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System and method for transporting and sputter coating a substrate in a sputter deposition system

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/32
출원번호 US-0866114 (2001-05-25)
발명자 / 주소
  • Ke Ling Lee
  • Mikhail Mazur
  • Ken Lee
  • Robert M. Martinson
출원인 / 주소
  • STEAG HamaTech AG DE
대리인 / 주소
    Skjerven Morrill LLP
인용정보 피인용 횟수 : 2  인용 특허 : 34

초록

A plasma sputtering system is described. A substrate handling system thereof places an unprocessed substrate (e.g., an optical disk), an inner mask, and an outer mask onto a tray in a loadlock of the sputtering system, and then seals the access opening to the loadlock. The substrate and the masks ar

대표청구항

1. A method of sputter coating a substrate, said method comprising:loading a substrate, an inner mask, and an outer mask onto a transportable tray in a loadlock of a sputtering system, wherein the inner mask masks a central portion of a first surface of the substrate, and the outer mask masks a peri

이 특허에 인용된 특허 (34)

  1. Boyarsky David (Cherry Hill NJ) Vaughan Robert T. (Cheltenham PA), Apparatus for coating substrate devices.
  2. Reising Michael (Mombris DEX) Kempf Stefan (Alzenau DEX) Konig Michael (Frankfurt DEX), Apparatus for gripping a flat substrate.
  3. Zejda Jaroslav,DEX ; Kempf Stefan,DEX, Apparatus for gripping a flat substrate.
  4. Helms Dirk (Ahrensburg DEX) Katzschner Werner (Berlin DEX) Pawlakowitsch Anton (Alzenau DEX) Anderle Friedrich (Hanau DEX), Apparatus for mounting workpieces.
  5. Walde Michael (Rodenbach DEX) Zejda Jaroslav (Rodenbach DEX), Apparatus for passing workpieces into and out of a coating chamber through locks.
  6. Beardow Terence (Endenfield GB2), Apparatus for sputter coating discs.
  7. Kempf Stefan (Alzenau DEX), Apparatus for synchronizing loading and unloading of substrates with turntable movement in a coating chamber.
  8. Zejda Jaroslav (Rodenbach DEX), Apparatus for the insertion and removal of a mask through the airlock of a vacuum coating apparatus.
  9. Kempf Stefan (Alzenau DEX) Zejda Jaroslav (Rodenbach DEX), Apparatus for the inward and outward transfer of a workpiece in a vacuum chamber.
  10. Kempf Stefan (Alzenau DEX) Sichmann Eggo (Gelnhausen DEX), Apparatus for the transfer of substrates.
  11. Kempf Stefan,DEX ; Konig Michael,DEX, Apparatus for transfer of workpieces into and out of a coating chamber.
  12. Anderle Friedrich (Hanau am Main DEX) Costescu Dan L. (Hainburg DEX) Kempf Stefan (Alzenau DEX) Novak Emmerich (Obertshausen DEX) Zejda Jaroslav (Rodenbach DEX), Apparatus on the carousel principle for coating substrates.
  13. Zejda Jaroslav (Rodenbach DEX), Cathode sputtering system.
  14. Zejda Jaroslav (Rodenbach DEX) Schuhmacher Manfred (Alzenau-Michelbach DEX), Cathode sputtering system.
  15. Kempf Stefan,DEX ; Reising Michael,DEX, Device for gripping and holding substrates.
  16. Kempf Stefan,DEX, Device for masking or covering substrates.
  17. Kempf Stefan (Alzenau DEX), Device for transferring a workpiece into and out from a vacuum chamber.
  18. Kempf Stefan,DEX, Device for transporting substrates.
  19. Ackley James W. (Los Altos CA), Load lock pumping mechanism.
  20. Mack Alfred (Poughkeepsie NY) O\Neill Brian C. (Millbrook NY) Penzetta Fred L. (Wappingers Falls NY), Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing ap.
  21. Zejda Jaroslav (Rodenbach DEX), Mask for covering the margin of a disk-shaped substrate.
  22. LeBlanc ; III Arthur R. ; MacMillan Donald W. ; Parent Donald G. ; Parent Scott R. ; Rossignol Brian C., Metallizing machine.
  23. Kempf Stefan (Alzenau DEX), Method and apparatus for the step-by-step and automatic loading and unloading of a coating apparatus.
  24. Zejda Jaroslav,DEX, Method for masking a disk shaped substrate.
  25. Rubin Richard H. (West Paterson NJ) Hillman Gary (Livingston NJ) Zarr Lewis E. (Sparta NJ) Hayes William K. (Parsippany NJ), Process apparatus and method and elevator mechanism for use in connection therewith.
  26. Steinke Rudi (Hanau DEX) Schittny Stefan (Alzenau-Kaelberau DEX) Kempf Bernd (Freigericht DEX) Groll Werner (Alzenau-Hoerstein DEX), Solder alloy for dental and jewelry parts.
  27. Messer Mark G. (Los Gatos CA) Stark Lawrence R. (San Jose CA), Sputter module for modular wafer processing system.
  28. Kempf Stefan,DEX, Substrate transporting apparatus.
  29. Lee Ke Ling ; Mazur Mikhail ; Lee Ken ; Martinson Robert M., System and method for handling and masking a substrate in a sputter deposition system.
  30. Hutchinson, Martin A.; Shaw, R. Howard; Coad, George, Transfer plate rotation system.
  31. Kawashima Sosuke (Kudamatsu JPX) Ichihashi Kazuaki (Kudamatsu JPX), Vacuum processing apparatus.
  32. Turner Frederick T. (Sunnyvale CA) Hutchinson Martin A. (Santa Clara CA) Shaw R. Howard (Palo Alto CA) Lamont ; Jr. Lawrence T. (Mountain View CA), Wafer coating system.
  33. Dimock Jack A. (Santa Barbara CA), Wafer processing machine.
  34. Garrett Charles B. (San Jose CA), Workpiece lifting and holding apparatus.

이 특허를 인용한 특허 (2)

  1. Rymer,Joseph Patrick; Ricolcol,Rafael, Bond strength of coatings to ceramic components.
  2. Pharand, Michel; Becker, Klaus; Petry, Klaus; LaFontaine, Marvin R.; Mitrano, Michael R., Combination load lock for handling workpieces.
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