The system includes a structure for supporting a mask to be operated on, a laser emitting device for effecting mask repair, a light source adjacent the support structure for selected illumination of the mask, a laser processor for effecting sequ

대표청구항 ▼

1. A system for photolithographic mask repair which comprises:a structure for supporting a mask to be operated on; a laser emitting device for effecting mask repair; a light source adjacent the support structure for selected illumination of the mask; a laser processor for effecting sequential angula

이 특허에 인용된 특허 (64)

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  35. Liu Kuo-Ching (Setauket NY), Method and apparatus for autofocusing a microscope.
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  39. Liu Kuo-Ching (Setauket NY), Method and apparatus for laser beam homogenization.
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  56. Zinck Jennifer J. (Calabasas CA) Brewer Peter D. (Newbury Park CA), Production of clean, well-ordered CdTe surfaces using laser ablation.
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  57. Feld Michael S. (Waban MA) Itzkan Irving (Boston MA) Albagli Douglas (Cambridge MA) Izatt Joseph A. (Cambridge MA) Hayes Gary B. (Leominster MA) Rava Richard (Waltham MA), Pulsed laser system for the surgical removal of tissue.
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