초록 ▼

A rotatable sputter target for use in a sputtering system having a sleeve of sputtering material attached to a structural support tube such that an annular space is formed between the inside surface of the sleeve and the outside surface of the support tube. The annular space is at least partly fille

A rotatable sputter target for use in a sputtering system having a sleeve of sputtering material attached to a structural support tube such that an annular space is formed between the inside surface of the sleeve and the outside surface of the support tube. The annular space is at least partly filled with a thermally and electrically conductive material which flows at ambient temperature. The annular space is sealed at either end so that the material cannot escape the annular space.

대표청구항 ▼

1. A sputter target comprising:(a) a tube; (b) a sleeve comprising a sputtering material, said sleeve having an inside diameter greater than the outside diameter of said tube and surrounding said tube in such a manner as to form an annular space between the outside surface of said tube and the insid

1. A sputter target comprising:(a) a tube; (b) a sleeve comprising a sputtering material, said sleeve having an inside diameter greater than the outside diameter of said tube and surrounding said tube in such a manner as to form an annular space between the outside surface of said tube and the inside surface of said sleeve; (c) a thermally conductive material at least partially occupying said annular space, (d) wherein said thermally conductive material comprises a particulate material.