$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

NROM cell with generally decoupled primary and secondary injection 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/8238
출원번호 US-0519745 (2000-03-06)
발명자 / 주소
  • Boaz Eitan IL
출원인 / 주소
  • Saifun Semiconductors Ltd. IL
대리인 / 주소
    Eitan, Pearl, Latzer & Cohen-Zedek
인용정보 피인용 횟수 : 128  인용 특허 : 94

초록

A method of creating a nitride, programmable read only memory (NROM) cell includes the step of decoupling injection of channel hot electrons into a charge trapping layer of the NROM cell from injection of non-channel electrons into the charge trapping layer. The step of decoupling can include the st

대표청구항

1. A method of creating a nitride, programmable read only memo (NROM) cell, the method comprising the step of:decoupling injection of channel hot electrons into a charge trapping layer of said NROM cell from injection of non-channel electrons into said charge trapping layer.

이 특허에 인용된 특허 (94)

  1. Cricchi James R. (Catonsville MD), Common memory gate non-volatile transistor memory.
  2. Chang Kuo-Tung (Austin TX) Chang Ko-Min (Austin TX), Cross-point eeprom memory array.
  3. Diaz Carlos H., Device and method of manufacture for protection against plasma charging damage in advanced MOS technologies.
  4. Hong Gary (Hsin TWX) Ko Joe (Hsinchu TWX), Device for preventing antenna effect on circuit.
  5. Nachumovsky Ishai,ILX, EEPROM array using 2-bit non-volatile memory cells with serial read operations.
  6. Bergemont Albert ; Kalnitsky Alexander, EPROM and flash memory cells with source-side injection and a gate dielectric that traps hot electrons during programming.
  7. Kotecha, Harish N.; Noble, Jr., Wendell P.; Wiedman, III, Francis W., Electrically alterable double dense memory.
  8. Amin Alaaeldin A. M. (Dhahran CA SAX) Brennan ; Jr. James (Saratoga CA), Electrically reprogrammable EPROM cell with merged transistor and optimum area.
  9. Koyama Shoji (Tokyo JPX), Erasable, programmable read-only memory device.
  10. Freiberger Philip E. (Santa Clara CA) Yau Leopoldo D. (Portland OR) Pan Cheng-Sheng (Sunnyvale CA) Sery George E. (San Franciso CA), Fabrication of interpoly dielctric for EPROM-related technologies.
  11. Song Bok Nam,KRX, Flash EEPROM cell, method of manufacturing the same, method of programming and method of reading the same.
  12. Harari Eliyahou (104 Auzerais Court Los Gatos CA 95030), Flash EEPROM system cell array with more than two storage states per memory cell.
  13. Okazawa Takeshi,JPX, Flash memory including improved transistor cells and a method of programming the memory.
  14. Mitchell Allan T. (Garland TX) Tigelaar Howard L. (Allen TX), Four memory state EEPROM.
  15. Wu Shye-Lin,TWX, High density flat cell mask ROM.
  16. Bell Antony G. (Sunnyvale CA), Insulated gate field-effect transistor read-only memory array.
  17. Hayes James A. (Mountain View CA), Insulated gate field-effect transistor read-only memory cell.
  18. Chang Yun,TWX ; Shone Fuchia,TWX ; Huang Chin-Yi,TWX ; Peng Nai chen,TWX, Interpoly dielectric process.
  19. Ko Joe (Hsinchu TWX) Hsu Bill (Hsinchu TWX), Layout design to eliminate process antenna effect.
  20. Yamada Takayuki,JPX ; Nakabayashi Takashi,JPX ; Arai Masatoshi,JPX ; Yabu Toshiki,JPX ; Eriguchi Koji,JPX, MIS device, method of manufacturing the same, and method of diagnosing the same.
  21. Egawa Yuichi (Tokyo JPX) Wada Toshio (Tokyo JPX) Iwasa Shoichi (Tokyo JPX), MOS-type semiconductor device and method of making the same.
