$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Molecular contamination control system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65B-001/04
  • B65D-085/30
  • C23C-016/00
출원번호 US-0790769 (2001-02-21)
발명자 / 주소
  • Glenn A. Roberson, Jr.
  • Robert M. Genco
  • Robert B. Eglinton
  • Wayland Comer
  • Gregory K. Mundt
출원인 / 주소
  • Semifab Incorporated
대리인 / 주소
    Fliesler Dubb Meyer & Lovejoy LLP
인용정보 피인용 횟수 : 44  인용 특허 : 28

초록

The system and method for molecular contamination control permits purging a SMIF pod to desired levels of relative humidity, oxygen, or particulates. The SMIF pod includes an inlet port including a check valve and filter assembly for supplying a clean, dry gaseous working fluid to maintain low level

대표청구항

1. Apparatus for removing a gaseous working fluid from a modular isolation capsule for purging of the modular isolation capsule, comprising:an outlet tower adapted to be mounted to the modular isolation capsule for removing the gaseous working fluid from the modulation isolation chamber; and a check

이 특허에 인용된 특허 (28)

  1. Tullis Barclay J. (Palo Alto CA) Bailey John S. (Sunnyvale CA) Gunawardena D. R. (Union City CA) Kaempf Ulrich (Los Altos CA), Apparatus for automated cassette handling.
  2. Yamashita, Teppei; Murata, Masanao; Tanaka, Tsuyoshi; Morita, Teruya; Kawano, Hitoshi; Okuno, Atsushi; Tsuda, Masanori; Hayashi, Mitsuhiro, Closed container to be used in a clean room.
  3. Ludwig Joachim (Jena DEX), Device for transporting magazines for molding wafer-shaped objects.
  4. Goodman John B. (Chanhassen MN) Mikkelsen Kirk J. (Chanhassen MN), Evacuated wafer container.
  5. Kawano Hitoshi (Ise JPX) Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Okuno Atsushi (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Nakamura Akio (Ise J, Gas purge unit for a portable container.
  6. Williams Randall S. (Chaska MN) Cheesebrow Nicholas T. (St. Paul MN), Mechanical interface wafer container.
  7. Freeman Dean W. (Garland TX) Davis Cecil J. (Greenville TX), Method and apparatus for cleaning integrated circuit wafers.
  8. Bonora Anthony C. (Menlo Park CA) Guerre Gilles (Les Loges en Josas CA FRX) Parikh Mihir (San Jose CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Santa Clara CA), Method and apparatus for transferring articles between two controlled environments.
  9. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  10. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  11. Roberson ; Jr. Glenn A. ; Genco Robert M. ; Eglinton Robert B. ; Comer Wayland ; Mundt Gregory K., Molecular contamination control system.
  12. Yates Cleon R. (Austin TX), Movable cantilevered purge system.
  13. , Particle-free dockable interface for integrated circuit processing.
  14. Logar Roger E. (San Jose CA), Particulate-free epitaxial process.
  15. Logar Roger E. (San Jose CA), Particulate-free epitaxial process.
  16. Doan Trung T. (Boise ID) Lowrey Tyler A. (Boise ID), Process for preventing a native oxide from forming on the surface of a semiconductor material and integrated circuit cap.
  17. Kanegae Masatomo (Tokyo JPX) Kogano Takayoshi (Tokyo JPX) Ito Fumio (Tokyo JPX), Processing apparatus.
  18. Ushikawa Harunori (Sagamihara JPX) Tago Kenji (Kofu JPX), Processing apparatus.
  19. Parikh Mihir (San Jose CA) Bonora Anthony C. (Menlo Park CA), Sealable transportable container having a particle filtering system.
  20. Bonora Anthony C. (Menlo Park CA) Rosenquist Frederick T. (Redwood City CA) Jain Sudhir (Milpitas CA) Davis Mark R. (Campbell CA), Sealable transportable container having improved liner.
  21. Bonora Anthony C. (Menlo Park CA) Wartenbergh Robert P. (Woodside CA) Jain Sudhir (Fremont CA) Davis Mark R. (Mountain View CA), Sealable transportable container having improved liner.
  22. Bonora Anthony C. ; Rosenquist Frederick T. ; Jain Sudhir ; Davis Mark R., Sealable, transportable container having a breather assembly.
  23. Shimada Masakazu,JPX, Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method fo.
  24. Grohrock Peter (Hoehenkirchen DEX), Transport container with an interchangeable inside container.
  25. Bonora Anthony C. ; Wartenbergh Robert P. ; Gomes Christopher, Two stage valve for charging and/or vacuum relief of pods.
  26. Inoue Yosuke (Ibaraki JPX) Suzuki Takaya (Katsuta JPX) Okamura Masahiro (Tokyo JPX) Akiyama Noboru (Hitachi JPX) Fujita Masato (Yamanashi JPX) Tochikubo Hiroo (Tokyo JPX) Iida Shinya (Tama JPX), Vapor phase growth on semiconductor wafers.
  27. Miyazaki Shinji (Yokohama JPX) Mikata Yuichi (Kawasaki JPX) Moriya Takahiko (Yokohama JPX) Niino Reiji (Kofu JPX) Nishimura Motohiko (Yamanashi JPX), Vertically oriented CVD apparatus including gas inlet tube having gas injection holes.
  28. Takanabe Eiichiro (Kanagawa JPX), Wafers transferring method in vertical type heat treatment apparatus and the vertical type heat treatment apparatus prov.

