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Attachment chemistry for organic molecules to silicon 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-033/68
  • B05D-001/36
출원번호 US-0456556 (1999-12-08)
발명자 / 주소
  • Xiaoyang Zhu
  • Hongjun Yang
출원인 / 주소
  • Regents of the University of Minnesota
대리인 / 주소
    Blank Rome Comiskey & McCauley
인용정보 피인용 횟수 : 73  인용 특허 : 7

초록

A simple chemical approach for the covalent assembly of organic molecules on silicon surfaces via robust linkages is provided. This is achieved by the efficient reaction between a nucleophilic functional group and a halogenated Si surface. The nucleophile anchor is the bridge between two surface Si

대표청구항

1. A method for attaching organic molecules to a silicon surface comprising reacting a nucleophilic organic molecule with a halogenated silicon surface, wherein said nucleophilic organic molecule contains a nucleophilic functionality selected from the group consisting of amines, .dbd.NH, -OH, -SH, -

이 특허에 인용된 특허 (7)

  1. Kumar Amit ; Jang Larry Sheldon ; Leung Danton Kai-Yu ; Rocco Richard Michele ; Platshon Mark Charles, Immunoassays in capillary tubes.
  2. Beattie Kenneth L., Microfabricated, flowthrough porous apparatus for discrete detection of binding reactions.
  3. Linford Matthew B (Salt Lake City UT) Chidsey Christopher E. D. (San Francisco CA), Molecular layers covalently bonded to silicon surfaces.
  4. Hamers Robert J. ; Hovis Jennifer S. ; Lee Seung Y., Ordered organic monolayers and methods of preparation thereof.
  5. Barrett Ronald W. (Sunnyvale CA) Pirrung Michael C. (Durham NC) Stryer Lubert (Stanford CA) Holmes Christopher P. (Sunnyvale CA) Sundberg Steven A. (San Francisco CA), Spatially-addressable immobilization of anti-ligands on surfaces.
  6. Glajch Joseph L. (Wilmington DE) Kirkland Joseph J. (Wilmington DE), Substrates coated with organo-silanes that are sterically-protected.
  7. Pesek Joseph J. (4142 Rosenbaum Ave. San Jose CA 95136) Swedberg Sally A. (793 Allen Ct. Palo Alto CA 94303), Surface-modified chromatographic separation material.

이 특허를 인용한 특허 (73)