  22. Van Buskirk Michael A. (San Jose CA) Briner Michael (San Jose CA), Memory architecture for a three volt flash EEPROM.
  23. Wolstenholme Graham (Boise ID) Bergemont Albert (San Jose CA) Shacham Etan (Cupertino CA), Memory array with field oxide islands eliminated and method.
  24. Liang Mong-Song (Milpitas CA) Lee Tien-Chiun (Sunnyvale CA), Memory cell having hot-hole injection erase mode.
  25. Rajkanan Kamal (Melville NY) Multani Jagir S. (Dix Hills NY), Memory implant profile for improved channel shielding in electrically alterable read only memory semiconductor device.
  26. Cadigan, Jr., Michael J.; Hadzic, Nihad; Turner, Jeffrey M.; Wong, Raymond, Memory saving packet modification.
  27. Eitan Boaz,ILX ; Rotstein Israel,ILX, Method for creating diffusion areas for sources and drains without an etch step.
  28. Hong Gary (Hsinchu TWX), Method for fabricating a self aligned mask ROM.
  29. Woo Been-Jon (Saratoga CA) Holler Mark A. (Palo Alto CA), Method for improving erase characteristics of buried bit line flash EPROM devices without using sacrificial oxide growth.
  30. Chang Thomas T. L. (Santa Clara CA) Ho Chun (Cupertino CA) Malhotra Arun K. (Mt. View CA), Method for making electrically programmable memory device by doping the floating gate by implant.
  31. Reisinger Hans,DEX, Method for operating a non-volatile memory cell arrangement.
  32. Morelli, Paolo; Pasquariello, Giancarlo, Method for personalizing SIM cards with a production machine.
  33. Hakozaki Kenji (Tenri JPX) Sato Shin-ichi (Nara JPX), Method for producing a floating gate memory device including implanting ions through an oxidized portion of the silicon.
  34. Derhacobian Narbeh ; Fang Hao, Method for reducing program disturb during self-boosting in a NAND flash memory.
  35. Gray, Christopher; Haselgruber, Nikolaus; Langmayr, Franz, Method for testing the reliability of complex systems.
  36. Ranaweera Jeewika Chandanie,CAX ; Kalastirsky Ivan ; Gulersen Elvira,CAX ; Ng Wai Tung,CAX ; Salama Clement Andre T.,CAX, Method of fabricating a fast programmable flash E.sup.2 PROM cell.
  37. Sakurai Yasuhiro (Saitama JPX) Kishi Toshiyuki (Saitama JPX), Method of fabricating a semiconductor nonvolatile storage device.
  38. Derhacobian Narbeh ; Hollmer Shane C. ; Sunkavalli Ravi S., Method of maintaining constant erasing speeds for non-volatile memory cells.
  39. Hsu Chen-Chung,TWX, Method of making ROM components.
  40. McElroy David J. (Houston TX), Method of making a high density floating gate electrically programmable ROM.
  41. Shrivastava Ritu (Fremont CA), Method of making flash EPROM cell having improved erase characteristics by using a tilt angle implant.
  42. Ghneim Said N. ; Fulford ; Jr. H. Jim, Method of making non-volatile memory device having a floating gate with enhanced charge retention.
  43. Jacobs Erwin (Vaterstetten DEX) Schwabe Ulrich (Munich DEX) Takacs Dezso (Munich DEX), Method of making very short channel length MNOS and MOS devices by double implantation of one conductivity type subseque.
  44. Lee Roger R. (Boise ID), Method of processing a semiconductor wafer to form an array of nonvolatile memory devices employing floating gate transi.
  45. Hayabuchi Itsunari (Chiba JPX), Method of producing semiconductor devices of a MONOS type.
  46. Tomioka Yugo (Sagamihara JPX) Iwasa Shoichi (Sagamihara JPX) Sato Yasuo (Sagamihara JPX) Wada Toshio (Sagamihara JPX) Anzai Kenji (Sagamihara JPX), Method of writing into non-volatile semiconductor memory.
