초록 ▼

A composition for film formation which is useful as an interlayer insulating film material in the production of semiconductor devices and the like, and gives a coating film having excellent uniformity, low dielectric constant, low leakage current and excellent storage stability; and a material for i

A composition for film formation which is useful as an interlayer insulating film material in the production of semiconductor devices and the like, and gives a coating film having excellent uniformity, low dielectric constant, low leakage current and excellent storage stability; and a material for insulating film formation using the composition.The composition comprises(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of(A-1) compounds represented by the formula (1): R1aSi(OR2)4-a, and(A-2) compounds represented by the formula (2): R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c; and(B) a compound represented by the formula (3): R8O (CHCH3CH2O)eR9.

대표청구항 ▼

1. A composition for film formation which comprises:(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1): R1aSi(OR2)4-a (1) wherein R1 represents hydro

1. A composition for film formation which comprises:(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1): R1aSi(OR2)4-a (1) wherein R1 represents hydrogen atom, fluorine atom or a monovalent organic group; R2 represents a monovalent organic group; and a is an integer of 0 to 2, and (A-2) compounds represented by the following formula (2): R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c (2) wherein R3, R4, R5 and R6 may be the same or different and each represent a monovalent organic group; b and c may be the same or different and each represent a number of 0 to 2; R7 represents oxygen atom or a group represented by -(CH2)n-, wherein n is 1 to 6; and d is 0 or 1; and(B) a compound represented by the following formula (3): R8O(CHCH3CH2O)eR9 (3) wherein R8 and R9 each independently represent hydrogen atom or a monovalent organic group selected from alkyl groups having 1 to 4 carbon atoms and CH3CO-, provided that one of R8 and R9 is not hydrogen atom; and e is an integer of 1 or 2, and which further comprises at least one compound selected from the group consisting of .beta.-diketones, polyethers and poly(meth)acrylates.