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특허 상세정보

Apparatus for separation and recovery of liquid and slurry abrasives used for polishing

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B08B-013/00   
미국특허분류(USC) 210/0961; 210/418; 134/109; 134/902
출원번호 US-0299697 (1999-04-26)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    Fulwider Patton Lee & Utecht, LLP
인용정보 피인용 횟수 : 19  인용 특허 : 39
초록

Abrasive components and clear fluids are separated from an aqueous chemical mechanical slurry used for planarization of semiconductor materials, to permit the reuse of the clear liquid effluent in non-process applications as well as for gray water for irrigation, process cooling water, or as make-up water for a reverse osmosis system, or safe disposal in the industrial waste stream, as desired. A solids detection device determines the concentration of abrasive solids in the aqueous waste effluent stream, and a diverter receives and diverts the entire aqu...

대표
청구항

1. An apparatus for the chemical mechanical planarization of semiconductor wafers, the apparatus comprising:a polishing tool having at least one inlet for introducing fluid into the polishing tool, and a polishing tool outlet for passing an aqueous slurry waste stream containing abrasive materials on an irregular basis; a solids detection apparatus for determining a concentration of abrasive solids in the aqueous slurry waste stream which passes through the polishing tool outlet, the aqueous slurry waste stream being conducted from the polishing tool out...

이 특허에 인용된 특허 (39)

  1. Axenko Alexandr A. (ulitsa Bairona ; 152 ; kv. 25 Kharkov SUX) Nazarian Miron M. (ulitsa Bljukhera ; 13 ; kv. 138 Kharkov SUX) Kolyada Vladimir A. (ulitsa Petrozavodskaya ; 91a ; kv. 30 Kharkov SUX) . Apparatus for electrochemical purification of contaminated liquids. USP1983114414091.
  2. McConnell Christopher F. (Gulph Mills PA) Walter Alan E. (Exton PA). Apparatus for treating wafers with process fluids. USP1990044917123.
  3. Morgart James R. (Stillman Valley IL) Filson James L. (Rockford IL) Peters Jeffery J. (Loves Park IL) Bhave Ramesh R. (Cranberry Township ; Venango County PA). Bacteria removal by ceramic microfiltration. USP1993095242595.
  4. Shiver Carolyn (Church Point LA). Continuous process for the reclamation of waste drilling fluids. USP1984114482459.
  5. Pitt Gillies D. (Harlow EN). Discharge system for ballast tank or the like. USP1977124064893.
  6. Mahoney Robert F. (126 Cherry St. Edinboro PA 16412). Electrodynamic fluid treatment system. USP1997105681457.
  7. Ivory Cornelius F. (Pullman) Gobie William A. (Pullman WA). Electrophoretic processor and methods. USP1993045200050.
  8. Heiligman Randy B. (2301 Indian Road West Minnetonka MN 55343). Faucet-mounted water filter with wall inlet and annular chamber. USP1991055017286.
  9. Shettel Don L. (Bloomfield Hills MI). Liquid treating method and apparatus. USP1976073970536.
  10. Anderson Marc A. (Madison WI) Xu Qunyin (Madison WI). Metal oxide porous ceramic membranes with small pore sizes. USP1991045006248.
  11. Scott Charles D. (Oak Ridge TN). Method and apparatus for continuous annular electrochromatography. USP1987074683042.
  12. Watson Jack S. (Knoxville TN). Method and apparatus for continuous electrophoresis. USP1992015082541.
  13. Nazarian Miron M. (ulitsa Bljukhera ; 13 ; kv. 138 Kharkov SUX) Efimov Vyacheslav T. (ulitsa Sumskaya ; 59 ; Kv. 2 Kharkov SUX) Axenko Alexandr A. (ulitsa Bairona ; 152 ; kv. 25 Kharkov SUX) Kolyada . Method and apparatus for electrochemical purification of contaminated liquids. USP1981104295946.
  14. Wildermuth Glen W. (472 Tree Top La. Des Peres MO 63122). Method and apparatus for purifying liquids. USP1992075128043.
  15. Yorita Hiroshi,JPX ; Yoshikawa Takashi,JPX. Method and apparatus for reclaiming used working fluid. USP1998065772900.
  16. Reber William L. (Schaumburg IL). Method for monitoring and controlling a filtration process. USP1997105681482.
  17. Vicard Jean-Francois (Lyon FR). Method for separating solid pollutants from fluids. USP1977044017390.
  18. Halff Albert H. (3514 Rock Creek Dr. Dallas TX 75225) Reid Allen F. (4736 Reservoir Rd. Geneseo NY 11454). Method for separation and removal of impurities from liquids. USP1994125372725.
  19. Reid Allen F. (4736 Reservoir Rd. Geneseo NY 11454) Halff Albert H. (3514 Rock Creek Dr. Dallas TX 75225). Method for separation and removal of impurities from liquids. USP1995065425883.
  20. Bradtmller Werner (Oelde DEX). Method of and apparatus for optimizing the clarified phase and concentration of solids in a continuous solids-discharge. USP1984104475897.
  21. Pauliukonis Richard S. (6660 Greenbriar Dr. Cleveland OH 44130). Momentary contact reversing diverter. USP1980114231399.
  22. Hirose Kaoru (Kochi JPX). Muddy and waste water treatment method. USP1994085338459.
  23. Burgess Larry W. (Tigard OR). Multilayer circuit board manufacturing. USP1987024642160.
  24. Maier Wilhelm F. (Mlheim/Ruhr DEX). Procedure for the preparation of microporous ceramic membranes for the separation of gas and liquid mixtures. USP1993105250184.
  25. Saito Takayuki (Kanagawa JPX) Nakajima Ken (Kanagawa JPX) Iwase Yoki (Kanagawa JPX) Ikeda Yukio (Tokyo JPX) Shima Hiroyuki (Kanagawa JPX). Process and system for purifying pure water or ultrapure water. USP1991125073268.
  26. Kapur Vijay K. (Northridge CA) Khanna Ashok K. (Northridge CA). Process for recovery of high purity silicon. USP1983064388080.
  27. Burggraaf Anthonie J. (Enschede NLX) Keizer Klaas (Enschede NLX) Zaspalis Cassilis T. (Enschede NLX). Process for the preparation of a binary membrane top layer. USP1991075030351.
  28. Filson James L. (Rockford IL) Bhave Ramesh R. (Cranberry Township ; Butler County PA) Morgart James R. (Stillman Valley Township ; Ogle County IL) Graaskamp James M. (Machesney Park IL). Pyrogens separations by ceramic ultrafiltration. USP1992045104546.
  29. Wierzbicki Alexander (Southport EN). Quick acting valves. USP1976073971412.
  30. Adams John A. ; Krulik Gerald A.. Rinse water recycling method for semiconductor wafer processing equipment. USP1999015855792.
  31. Bier Milan (Tucson AZ). Rotating apparatus for isoelectric focusing. USP1986054588492.
  32. Chorkey William J. (34300 Lyncroft Farmington MI 48024). Solenoid operated valve with balancing means. USP1986074598736.
  33. Anderson John (2109 Yosemite Dr. Milpitas CA 95035). Three way valve. USP1985084535821.
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  35. Hoover ; Fred Wayne ; Roberts ; Robert Earl. Ultrafiltration device. USP1978014069157.
  36. Ramirez Ernest R. (Lemont IL) Johnson Dennis L. (Woodridge IL). Vortex coagulation means and method for wastewater clarification. USP1977064031006.
  37. Grutzner John B. (W. Lafayette IN) Pellechia Perry J. (W. Lafayette IN). Vortex stabilized electrophoretic separation apparatus. USP1990024900421.
  38. Aoki Shoji,JPX. Waste water classifying recovery apparatus in wafer cleaning system. USP2001016178975.
  39. Hewitt David Edward (Hopkinton MA) Dando Thomas Joseph (Southboro MA). Water recycle treatment system for use in metal processing. USP1976083973987.