  47. Wen Jemmy,TWX, Multi-stage ROM structure and method for fabricating the same.
  48. Schmitt-Landsiedel Doris,DEX ; Thewes Roland,DEX ; Bollu Michael,DEX ; von Basse Paul-Werner,DEX, Multi-value read-only memory cell having an improved signal-to-noise ratio.
  49. Bass ; Jr. Roy S. (Underhill VT) Bhattacharyya Arup (Essex Junction VT) Grise Gary D. (Colchester VT), Non-volatile memory cell having Si rich silicon nitride charge trapping layer.
  50. Aozasa Hiroshi,JPX ; Hayashi Yutaka,JPX, Non-volatile memory cell having dual gate electrodes.
  51. Christie Kenneth Howard (Hopewell Junction NY) DeWitt David (Los Gatos CA) Johnson William Stanford (Hopewell Junction NY), Non-volatile metal nitride oxide semiconductor device.
  52. Mitchell Allan T. (Garland TX) Riemenschneider Bert R. (Murphy TX), Non-volatile semiconductor memory.
  53. Eitan Boaz,ILX, Non-volatile semiconductor memory cell utilizing asymmetrical charge trapping.
  54. Ohya Shuichi (Tokyo JA) Kikuchi Masanori (Tokyo JA), Non-volatile semiconductor memory device.
  55. Kohda Kenji (Hyogo JPX) Toyama Tsuyoshi (Hyogo JPX) Ando Nobuaki (Hyogo JPX) Noguchi Kenji (Hyogo JPX) Kobayashi Shinichi (Hyogo JPX), Non-volatile semiconductor memory device with facility of storing tri-level data.
  56. Bate Robert T. (Garland TX), Non-volatile semiconductor memory elements.
  57. Tsuruta Masataka (Kyoto JPX), Non-volatile semiconductor memory with outer drain diffusion layer.
  58. Fratin Lorenzo,ITX ; Ravazzi Leonardo,ITX ; Riva Carlo,ITX, Nonvolatile memory cell and a method for forming the same.
  59. Wang Hsingya A. (Saratoga CA) Hsu James J. (Saratoga CA), Nonvolatile memory cell formed using self aligned source implant.
  60. Wang Hsingya Arthur (Saratoga CA) Hsu James Juen (Saratoga CA), Nonvolatile memory cell formed using self aligned source implant.
  61. You Jyh-Cheng,TWX ; Chen Pei-Hung,TWX ; Yu Shau-Tsung,TWX ; Chu Yi-Jing,TWX, Post metal code engineering for a ROM.
  62. Khan Sakhawat M. ; Korsh George J., Precision programming of nonvolatile memory cells.
  63. Holler Mark A. (Palo Alto CA) Tam Simon M. (San Mateo CA), Process for fabricating electrically alterable floating gate memory devices.
  64. Schwabe Ulrich (Vaterstetten DEX) Jacobs Erwin (Munich DEX), Process for producing an integrated multi-layer insulator memory cell.
  65. Yang Ming-Tzong (Hsin-chu TWX) Huang Cheng-Han (Hsin-chu TWX) Hsue Chen-Chiu (Hsin-chu TWX), Process for producing memory devices having narrow buried N+lines.
  66. Eitan Boaz,ILX, Process for producing two bit ROM cell utilizing angled implant.
  67. Jacobs Erwin (Vaterstetten DEX) Schwabe Ulrich (Munich DEX), Process for production of integrated MOS circuits with and without MNOS memory transistors in silicon-gate technology.
  68. En William George, Process induced charging damage control device.
  69. Chen Teh-Yi J. (Cupertino CA), Protected programmable transistor with reduced parasitic capacitances and method of fabrication.
  70. Chang Kent Kuohua ; Chi David, RTCVD oxide and N.sub.2 O anneal for top oxide of ONO film.
  71. Uramoto Shinichi (Hyogo JPX) Matsumura Tetsuya (Hyogo JPX) Yoshimoto Masahiko (Hyogo JPX) Ishihara Kazuya (Hyogo JPX) Segawa Hiroshi (Hyogo JPX), Read only memory for storing multi-data.
