초록 ▼

A two carbon atom linkage alkanolamine compound composition comprises the two carbon atom linkage alkanolamine compound, gallic acid or catechol, and optionally, an aqueous hydroxylamine solution. The balance of the composition is made up of water, preferably high purity deionized water, or another

A two carbon atom linkage alkanolamine compound composition comprises the two carbon atom linkage alkanolamine compound, gallic acid or catechol, and optionally, an aqueous hydroxylamine solution. The balance of the composition is made up of water, preferably high purity deionized water, or another suitable polar solvent. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, comprises contacting the substrate with the composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of the two carbon atom linkage alkanolamine compound in the composition and process provides superior residue removal without attacking titanium or other metallurgy, oxide or nitride layers on the substrate.

대표청구항 ▼

1. A process for removal of residue from a substrate, which comprises contacting the substrate with a composition comprising:(a) alkanolamine compound selected from the group consisting of monoethanolamine, isopropanolamine, 2-amino-1-propanol, and diglycolamine, (b) a chelating agent (c) an aqueous

1. A process for removal of residue from a substrate, which comprises contacting the substrate with a composition comprising:(a) alkanolamine compound selected from the group consisting of monoethanolamine, isopropanolamine, 2-amino-1-propanol, and diglycolamine, (b) a chelating agent (c) an aqueous hydroxylamine solution, and (d) a polar organic solvent for a time and at a temperature sufficient to remove the residue from the substrate.