이 특허를 인용한 특허 피인용횟수: 19

  1. Gary L. Corlett ; Edward T. Ferri, Jr. ; J. Tobin Geatz. Apparatus and process for separation and recovery of liquid and slurry abrasives used for polishing. USP2002116482325.
  2. Sanborn, Michael; McGee, Todd; Macdonell, Mark; Kosch, Scott. Apparatus for treating pharmaceutical waste. USP20180810046993.
  3. Liu, Li-Chung; Chen, Yi-Nan; Liu, Hsien-Wen. Chemical mechanical polishing system. USP2014038662963.
  4. Huang, Cheng-Chung; Sung, Kun-Sen. Drained water recovery system and method for operating the same. USP2005106953044.
  5. Käske, Egon. Filter device and filter method. USP2013048409429.
  6. Osuda,Hiroshi; Matoba,Toru; Fukuizumi,Masataka. Method and apparatus for reuse of abrasive fluid used in the manufacture of semiconductors. USP2006057052599.
  7. Abe, Mitsugu; Iiyama, Masamitsu. Method for recovering a used slurry. USP2012068202429.
  8. Moore, Scott E.; Meikle, Scott G.; Crum, Magdel. Semiconductor processor systems, a system configured to provide a semiconductor workpiece process fluid. USP2009057530877.
  9. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel. Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods. USP2007027180591.
  10. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel. Semiconductor workpiece processing methods. USP2006107118447.
  11. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel. Semiconductor workpiece processing methods. USP2006107118455.
  12. Moore,Scott E.; Meikle,Scott G.; Crum,Magdel. Semiconductor workpiece processing methods, a method of preparing semiconductor workpiece process fluid, and a method of delivering semiconductor workpiece process fluid to a semiconductor processor. USP2006107118445.
  13. Chang, Jung Hoon; Lee, Kwang Jun; Park, Jin Goo. Slurry recycling system and method for CMP apparatus. USP2005036866784.
  14. Byers, Gary Allen; Derecskei, Bela; Bayer, Benjamin Patrick. Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture. USP2017099770804.
  15. Donoghue, Michael L.; Banis, James M.; Booth, Barbara E.. System and method for harvested water irrigation. USP2012068191307.
  16. Mizuno, Toshiaki. Tank unit for grinding water used in processing eyeglass lens, and eyeglass lens processing apparatus having the same. USP2003066572460.
  17. Moore, Scott E.; Meikle, Scott G.; Crum, Magdel. Turbidity monitoring methods, apparatuses, and sensors. USP2009057538880.
  18. Oey Hewett, Joyce S.; Pasadyn, Alexander J.. Use of slurry waste composition to determine the amount of metal removed during chemical mechanical polishing, and system for accomplishing same. USP2004076764868.
  19. Gaudet, Gregory; Grumbine, Steven; Naguib, Nevin; Batllo, Francois. Wire saw slurry recycling process. USP2013048425639.