  72. Kobatake Hiroyuki (Tokyo JPX), Read only semiconductor memory having multiple bit cells.
  73. Krautschneider Wolfgang,DEX ; Risch Lothar,DEX ; Hofmann Franz,DEX ; Rosner Wolfgang,DEX, Read-only-memory cell arrangement using vertical MOS transistors and gate dielectrics of different thicknesses and metho.
  74. Corbat, Jeffrey; Feiler, Thaddeus H.; Taylor, Todd, Security device for a power tool accessory.
  75. Ma Yueh Y. (Los Altos CA) Chang Kuo-Tung (San Jose CA), Self-aligned dual-bit split gate (DSG) flash EEPROM cell.
  76. Aoki Hitoshi (Nara JPX), Semiconductor device ROM having an offset region.
  77. Nakao Hironobu (Kyoto JPX), Semiconductor device including nonvolatile memories.
  78. Lee Roger R. (Boise ID), Semiconductor floating gate device having improved channel-floating gate interaction.
  79. Yoneda Masato (Tokyo JPX), Semiconductor integrated circuit.
  80. Yamagata Tadato,JPX ; Arimoto Kazutami,JPX ; Tsukude Masaki,JPX, Semiconductor integrated circuit device having hierarchical power source arrangement.
  81. Shimizu Shinji (Houya JPX) Komori Kazuhiro (Kodaira JPX) Kosa Yasunobu (Kodaira JPX) Sugiura June (Musashino JPX), Semiconductor integrated circuit device with memory MISFETS and thin and thick gate insulator MISFETS.
  82. Cutter Douglas J. ; Beigel Kurt D., Semiconductor junction antifuse circuit.
  83. Van Berkel Cornelis (Brighton GB2) Bird Neil C. (Horley GB2), Semiconductor memory device.
  84. Shimoji Noriyuki (Kyoto JPX), Semiconductor memory device and method of reading out information for the same.
  85. Odake Yoshinori (Osaka JPX) Okuda Yasushi (Osaka JPX), Semiconductor memory device having an energy gap for high speed operation.
  86. Georgescu Sorin ; Mihnea Andrei ; Vanco Radu, Single transistor non-volatile electrically alterable semiconductor memory device.
  87. Chang Ming-Bing, Source-coupling, split gate, virtual ground flash EEPROM array.
  88. Chen Shih-Ou (Fremont CA) McCollum John L. (Saratoga CA) Chiang Steve S. (Saratoga CA), Structure for protecting thin dielectrics during processing.
  89. Kostrzewski, Stanislaw, Surgical instrument with double cartridge and anvil assemblies.
  90. Su Hung-Der,TWX ; Lee Jian-Hsing,TWX ; Kuo Di-Son,TWX, Test structures for monitoring gate oxide defect densities and the plasma antenna effect.
  91. Hsu Chen-Chung,TWX, Three-dimensional, deep-trench, high-density read-only memory (ROM) and its manufacturing method.
  92. Eitan Boaz,ILX, Two bit ROM cell and process for producing same.
  93. Eitan Boaz,ILX, Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping.
  94. Janning John L. (Dayton OH), Two bit vertically/horizontally integrated memory cell.

이 특허를 인용한 특허 (128)

  1. Forbes,Leonard, 4FEEPROM NROM memory arrays with vertical devices.
  2. Forbes,Leonard, 4FEEPROM NROM memory arrays with vertical devices.
  3. Forbes, Leonard, Apparatus and method for split gate NROM memory.
  4. Forbes,Leonard, Apparatus and method for split transistor memory having improved endurance.
  5. Forbes, Leonard, Apparatus and method for trench transistor memory having different gate dielectric thickness.
  6. Dadashev, Oleg; Betser, Yoram; Maayan, Eduardo, Apparatus and methods for multi-level sensing in a memory array.
  7. Forbes, Leonard, Ballistic direct injection NROM cell on strained silicon structures.
  8. Forbes, Leonard, Ballistic direct injection NROM cell on strained silicon structures.
  9. Forbes,Leonard, Ballistic direct injection NROM cell on strained silicon structures.
  10. Kushnarenko, Alexander, Circuit and method for powering up an integrated circuit and an integrated circuit utilizing same.
