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Method for making thin film semiconductor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/76
출원번호 US-0616613 (2000-07-14)
우선권정보 JP-0037655 (1995-02-02); JP-0061552 (1996-03-18); JP-0234480 (1996-09-04)
발명자 / 주소
  • Hiroshi Tayanaka JP
출원인 / 주소
  • Sony Corporation JP
대리인 / 주소
    Sonnenschein, Nath & Rosenthal
인용정보 피인용 횟수 : 29  인용 특허 : 6

초록

The present invention provides new and improved methods for making crystalline semiconductor thin films which may be bonded to different kinds of substrates. The thin films may be flexible. In accordance with preferred methods, a multi-layer porous structure including two or more porous layers havin

대표청구항

1. A method for making a thin film semi-conductor comprising the steps of:providing a semi-conductor substrate having a surface; anodizing the semi-conductor substrate to provide a first porous layer adjacent the surface having a first porosity; anodizing the semi-conductor substrate to provide at l

이 특허에 인용된 특허 (6)

  1. Sato Nobuhiko,JPX ; Yonehara Takao,JPX ; Sakaguchi Kiyofumi,JPX, Method for producing semiconductor substrate.
  2. Matsushita Takeshi,JPX ; Tayanaka Hiroshi,JPX, Method for separating a device-forming layer from a base body.
  3. Takenaka Takao (Annaka JPX) Endo Masahisa (Gunma JPX) Yamada Masato (Annaka JPX), Method of making epitaxial wafers.
  4. Bozler Carl O. (Sudbury MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert W. (Weymouth MA), Method of producing sheets of crystalline material.
  5. Sakaguchi Kiyofumi,JPX ; Yonehara Takao,JPX, Process for production of semiconductor substrate.
  6. Yonehara Takao (Atsugi JPX), Semiconductor member and process for preparing semiconductor member.

이 특허를 인용한 특허 (29)

  1. Joshi, Monali B.; Goorsky, Mark S., Composite semiconductor substrates for thin-film device layer transfer.
  2. Kramp, Robert A.; Kisch, Robert A.; Lum, Matthew K., Controlled temperature scrap removal for tape process.
  3. Taylor, Thomas J., Flexible solar panel with a multilayer film.
  4. Gadkaree,Kishor Purushottam, Glass-based semiconductor on insulator structures and methods of making same.
  5. Matsuura, Shingo; Sakumoto, Daisuke, Light emitting device.
  6. Maleville, Christophe, Method for fabricating a semiconductor substrate.
  7. Giesbers, Jacobus Bernardus; Beenhakkers, Monique Johanna; Rijpert, Cornelis Johannus Hermanus Antonius; Gelinck, Gerwin Hermanus; Touwslager, Fredericus Johannes, Method of manufacturing a flexible electronic device and flexible device.
  8. Sato, Nobuhiko; Kido, Shigeru; Momoi, Kazutaka, Method of manufacturing a semiconductor device by forming separation regions which do not extend to the peripherals of a substrate, and structures thereof.
  9. Park,Jin woo; Chung,Ho Kyoon; Song,Seung yong, Method of manufacturing substrate, method of manufacturing organic electroluminescent display device using the method, and organic electroluminescent display device.
  10. Park,Jin woo; Chung,Ho Kyoon; Song,Seung yong, Method of manufacturing substrate, method of manufacturing organic electroluminescent display device using the method, and organic electroluminescent display device.
  11. Takayama, Toru; Goto, Yuugo; Maruyama, Junya; Ohno, Yumiko, Method of transferring a laminate and method of manufacturing a semiconductor device.
  12. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko, Peeling method and method for manufacturing display device using the peeling method.
  13. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko, Peeling method and method for manufacturing display device using the peeling method.
  14. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko, Peeling method and method for manufacturing display device using the peeling method.
  15. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko, Peeling method and method for manufacturing display device using the peeling method.
  16. Yamazaki, Shunpei; Takayama, Toru; Maruyama, Junya; Goto, Yuugo; Ohno, Yumiko, Peeling method and method for manufacturing display device using the peeling method.
  17. Yamazaki, Shunpei; Shimomura, Akihisa, Photoelectric conversion device and method for manufacturing the same.
  18. Puckett,Edward L., Porosity reference standard for ultrasonic inspection of composite materials.
  19. Vaccaro, Christopher M.; Beisiegel, April L.; DeFonce, Ron, Porosity reference standard utilizing a mesh.
  20. Engelbart, Roger W.; Vaccaro, Christopher M.; Beisiegel, April L., Porosity reference standard utilizing one or more hollow, non-cylindrical shafts.
  21. Raskin, Jean Pierre; Lederer, Dimitri; Brunier, François, Process for manufacturing a multilayer structure made from semiconducting materials.
  22. Sakaguchi,Kiyofumi; Yonehara,Takao, Process for production of semiconductor substrate.
  23. Engelbart, Roger W.; Vaccaro, Christopher M.; Beisiegel, April L., Pseudo porosity reference standard for cored composite laminates.
  24. Engelbart, Roger W.; Vaccaro, Christopher M.; Beisiegel, April L., Pseudo porosity reference standard for metallic interleaved composite laminates.
  25. Georgeson, Gary E.; Hafenrichter, Joseph; Lilienthal, David A.; Kennedy, James C.; Harris, Walter J., Reference standard for ultrasonic measurement of porosity and related method.
  26. Yonehara, Takao; Sekiguci, Yoshinobu, Semiconductor substrate, semiconductor device, light emitting diode and producing method therefor.
  27. Vaccaro, Christopher M.; Beisiegel, April L.; Lilienthal, David A., Tapered ultrasonic reference standard.
  28. Sidwell,Steven C.; Coushaine,Charles M.; Lyman,Paul, Thermally efficient LED bulb.
  29. Utsunomiya,Sumio, Thin film circuit device, manufacturing method thereof, electro-optical apparatus, and electronic system.
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