이 특허를 인용한 특허 (44)

  1. Goodwin,William M.; Kishkovich,Oleg P.; Grayfer,Anatoly, Air handling and chemical filtration system and method.
  2. Chen, San-Pen; Wu, Shun-Lian; Wang, William, Apparatus and method for preventing a wafer mapping system of an SMIF system from being polluted by corrosive gases remaining on wafers.
  3. Wilson, Jay, Apparatus and methods for lubricant filtration and drum pump filtration system.
  4. Koehler, Don, Apparatus and methods for management of fluid condition.
  5. Takahara, Masahiro; Ueda, Toshihito, Article storage facility and article storage method.
  6. Kim, Ki-Hyun; Im, Ki-Vin; Choi, Hoon-Sang; Han, Moon-Hyeong, Atomic layer deposition apparatus.
  7. Kim, Ki-Hyun; Im, Ki-Vin; Choi, Hoon-Sang; Han, Moon-Hyeong, Atomic layer deposition apparatus.
  8. Fosnight, William; Banner, Isaac Sarek; Miner, Stephen Bradley, Automated mechanical handling systems for integrated circuit fabrication, system computers programmed for use therein, and methods of handling a wafer carrier having an inlet port and an outlet port.
  9. Hara, Shiro, Coupling system.
  10. Bloch, Heinz P.; Thomas, Rojean; Freeland, Daniel; Malinowski, Jeffrey T, Flinger disc.
  11. Ku, Chen-Wei; Lu, Shao-Wei; Chiu, Ming-Long, Front opening unified pod disposed with purgeable supporting module.
  12. Natsume, Mitsuo; Ochiai, Mitsutoshi; Mizokawa, Takumi, Gas charging apparatus, gas discharging apparatus, gas charging method, and gas discharging method.
  13. Shih,Shih Hao; Chen,Wei Chen; Luo,Chi Chen; Liu,Hsin Cheng; Lin,Andy, Gas conduit for a load lock chamber.
  14. Wang, Sheng-Hung; Chiu, Ming-Long, Gas filling apparatus.
  15. Wang, Sheng-Hung; Chiu, Ming-Long, Gas filling apparatus.
  16. Shuen, Pan Yung; Chen, Li Nien, Gas filling apparatus for photomask box.
  17. Murata, Masanao; Yamaji, Takashi, Gas injection device and assisting member.
  18. Natsume, Mitsuo; Kawahisa, Shin; Mizokawa, Takumi, Load port.
  19. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispenser.
  20. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispenser.
  21. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispenser.
  22. Gundrum, Daniel; Scherer, Nicholas, Lubricant dispenser with nozzle.
  23. Jung, Jim; Freeland, Dan; Corgiat, Nick; Kiepert, Lisa; Gundrum, Dan, Lubricant dispensing nozzle.
  24. Favre, Arnaud; Bounouar, Julien, Method and device for controlling the manufacture of semiconductor by measuring contamination.
  25. Miyajima, Toshihiko; Iwamoto, Tadamasa; Emoto, Jun, Pod and purge system using the same.
  26. Burns, John; Smith, Mark V.; Fuller, Matthew A., Porous barrier for evenly distributed purge gas in a microenvironment.
  27. Burns, John; Smith, Mark; Fuller, Matthew, Porous barrier for evenly distributed purge gas in a microenvironment.
  28. Wilson, Jay, Portable lubricant filtration system and method.
  29. Rice, Michael Robert; Hudgens, Jeffrey C., Sealed substrate carriers and systems and methods for transporting substrates.
  30. Rice, Michael Robert; Hudgens, Jeffrey C., Sealed substrate carriers and systems and methods for transporting substrates.
  31. Chiu, Chih-Ching; Lu, Pao-Yi, Sealing apparatus with interlocking air inflation device for wafer carrier.
  32. Thovex, Cindy; Bounouar, Julien; Favre, Arnaud, Station and method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure.
  33. Yu,Chen Hua; Hsiao,Yi Li, Substrate carrier and facility interface and apparatus including same.
  34. Okabe, Tsutomu; Miyajima, Toshihiko, Substrate storage pod with replacement function of clean gas.
  35. Kishkovich, Oleg P.; Gabarre, Xavier; Goodwin, William M.; Lo, James; Scoggins, Troy, System for purging reticle storage.
  36. Matsumoto,Ken, Transport apparatus.
  37. Matsumoto,Ken, Transport apparatus.
  38. Rioufrays, Sylvain; Godot, Erwan; Favre, Arnaud, Treatment device for transport and storage boxes.
  39. Fosnight, William J.; Waite, Stephanie; Miner, Stephen B.; Robinson, John, Wafer carrier purge apparatuses, automated mechanical handling systems including the same, and methods of handling a wafer carrier during integrated circuit fabrication.
  40. Fosnight, William J.; Waite, Stephanie; Miner, Stephen B.; Robinson, John, Wafer carrier purge apparatuses, automated mechanical handling systems including the same, and methods of handling a wafer carrier during integrated circuit fabrication.
  41. Ku, Chen-Wei; Lu, Shao-Wei; Chiu, Ming-Long, Wafer container with at least one purgeable supporting module having a long slot.
  42. Watson, James A.; Burns, John; Forbes, Martin L.; Fuller, Matthew A.; Smith, Mark V., Wafer container with tubular environmental control components.
  43. Watson, James A.; Burns, John; Forbes, Martin L.; Fuller, Matthew A.; Smith, Mark V., Wafer container with tubular environmental control components.
  44. Bonora, Anthony C., Workpiece support structures and apparatus for accessing same.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로