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Pressure controller

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G05D-016/06
출원번호 US-0713776 (2000-11-15)
발명자 / 주소
  • Gerald Bloom
출원인 / 주소
  • Plast-o-Matic Valves, Inc.
대리인 / 주소
    Wolff & Samson
인용정보 피인용 횟수 : 35  인용 특허 : 4

초록

A pressure controller is provided for a pressure regulator. The pressure controller controls a pressure regulator to deliver process fluid at a regulated pressure from a variable supply. The pressure controller includes a control pressure source independent of the process fluid. One such pressure so

대표청구항

1. A pressure controller apparatus for controlling a pressure regulator comprising:a housing including a control chamber and a diaphragm chamber; an inlet in the control chamber for receiving control pressure; an outlet from the control chamber to a pressure regulator; an inlet in the diaphragm cham

이 특허에 인용된 특허 (4)

  1. Risk Daniel W. (Whittier CA), Automatic control valve for a fluid system.
  2. Modes Edward E. (Deerfield IL), Automatic fluid flow regulator.
  3. Johnson ; Dwight N., Pilot regulator.
  4. McNeely Michael D. (Katy TX), Pilot valve for control valves and method of operation.

이 특허를 인용한 특허 (35)

  1. Zhang, Chunze; Li, Wei; Yu, Kai; Liu, Cong, Air curtain device.
  2. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  4. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  5. Ye, Jianming; Simpson, Todd A., Back pressure valve with dynamic pressure control.
  6. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  7. Baarda,Gerrit Jan, Gas flow control.
  8. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  9. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
  10. Jones, William D., High pressure fourier transform infrared cell.
  11. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  12. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  13. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  14. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  15. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  16. Kitt, Douglas Quinten, Method and apparatus for controlling fluid pressure.
  17. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  18. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  19. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  20. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  21. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  22. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  23. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  24. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  25. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  26. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  27. Kolbenschlag, Stefan, Pneumatic amplifier and arrangement for regulating a regulating armature of a process plant.
  28. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  29. Lee, Hsin-Hui, Proactive pressure stabilizing system and method.
  30. Wuester,Christopher D., Process flow thermocouple.
  31. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  32. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  33. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  34. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  35. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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