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Gas sensor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-027/12
출원번호 US-0290792 (1999-04-12)
발명자 / 주소
  • James B. Miller
  • Joseph D. Jolson
출원인 / 주소
  • Mine Safety Appliances Company
대리인 / 주소
    James G. Uber, Esq.
인용정보 피인용 횟수 : 41  인용 특허 : 13

초록

A gas sensor for the detection of gases comprises a housing and an active element disposed within the housing. The active element is surrounded by a porous insulating material having a bulk density no greater than 0.15 g/cc. Another gas sensor comprises an active element surrounded by a porous insul

대표청구항

1. A gas sensor comprising: a housing and a chemically active heated element disposed within the housing, the active element being surrounded by a porous insulating material placed within the housing, the porous insulating material having a bulk density no greater than approximately 0.3 g/cc.

이 특허에 인용된 특허 (13)

  1. Kishida ; Katsuhiro ; Takao ; Hiroshi ; Togawa ; Kimmochi ; Matoba ; Kaz uo, Article and method of forming porous coating on electrode layer of concentration cell type oxygen sensor.
  2. Van De Vyver James Edward,ZAX ; Brodalka Marysia,ZAX ; Howden Michael George,ZAX ; Leith Ian Robert,ZAX ; Pennefather Rosalyn Claire,ZAX ; Wallis Jeremy Rex,ZAX, Catalytic gas sensor.
  3. Castillo Imelda L. ; Koermer Gerald S. ; Balko Edward, Catalytic structure.
  4. Clough Thomas J. (Santa Monica CA) Grosvenor Victor L. (Topanga CA) Pinsky Naum (Thousand Oaks CA), Coated substrates useful as catalysts and sensors.
  5. Poli Albert A. (Pittsburgh PA), Combustible gas sensor.
  6. Jha Sunil C. ; Rubow Kenneth L. ; Cowan Cathy L. ; Eisenmann Mark R., Composite porous media.
  7. Graessle Josef A. (Kaarst DEX) Kirckof Steven S. (Oakdale CA) Kirk Brian (Castle Donington GB2) Schwarz Werner R. (Leverkusen DEX) Wildt Theo N. (Titz DEX), Electronic test pack using parametric measurements for sterlizers.
  8. Young Daniel ; Naber Jeffrey ; Adams Neil ; Balko Edward ; Blosser Patrick ; Hratko Linda ; Koermer Gerald ; Xue Jie ; Moya Adam ; Koripella Chowdary, Exhaust gas sensor.
  9. Friese Karl-Hermann (Leonberg DEX) Wiedenmann Hans-Martin (Stuttgart DEX) Weyl Helmut (Schwieberdingen DEX), Exhaust gas sensor and method of producing the same.
  10. Shiratori Masayuki (Kawasaki JPX) Sakai Tadashi (Yokohama JPX) Katsura Masaki (Yokosuka JPX) Takikawa Osamu (Kamakura JPX), Gas detecting element.
  11. Friese Karl-Hermann (Leonberg DEX) Wiedenmann Hans-Martin (Stuttgart DEX) Goehring Eberhard (Schwieberdingen DEX), Laminated system for gas sensors and process for producing it.
  12. Champney ; Jr. Richard E. (Beaver Falls PA), Microminiature combustible gas sensor and method of fabricating a microminiature combustible gas sensor.
  13. De Castro Emory S. ; Genders J. David ; Weinberg Norman L., Solid state gas sensor and filter assembly.

이 특허를 인용한 특허 (41)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. Zanella, Sr., Mark Flori, Combustible gas sensors including integral support structures and combustible gas sensor with multiple active elements.
  5. Zanella, Sr., Mark Flori, Combustible gas sensors including integral support structures and combustible gas sensor with multiple active elements.
  6. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  7. Ruhland, Robert M.; Gehman, Richard W.; Anderson, Peter M.; Calvagna, Peter M., Differential compensated vapor sensor.
  8. Liu, Fuxia; Su, Aimin, Explosion-proof miniaturized combustible gas sensor.
  9. Oishi, Hidetoshi; Sasaki, Takashi; Suzuki, Akihiro; Eguchi, Tsuyoshi, Gas sensor.
  10. Otani,Seiichi; Nakamura,Yukio; Furusato,Mamoru, Gas sensor.
  11. Doncaster, Alan Mason; Brown, Terence David, Gas sensors.
  12. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  13. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
  14. Jones, William D., High pressure fourier transform infrared cell.
  15. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  16. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  17. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  18. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  19. Oishi, Hidetoshi; Suzuki, Akihiro; Tsukabayashi, Shunji; Okajima, Kazuhiro, Hydrogen sensor with dew condensation prevention.
  20. Swanson, Meghan E.; Brown, Michael Alvin, Identification of combustible gas species via pulsed operation of a combustible gas sensor.
  21. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  22. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  23. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  24. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  25. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  26. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  27. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  28. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  29. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  30. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  31. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  32. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  33. Wuester,Christopher D., Process flow thermocouple.
  34. Welch, M. Bruce; Schmidt, Roland; Yao, Jianhua; Dodwell, Glenn W.; Morton, Robert W.; Gislason, Jason J.; Kimble, James B.; Simon, David E.; Johnson, Marvin M., Process for selective oxidation of carbon monoxide in a hydrogen containing stream.
  35. Welch,M. Bruce; Schmidt,Roland; Yao,Jianhua; Dodwell,Glenn W.; Morton,Robert W.; Gislason,Jason J.; Kimble,James B.; Simon,David E.; Johnson,Marvin M., Process for selective oxidation of carbon monoxide in a hydrogen containing stream.
  36. Scheffler, Towner Bennett, Pulsed potential gas sensors.
  37. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  38. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  39. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  40. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  41. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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