  11. Ahn, Kie Y.; Forbes, Leonard, Conductive layers for hafnium silicon oxynitride.
  12. Ahn, Kie Y.; Forbes, Leonard, Conductive layers for hafnium silicon oxynitride films.
  13. Ahn, Kie Y.; Forbes, Leonard, Conductive layers for hafnium silicon oxynitride films.
  14. Shappir, Assaf, Contact in planar NROM technology.
  15. Bloom, Ilan; Eitan, Boaz; Irani, Rustom, Dense non-volatile memory array and method of fabrication.
  16. Wong,Nga Ching, Dielectric memory cell structure with counter doped channel region.
  17. Irani, Rustom; Eitan, Boaz; Bloom, Ilan; Shappir, Assaf, Double density NROM with nitride strips (DDNS).
  18. Sofer,Yair; Maayan,Eduardo; Betser,Yoram, Dynamic matching of signal path and reference path for sensing.
  19. Maayan, Eduardo; Eliyahu, Ron; Eitan, Boaz, EEPROM array and method for operation thereof.
  20. Tsai, Wen-Jer; Yeh, Chih-Chieh; Lu, Tao-Cheng; Pan, Samuel C., Erasing method for non-volatile memory.
  21. Tsai, Wen-Jer; Yeh, Chih-Chieh; Lu, Tao-Cheng; Pan, Samuel C., Erasing method for non-volatile memory.
  22. Forbes, Leonard, Flash memory having a high-permittivity tunnel dielectric.
  23. Forbes,Leonard, Flash memory having a high-permittivity tunnel dielectric.
  24. Forbes, Leonard, Fully depleted silicon-on-insulator CMOS logic.
  25. Forbes, Leonard, Fully depleted silicon-on-insulator CMOS logic.
  26. Forbes, Leonard, Fully depleted silicon-on-insulator CMOS logic.
  27. Forbes,Leonard, Fully depleted silicon-on-insulator CMOS logic.
  28. Betser, Yoram; Kushnarenko, Alexander; Dadashev, Oleg, Measuring and controlling current consumption and output current of charge pumps.