  1. Tian, Fangyuan; Taber, Douglass F.; Teplyakov, Andrew V., -NH- terminated silicon surface and a method for its preparation.
  2. Millward, Dan B.; Westmoreland, Donald; Sandhu, Gurtej, Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces.
  3. Millward, Dan B.; Westmoreland, Donald; Sandhu, Gurtej, Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces.
  4. Millward, Dan B.; Westmoreland, Donald; Sandhu, Gurtej, Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces.
  5. Millward, Dan B., Crosslinkable graft polymer non preferentially wetted by polystyrene and polyethylene oxide.
  6. Millward, Dan B., Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide.
  7. Millward, Dan B., Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide.
  8. Schechner, Gallus; Hauptmann, Holger; Dittmann, Rainer K.; Schnagl, Hans R., Dental ceramic article, process of production and use thereof.
  9. Kambe, Nobuyuki; Chiruvolu, Shivkumar, Dispersions of blends of silicon nanoparticles and silica nanoparticles.
  10. Kambe, Nobuyuki; Chiruvol, Shivkumar, Dispersions of silicon nanoparticles.
  11. Kambe, Nobuyuki, Dispersions of submicron doped silicon particles.
  12. Kambe, Nobuyuki; Chiruvolu, Shivkumar, Dispersions of submicron doped silicon particles.
  13. Millward, Dan B., Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method.
  14. Millward, Dan B., Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method.
  15. Millward, Dan B., Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method.
  16. Buriak, Jillian M.; Stewart, Michael P.; Robins, Edward, Functionalized silicon surfaces.
  17. Millward, Dan B.; Westmoreland, Donald, Graphoepitaxial self-assembly of arrays of downward facing half-cylinders.
  18. Millward, Dan B.; Westmoreland, Donald, Graphoepitaxial self-assembly of arrays of downward facing half-cylinders.
  19. Porter, Jeff; Mehigh, Richard, Method for extracting a target product from a host cell employing zwitterionic detergent combinations.
  20. Wessels, Jurina; Ford, William E.; Yasuda, Akio, Method of activating a silicon surface for subsequent patterning of molecules onto said surface.
  21. Kloster,Grant M.; Staintes,David; Ramanathan,Shriram, Method of forming a stacked device filler.
  22. Millward, Dan B.; Sandhu, Gurtej S., Method to produce nanometer-sized features with directed assembly of block copolymers.
  23. Bi, Xiangxin; Kambe, Nobuyuki; Gardner, James T.; Mosso, Ronald J.; Chiruvolu, Shivkumar; Kumar, Sujeet; McGovern, William E., Methods for synthesizing submicron doped silicon particles.
  24. Millward, Dan B.; Quick, Timothy A., Methods of forming a nanostructured polymer material including block copolymer materials.
  25. Millward, Dan B., Methods of forming a stamp and a stamp.
  26. Millward, Dan B., Methods of forming an array of openings in a substrate, and related methods of forming a semiconductor device structure.
  27. Millward, Dan B.; Sills, Scott E., Methods of forming block copolymers, and block copolymer compositions.
  28. Hendricks, Nicholas; Olson, Adam L.; Brown, William R.; Eom, Ho Seop; Chen, Xue; Jain, Kaveri; Schuldenfrei, Scott, Methods of forming nanostructures including metal oxides.
  29. Sills, Scott E.; Millward, Dan B., Methods of forming semiconductor device structures.
  30. Millward, Dan B.; Quick, Timothy A.; Greeley, J. Neil, Methods of forming semiconductor device structures including metal oxide structures.
  31. Khurana, Ranjan; Lugani, Gurpreet S.; Millward, Dan B., Methods of forming semiconductor device structures, and related semiconductor device structures.
  32. Sills, Scott E.; Millward, Dan B., Methods of forming semiconductor device structures, and related structures.
  33. Regner, Jennifer Kahl, Methods of improving long range order in self-assembly of block copolymer films with ionic liquids.
  34. Regner, Jennifer Kahl, Methods of improving long range order in self-assembly of block copolymer films with ionic liquids.
  35. Regner, Jennifer Kahl, Methods of improving long range order in self-assembly of block copolymer films with ionic liquids and materials produced therefrom.
  36. Marsh, Eugene P.; Millward, Dan B., Methods of patterning a substrate including multilayer antireflection coatings.
  37. Mirkin, Chad A.; Piner, Richard; Hong, Seunghun, Methods utilizing scanning probe microscope tips and products therefor or produced thereby.
  38. Millward, Dan B., Multi-layer method for formation of registered arrays of cylindrical pores in polymer films.
  39. Millward, Dan B.; Stuen, Karl, One-dimensional arrays of block copolymer cylinders and applications thereof.
  40. Millward, Dan B.; Stuen, Karl, One-dimensional arrays of block copolymer cylinders and applications thereof.
  41. Buriak, Jillian M.; Hurley, Patrick T., Patterned functionalized silicon surfaces.
  42. Millward, Dan B., Polymer materials for formation of registered arrays of cylindrical pores.
  43. Millward, Dan B.; Westmoreland, Donald L., Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials.
  44. Millward, Dan B.; Westmoreland, Donald L., Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials.
  45. Li, Weidong; Soeda, Masaya; Pengra-Leung, Gina Elizabeth; Chiruvolu, Shivkumar, Printable inks with silicon/germanium based nanoparticles with high viscosity alcohol solvents.
  46. Millward, Dan B.; Marsh, Eugene P., Registered structure formation via the application of directed thermal energy to diblock copolymer films.
  47. Millward, Dan B.; Marsh, Eugene P., Registered structure formation via the application of directed thermal energy to diblock copolymer films.
  48. Raghu, Prashant; Yang, Yi, Selective wet etching of hafnium aluminum oxide films.
  49. Raghu, Prashant; Yang, Yi, Selective wet etching of hafnium aluminum oxide films.
  50. Hendricks, Nicholas; Olson, Adam L.; Brown, William R.; Eom, Ho Seop; Chen, Xue; Jain, Kaveri; Schuldenfrei, Scott, Self-assembled nanostructures including metal oxides and semiconductor structures comprised thereof.
  51. Logue, Brian A.; Farrakh Baroughi, Mahdi; Mallam, Venkataiah, Self-assembled organic monolayer hybrid materials and methods thereof.
  52. Millward, Dan B.; Quick, Timothy A.; Greeley, J. Neil, Semiconductor device structures including metal oxide structures.
  53. Millward, Dan B.; Quick, Timothy A.; Greeley, J. Neil, Semiconductor structures including polymer material permeated with metal oxide.
  54. Kambe, Nobuyuki, Silicon nanoparticle dispersions.
  55. Kambe, Nobuyuki, Silicon nanoparticle dispersions.
  56. Chiruvolu, Shivkumar; Altman, Igor; Frey, Bernard M.; Li, Weidong; Liu, Guojun; Lynch, Robert B.; Pengra-Leung, Gina Elizabeth; Srinivasan, Uma, Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods.
  57. Chiruvolu, Shivkumar; Altman, Igor; Frey, Bernard M.; Li, Weidong; Liu, Guojun; Lynch, Robert B.; Pengra-Leung, Gina Elizabeth; Srinivasan, Uma, Silicon/germanium nanoparticles and inks having low metal contamination.
  58. Hieslmair, Henry; Chiruvolu, Shivkumar; Du, Hui, Silicon/germanium oxide particle inks and processes for forming solar cell components and for forming optical components.
  59. Hieslmair, Henry; Dioumaev, Vladimir K.; Chiruvolu, Shivkumar; Du, Hui, Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications.
  60. Zhang, Jun-Ying; Pellerite, Mark J., Silicone mold and use thereof.
  61. Kloster,Grant M.; Goodner,Michael D.; Ramanathan,Shriram; Morrow,Patrick, Stacked device underfill and a method of fabrication.
  62. Millward, Dan B.; Sandhu, Gurtej S., Stamps and methods of forming a pattern on a substrate.
  63. Furukawa,Toshiharu; Holmes,Steven J.; Horak,David V.; Koburger, III,Charles W., Structure and method for forming semiconductor wiring levels using atomic layer deposition.
  64. Millward, Dan B., Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  65. Millward, Dan B., Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  66. Millward, Dan B., Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  67. Millward, Dan B., Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers.
  68. Millward, Dan B.; Westmoreland, Donald L.; Sandhu, Gurtej S., Templates including self-assembled block copolymer films.
  69. Millward, Dan B.; Quick, Timothy, Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference.
  70. Millward, Dan B.; Quick, Timothy, Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference.
  71. Millward, Dan B.; Quick, Timothy A., Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference.
  72. Millward, Dan B., Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly.
  73. Millward, Dan B., Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly.
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