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Field emission tips and methods for fabricating the same

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/00
출원번호 US-0559153 (2000-04-26)
발명자 / 주소
  • Guy T. Blalock
  • Sanh D. Tang
  • Zhaohui Huang
출원인 / 주소
  • Micron Technology, Inc.
대리인 / 주소
    TraskBritt
인용정보 피인용 횟수 : 8  인용 특허 : 18

초록

The present invention relates to field emitters and methods of fabricating the same wherein the field emission tips of the field emitters are formed by utilization of a facet etch. An etch mask is patterned on a conductive substrate in the locations desired for subsequently formed field emission tip

대표청구항

1. A method for fabricating a tip of a field emission array, comprising: forming a structure with substantially vertical sidewalls, an upper surface, and at least one cornerat an edge of said upper surface, said structure comprising at least one of semiconductive material and conductive material; an

이 특허에 인용된 특허 (18)

  1. Jacobson Susan E. (Edgware GB3) Lee Rosemary A. (Northwood GB3) Williams Helen A. (High Wycombe GB3), Electronic devices.
  2. Huang Jammy C. (Taipei TWX) Liu David N. (Hsinchu TWX), Fabrication of high aspect ratio spacers for field emission display.
  3. Lee Edward C. (Dallas TX), Field emission device cathode and method of fabrication.
  4. Scoggan John W. (Southlake TX) Lee Edward C. (Dallas TX), Field emission device cathode and method of fabrication.
  5. Jin Sungho (Millington NJ) Kochanski Gregory Peter (Dunellen NJ) Zhu Wei (North Plainfield NJ), Field emission devices employing improved emitters on metal foil and methods for making such devices.
  6. Sung Kang H. (Seoul KRX) Huh Chang W. (Seoul KRX), Field emission display and method for fabricating the same.
  7. Itoh Shigeo (Mobara JPX) Watanabe Teruo (Mobara JPX) Nakata Hisashi (Mobara JPX) Nishimura Norio (Mobara JPX) Itoh Junji (Tsukuba JPX) Kanemaru Seigo (Tsukuba JPX), Field emission element and process for manufacturing same.
  8. Cathey David A. (Boise ID) Rolfson J. Brett (Boise ID) Lowrey Tyler A. (Boise ID) Doan Trung T. (Boise ID), Field emission structures produced on macro-grain polysilicon substrates.
  9. Cathey David A. (Boise ID) Rolfson J. Brett (Boise ID) Lowrey Tyler A. (Boise ID) Doan Trung T. (Boise ID), Field emission structures produced on macro-grain polysilicon substrates.
  10. Fukuta Shinya (Kawasaki JPX) Betsui Keiichi (Kawasaki JPX), Field emitter array and cleaning method of the same.
  11. Cathey ; Jr. David A. (Boise ID) Browing Jim J. (Boise ID), Interelectrode spacers for display devices including field emission displays.
  12. Kim Jong-min (Seoul KRX) Park Nam-sin (Suwon KRX), Method for fabricating a field emission display.
  13. Cathey David A. (Boise ID), Method for forming electron emitters.
  14. Cheng Huang-Chung (Hsinchu TWX) Ku Tzu-Kun (Taipei TWX), Method of fabricating a field emission device.
  15. Kim Jong-min (Seoul KRX), Method of fabricating a field emission device.
  16. Kumar Nalin (Austin TX), Method of making a field emitter device using randomly located nuclei as an etch mask.
  17. Doan Trung T. (Boise ID) Rolfson J. Brett (Boise ID) Lowrey Tyler A. (Boise ID) Cathey David A. (Boise ID), Method to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technol.
  18. Jones Gary Wayne (Raleigh NC) Sune Ching-Tzong (Raleigh NC), Methods of making vertical microelectronic field emission devices.

이 특허를 인용한 특허 (8)

  1. Adamec, Pavel; Kleinschmidt, Harry, Emitter for an electron beam, electron beam device and method for producing and operating an electron emitter.
  2. Schultz, William G.; Delgado, Gildardo R.; Hill, Frances; Garcia Berrios, Edgardo; Garcia, Rudy, High brightness boron-containing electron beam emitters for use in a vacuum environment.
  3. Guerrera, Stephen Angelo; Akinwande, Akintunde I., Individually switched field emission arrays.
  4. Ozgur, Mehmet; Sunal, Paul; Oh, Lance; Huff, Michael; Pedersen, Michael, Method for the fabrication of electron field emission devices including carbon nanotube field electron emisson devices.
  5. Haller, Gordon A.; Tang, Sanh D., Methods of fabricating an access transistor for an integrated circuit device, methods of fabricating periphery transistors and access transistors, and methods of fabricating an access device comprising access transistors in an access circuitry region and peripheral transistors in a peripheral circuitry region spaced from the access circuitry region.
  6. Haller, Gordon A.; Tang, Sanh D., Methods of fabricating an access transistor having a polysilicon-comprising plug on individual of opposing sides of gate material.
  7. Cheng, Huang-Chung; Tarntair, Fu-Gom; Lin, Chia-Pin, Process for forming field emission electrode for manufacturing field emission array.
  8. Fomani, Arash Akhavan; Velasquez-Garcia, Luis Fernando; Akinwande, Akintunde Ibitayo, Self-aligned gated emitter tip arrays.
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