  29. Polansky, Yan; Lavan, Avi, Memory array programming circuit and a method for using the circuit.
  30. Sinha, Shankar; Melik-Martirosian, Ashot; Djomehri, Ihsan, Memory cell dual pocket implant.
  31. Forbes, Leonard, Memory device with high dielectric constant gate dielectrics and metal floating gates.
  32. Forbes, Leonard, Memory device with high dielectric constant gate dielectrics and metal floating gates.
  33. Forbes, Leonard, Memory device with high dielectric constant gate dielectrics and metal floating gates.
  34. Forbes,Leonard, Memory device with high dielectric constant gate dielectrics and metal floating gates.
  35. Forbes,Leonard, Memory device with high dielectric constant gate dielectrics and metal floating gates.
  36. Forbes, Leonard; Ahn, Kie Y., Memory utilizing oxide nanolaminates.
  37. Forbes, Leonard; Ahn, Kie Y., Memory utilizing oxide nanolaminates.
  38. Forbes, Leonard; Ahn, Kie Y., Memory utilizing oxide-conductor nanolaminates.
  39. Forbes, Leonard; Ahn, Kie Y., Memory utilizing oxide-conductor nanolaminates.
  40. Forbes,Leonard; Ahn,Kie Y., Memory utilizing oxide-conductor nanolaminates.
  41. Forbes, Leonard; Ahn, Kie Y., Memory utilizing oxide-nitride nanolaminates.
  42. Forbes,Leonard; Ahn,Kie Y., Memory utilizing oxide-nitride nanolaminates.
  43. Forbes,Leonard; Ahn,Kie Y., Memory utilizing oxide-nitride nanolaminates.
  44. Dadashev,Oleg, Method and apparatus for measuring charge pump output current.
  45. Mihnea,Andrei; Chen,Chun, Method for erasing an NROM cell.
  46. Mihnea,Andrei; Chen,Chun, Method for erasing an NROM cell.
  47. Mihnea,Andrei; Chen,Chun, Method for erasing an NROM cell.
  48. Mihnea,Andrei; Chen,Chun, Method for erasing an NROM cell.
  49. Guo, Jyh-Chyurn, Method for fabricating field effect transistor (FET) device with asymmetric channel region and asymmetric source and drain regions.
  50. Forbes,Leonard, Method for fabricating semiconductor vertical NROM memory cells.
  51. Maayan, Eduardo; Eitan, Boaz; Lann, Ameet, Method for programming a reference cell.
  52. Maayan,Eduardo; Eliyahu,Ron; Lann,Ameet; Eitan,Boaz, Method for programming a reference cell.
  53. Mihnea, Andrei, Method for programming and erasing an NROM cell.
  54. Mihnea, Andrei, Method for programming and erasing an NROM cell.
  55. Mihnea, Andrei, Method for programming and erasing an NROM cell.
  56. Mihnea,Andrei, Method for programming and erasing an NROM cell.
  57. Mihnea,Andrei, Method for programming and erasing an NROM cell.
  58. Mihnea,Andrei, Method for programming and erasing an NROM cell.
  59. Lusky, Eli; Eitan, Boaz, Method of erasing non-volatile memory cells.
  60. Eitan, Boaz; Shainsky, Natalie, Method, circuit and device for disturb-control of programming nonvolatile memory cells by hot-hole injection (HHI) and by channel hot-electron (CHE) injection.
