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Backing members and planarizing machines for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods of making and using such backing members 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-005/00
출원번호 US-0190403 (1998-11-11)
발명자 / 주소
  • Daniel B. Dow
출원인 / 주소
  • Micron Technology, Inc.
대리인 / 주소
    Dorsey & Whitney LLP
인용정보 피인용 횟수 : 76  인용 특허 : 13

초록

Devices and methods for releasably attaching substrate assemblies to carrier heads of planarizing machines in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies. One aspect of the invention is directed toward a backing member for use in a carrier head

대표청구항

1. A backing member for selectively coupling a microelectronic-device substrate assembly to a carrier head of a planarizing machine, comprising:a body having a first surface configured to be received by the carrier head and substantially contacting the carrier head, and a second surface configured t

이 특허에 인용된 특허 (13)

  1. Piper John G. ; Keith Chris ; Heideman Donald M. ; Villet Michael A., Apparatus to hold and remove an integrated circuit chip on a cutting chuck.
  2. Govzman Boris ; Zuniga Steven M. ; Chen Hung ; Somekh Sasson, Carrier head with a substrate detection mechanism for a chemical mechanical polishing system.
  3. Shendon Norman (San Carlos CA), Chemical mechanical polishing apparatus with improved carrier and method of use.
  4. Robinson Karl M. ; Yu Chris Chang, Chemical-mechanical planarization machine and method for uniformly planarizing semiconductor wafers.
  5. Shendon Norman ; Sherwood Michael ; Lee Harry, Fluid-pressure regulated wafer polishing head.
  6. Kassir Salman M ; Walsh Thomas A, Grinding process and apparatus for planarizing sawed wafers.
  7. Saito Hideo,JPX ; Ito Fumitaka,JPX, Headstock of a polishing machine.
  8. Hempel ; Jr. Eugene O. (Garland TX), Method and apparatus for holding a semiconductor wafer during a chemical mechanical polish (CMP) process.
  9. Fehrenbach Hubert (Kehl DEX) Koch Volker (Battenberg DEX) Boese Bernhard (Kehl DEX), Method and apparatus for the surface machining of substrate plates for magnetic memory plates.
  10. Nakajima Makoto (Nagano JPX), Polishing machine.
  11. Tanaka Koichi,JPX ; Tsuchiya Toshihiro,JPX ; Morita Koji,JPX ; Takaku Tsutomu,JPX, Polishing system.
  12. Koyama Isao (Tokyo JPX) Hatsuse Toshikazu (Tokyo JPX), Vacuum suction device.
  13. Sekiya Shinji (Tokyo JPX), Wafer attracting and fixing device.

이 특허를 인용한 특허 (76)

