초록 ▼

Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected into the lower end of the tank and allowed to overflow at the upper end. One solution has one part ammonium hydroxide, two parts hydrogen peroxi

Semiconductor wafers are positioned in a cleaning tank and subjected to sequential flows of one or more highly diluted cleaning solutions that are injected into the lower end of the tank and allowed to overflow at the upper end. One solution has one part ammonium hydroxide, two parts hydrogen peroxide, and 300-600 parts deionized water together with a trace of high purity surfactant. Rinsing water is flowed through the tank after the first solution is dumped. A second solution has highly dilute hydrofluoric acid. A third solution is more dilute than the first solution. A fourth solution contains hydrochloric acid greatly diluted with deionized water. The solutions are initiated either by injecting the chemicals into an incoming DI water line or directly into the tank. The cleaning tank is provided with a megasonic generator in its lower portion for selective application of megasonic energy. Quick dump valves in the tank bottom enable the solutions to be quickly dumped followed by one or more rinse steps, including a quick refill while spraying and then dumping of the rinsing water.

대표청구항 ▼

1. A method of cleaning a semiconductor substrate comprising the steps of:positioning one or more substrates in a tank with flat sides of the substrates extending generally upwardly; introducing a highly diluted cleaning solution into the tank; quickly dumping the solution from the tank; introducing

1. A method of cleaning a semiconductor substrate comprising the steps of:positioning one or more substrates in a tank with flat sides of the substrates extending generally upwardly; introducing a highly diluted cleaning solution into the tank; quickly dumping the solution from the tank; introducing a rinsing fluid into a lower end of the tank causing the substrates to be immersed in the fluid as the fluid rises in the tank; applying megasonic energy to the rinsing fluid as it is engaging said substrate sides and rising in the tank; and sensing a level of fluid in the tank to initiate the step of applying said megasonic energy.