  61. Shappir,Assaf; Eisen,Shai, Method, circuit and systems for erasing one or more non-volatile memory cells.
  62. Cohen, Guy; Polansky, Yan, Method, system and circuit for programming a non-volatile memory array.
  63. Cohen,Guy, Method, system, and circuit for operating a non-volatile memory array.
  64. Shappir,Assaf; Avni,Dror; Eitan,Boaz, Method, system, and circuit for operating a non-volatile memory array.
  65. Forbes,Leonard, Multi-state NROM device.
  66. Forbes,Leonard, Multi-state NROM device.
  67. Forbes,Leonard, Multi-state NROM device.
  68. Prall, Kirk, Multi-state memory cell with asymmetric charge trapping.
  69. Prall, Kirk, Multi-state memory cell with asymmetric charge trapping.
  70. Prall,Kirk, Multi-state memory cell with asymmetric charge trapping.
  71. Maayan, Eduardo; Eitan, Boaz, NROM NOR array.
  72. Forbes, Leonard, NROM flash memory cell with integrated DRAM.
  73. Forbes,Leonard, NROM flash memory cell with integrated DRAM.
  74. Forbes,Leonard, NROM flash memory cell with integrated DRAM.
  75. Forbes, Leonard, NROM flash memory devices on ultrathin silicon.
  76. Forbes, Leonard, NROM flash memory devices on ultrathin silicon.
  77. Forbes,Leonard, NROM flash memory devices on ultrathin silicon.
  78. Forbes,Leonard, NROM flash memory devices on ultrathin silicon.
  79. Forbes,Leonard, NROM flash memory devices on ultrathin silicon.
  80. Forbes,Leonard, NROM flash memory devices on ultrathin silicon.
  81. Forbes,Leonard, NROM flash memory devices on ultrathin silicon.
  82. Forbes,Leonard, NROM flash memory with a high-permittivity gate dielectric.
  83. Forbes,Leonard, NROM flash memory with a high-permittivity gate dielectric.
  84. Forbes,Leonard, NROM flash memory with self-aligned structural charge separation.
  85. Forbes,Leonard, NROM flash memory with self-aligned structural charge separation.
  86. Prall, Kirk D.; Forbes, Leonard, NROM memory cell, memory array, related devices and methods.
  87. Prall, Kirk D.; Forbes, Leonard, NROM memory cell, memory array, related devices and methods.
  88. Prall, Kirk D.; Forbes, Leonard, NROM memory cell, memory array, related devices and methods.
  89. Prall, Kirk D.; Forbes, Leonard, NROM memory cell, memory array, related devices and methods.
  90. Prall,Kirk D.; Forbes,Leonard, NROM memory cell, memory array, related devices and methods.
  91. Prall,Kirk D.; Forbes,Leonard, NROM memory cell, memory array, related devices and methods.
  92. Prall,Kirk D.; Forbes,Leonard, NROM memory cell, memory array, related devices and methods.
  93. Prall,Kirk D.; Forbes,Leonard, NROM memory cell, memory array, related devices and methods.
  94. Eitan, Boaz; Shainsky, Natalie, NROM non-volatile memory and mode of operation.
  95. Eitan,Boaz, Non-volatile memory cell and non-volatile memory devices.
  96. Ho,ChiaHua; Lai,Erh Kun; Lue,Hang Ting, Non-volatile memory cells and methods of manufacturing the same.
  97. Maayan, Eduardo, Non-volatile memory device and method for reading cells.
  98. Chung, Chia-Chi, Non-volatile memory device with enlarged trapping layer.
  99. Lusky, Eli; Shappir, Assaf; Irani, Rustom; Eitan, Boaz, Non-volatile memory structure and method of fabrication.
  100. Lusky,Eli; Eitan,Boaz; Cohen,Guy; Maayan,Eduardo, Operating array cells with matched reference cells.
  101. Shappir,Assaf; Eisen,Shai, Partial erase verify.
  102. Lusky,Eli; Bloom,Ilan; Shappir,Assaf; Eitan,Boaz, Protection of NROM devices from charge damage.
  103. Eitan, Boaz, Secondary injection for NROM.
  104. Levy,Israel, Technology for cultivation ofand other seaweeds in land-based sea water ponds.
  105. Smith, Michael, Trench corner effect bidirectional flash memory cell.
  106. Smith, Michael, Trench corner effect bidirectional flash memory cell.
  107. Smith,Michael, Trench corner effect bidirectional flash memory cell.
  108. Smith,Michael, Trench corner effect bidirectional flash memory cell.
  109. Smith,Michael, Trench corner effect bidirectional flash memory cell.
  110. Smith,Michael, Trench corner effect bidirectional flash memory cell.
  111. Eitan,Boaz, Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping.
  112. Forbes,Leonard, Vertical NROM NAND flash memory array.
  113. Forbes,Leonard, Vertical NROM NAND flash memory array.
  114. Forbes, Leonard, Vertical NROM having a storage density of 1 bit per 1F2.
  115. Forbes, Leonard, Vertical NROM having a storage density of 1 bit per 1F2.
  116. Forbes, Leonard, Vertical NROM having a storage density of 1 bit per 1F2.
  117. Forbes,Leonard, Vertical NROM having a storage density of 1 bit per 1F2.
  118. Forbes, Leonard, Vertical device 4F2 EEPROM memory.
  119. Forbes,Leonard, Vertical device 4FEEPROM memory.
  120. Forbes,Leonard, Vertical device 4FEEPROM memory.
  121. Forbes, Leonard, Write once read only memory employing charge trapping in insulators.
  122. Forbes,Leonard, Write once read only memory employing charge trapping in insulators.
  123. Forbes,Leonard, Write once read only memory employing charge trapping in insulators.
  124. Forbes,Leonard, Write once read only memory employing floating gates.
  125. Forbes,Leonard, Write once read only memory employing floating gates.
  126. Forbes,Leonard, Write once read only memory employing floating gates.
  127. Forbes,Leonard, Write once read only memory with large work function floating gates.
  128. Forbes,Leonard, Write once read only memory with large work function floating gates.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로