  1. Taylor,Theodore M., Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization.
  2. Lee, NamSeok; Yoo, SoonSung, Apparatus and method for manufacturing a flexible display device.
  3. Chandrasekaran,Nagasubramaniyan, Apparatus and method for mechanical and/or chemical-mechanical planarization of micro-device workpieces.
  4. Blalock,Guy T., Apparatus and method for removing material from microfeature workpieces.
  5. Taylor, Theodore M., Apparatus for planarizing microelectronic workpieces.
  6. Ramarajan, Suresh, Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces.
  7. Ramarajan, Suresh, Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces.
  8. Ramarajan, Suresh, Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces.
  9. Agarwal,Vishnu K., Apparatuses and methods for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies.
  10. Ramarajan,Suresh, Apparatuses and methods for monitoring rotation of a conductive microfeature workpiece.
  11. Ramarajan,Suresh, Apparatuses and methods for monitoring rotation of a conductive microfeature workpiece.
  12. Agarwal,Vishnu K., Apparatuses for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies.
  13. Castor, Terry, Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces.
  14. Castor, Terry, Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces.
  15. Chandrasekaran, Nagasubramaniyan, Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces.
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  17. Chandrasekaran,Nagasubramaniyan, Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces.
  18. Elledge,Jason B., Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces.
  19. Elledge,Jason B., Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces.
  20. Pham, Xuyen; Zhou, Ren; Khavinson, Raisa, Carrier head having location optimized vacuum holes.
  21. Fukushima, Makoto; Yasuda, Hozumi; Nabeya, Osamu; Watanabe, Katsuhide; Namiki, Keisuke, Elastic membrane for semiconductor wafer polishing.
  22. Fukushima, Makoto; Yasuda, Hozumi; Nabeya, Osamu; Watanabe, Katsuhide; Namiki, Keisuke, Elastic membrane for semiconductor wafer polishing.
  23. Sabde, Gundu M.; Hofmann, James J.; Joslyn, Michael J.; Lee, Whonchee, Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids.
  24. Chopra, Dinesh; Meikle, Scott G., Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates.
  25. Chopra, Dinesh; Meikle, Scott G., Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates.
  26. Kistler, Rodney C.; Carswell, Andrew, Method and apparatus for removing material from microfeature workpieces.
  27. Kistler, Rodney C.; Carswell, Andrew, Method and apparatus for removing material from microfeature workpieces.
  28. Kistler,Rodney C.; Carswell,Andrew, Method and apparatus for removing material from microfeature workpieces.
  29. Taylor,Theodore M., Method for planarizing microelectronic workpieces.
  30. Lu, Jin, Methods and apparatuses for removing polysilicon from semiconductor workpieces.
  31. Chandrasekaran,Nagasubramaniyan, Methods and systems for conditioning planarizing pads used in planarizing substrates.
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  33. Chandrasekaran,Nagasubramaniyan, Methods and systems for conditioning planarizing pads used in planarizing substrates.
  34. Chandrasekaran,Nagasubramaniyan, Methods and systems for conditioning planarizing pads used in planarizing substrates.
  35. Chandrasekaran,Nagasubramaniyan, Methods and systems for conditioning planarizing pads used in planarizing substrates.
  36. Elledge, Jason B., Methods and systems for planarizing workpieces, e.g., microelectronic workpieces.
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  39. Moore,Carter; Folkes,Elon; Castor,Terry, Methods and systems for planarizing workpieces, e.g., microelectronic workpieces.
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  41. Moore,Carter; Folkes,Elon; Castor,Terry, Methods for planarizing workpieces, e.g., microelectronic workpieces.
  42. Elledge,Jason B., Methods of manufacturing carrier heads for polishing micro-device workpieces.
  43. Martin, Michael H.; Crump, Brett, Planarity diagnostic system, E.G., for microelectronic component test systems.
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  47. Joslyn, Michael J., Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces.
  48. Joslyn,Michael J., Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces.
  49. Wright, David Q., Planarizing machines and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies.
  50. Kimura, Norio, Polishing apparatus.
  51. Elledge, Jason B., Polishing machines including under-pads and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces.
  52. Dunn,Freddie L., Polishing pad conditioners having abrasives and brush elements, and associated systems and methods.
  53. Kassir,Salman Moudrek; Spiegel,Larry A., Protection of work piece during surface processing.
  54. Chandrasekaran,Nagasubramaniyan, Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces.
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  58. Taylor,Theodore M., Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces.
  59. Taylor,Theodore M., Shaped polishing pads for beveling microfeature workpiece edges, and associate system and methods.
  60. Taylor,Theodore M., Shaped polishing pads for beveling microfeature workpiece edges, and associated systems and methods.
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  62. Numoto, Minoru, Structure of polishing head of polishing apparatus.
  63. Kim, Jong Won, Substrate bonding apparatus for liquid crystal display panel.
  64. Klein, Rita J., System for planarizing microelectronic substrates having apertures.
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  67. Elledge, Jason B.; Chandrasekaran, Nagasubramaniyan, Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces.
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  71. Elledge,Jason B.; Chandrasekaran,Nagasubramaniyan, Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces.
  72. Bastian, Joseph A.; Reukauf, Jeremey T., Systems and methods for removing microfeature workpiece surface defects.
  73. Bastian,Joseph A.; Reukauf,Jeremey T., Systems and methods for removing microfeature workpiece surface defects.
  74. Moore,Carter; Folkes,Elon; Castor,Terry, Systems for planarizing workpieces, e.g., microelectronic workpieces.
  75. Mallery, Daniel S.; Logan, Sean S.; Lee, James F., Workpiece carrier with adjustable pressure zones and barriers.
  76. Masumura, Hisashi; Suzuki, Fumio; Kitagawa, Kouji, Workpiece holder for polishing, workpiece polishing apparatus and polishing method.
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