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Pressure-sensitive adhesive composition, process for the preparation thereof and pressure-sensitive adhesive sheets 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-005/10
  • B32B-027/30
  • B32B-027/32
  • B32B-027/38
  • C08L-053/00
출원번호 US-0456912 (1999-12-07)
우선권정보 JP-0348335 (1998-12-08); JP-0170220 (1999-06-16); JP-0223149 (1999-08-06); JP-0308230 (1999-10-29)
발명자 / 주소
  • Michiharu Yamamoto JP
  • Yutaka Moroishi JP
  • Kenichi Okada JP
  • Fumiko Kamifuji JP
  • Tomoko Doi JP
출원인 / 주소
  • Nitto Denko Corporation JP
대리인 / 주소
    Sughrue Mion, PLLC
인용정보 피인용 횟수 : 35  인용 특허 : 6

초록

A pressure-sensitive adhesive composition having well-balanced pressure-sensitive adhesive force and cohesive force without causing any safety or economy problems, a process for the preparation of the same and pressure-sensitive adhesive sheets using the same are disclosed. The pressure-sensitive ad

대표청구항

1. A process for the preparation of a pressure-sensitive adhesive composition, which comprises subjecting a styrene-based monomer and an acrylic monomer represented by the general formula (1A): CH2.dbd.C(R1)COOR2 wherein R1 represents a hydrogen atom or methyl group, and R2 represents a C2-14 alkyl

이 특허에 인용된 특허 (6)

  1. Matyjaszewski Krzysztof ; Wang Jin-Shan, (Co)polymers and a novel polymerization process based on atom (or group) transfer radical polymerization.
  2. Southwick Jeffrey G. (Houston TX) Hansen David R. (Houston TX), Adhesives containing vinyl aromatic hydrocarbon/diene/acrylic monomer block copolymers.
  3. Schimmel Karl F. ; Barkac Karen A. ; Humbert Kurt A. ; Goetz Jonathan D. ; O'Dwyer James B., Block copolymers.
  4. Nakagawa Yoshiki,JPX ; Kitano Kenichi,JPX ; Kusakabe Masato,JPX, Functional groups-terminated vinyl polymers.
  5. Matyjaszewski Krzysztof ; Coca Simion ; Gaynor Scott G. ; Greszta Dorota ; Patten Timothy E. ; Wang Jin-Shan ; Xia Jianhui, Processes based on atom (or group) transfer radical polymerization and novel (co) polymers having useful structures and.
  6. Wilson Bruce B. ; Frey Cheryl M., Structured retroreflective sheeting having a rivet-like connection.

이 특허를 인용한 특허 (35)

  1. Czaplicki, Michael J.; Kosal, David, Activatable material.
  2. Czaplicki,Michael J.; Hable,Christopher; Carlson,David, Activatable material for sealing, baffling or reinforcing and method of forming same.
  3. Sheasley,David; Kosal,David; Antrim,Jeanne, Activatable material for sealing, baffling or reinforcing and method of forming same.
  4. Asai, Takahiro; Misumi, Koichi; Miyanari, Atsushi; Inao, Yoshihiro; Nakamura, Akihiko, Adhesive composition and adhesive film.
  5. Asai, Takahiro; Misumi, Koichi; Miyanari, Atsushi; Inao, Yoshihiro; Nakamura, Akihiko, Adhesive composition and film adhesive.
  6. Imai, Hirofumi; Tamura, Koki; Misumi, Koichi; Asai, Takahiro, Adhesive composition and film adhesive.
  7. Jeong, Woo Jin; Ki, Hee Yeon; Chung, Hae Ryong, Adhesive composition and optical member using the same.
  8. Dollase, Thilo; Husemann, Marc; Luhmann, Bernd, Adhesive masses based on block copolymers of structure P(A)-P(B)-P(A) and P(B)-P(A)-P(B).
  9. Dollase, Thilo; Husemann, Marc, Adhesive materials having a high refractive index based on acrylate block copolymers.
  10. Nishida, Takuo; Yamada, Akihito, Adhesive sheet.
  11. Werner, Dietmar, Cavity filling.
  12. Kassa,Abraham; Harthcock,Matthew; Apfel,Jeffrey, Expandable material.
  13. Yoo, Taejun; Chao, Herbert; Henning, Steven K, Farnesene-based polymers and liquid optically clear adhesive compositions incorporating the same.
  14. Yoo, Taejun; Chao, Herbert; Henning, Steven K., Farnesene-based polymers and liquid optically clear adhesive compositions incorporating the same.
  15. Kiuchi,Kazuyuki; Oshima,Toshiyuki; Murata,Akihisa; Arimitsu,Yukio, Heat-peelable pressure-sensitive adhesive sheet.
  16. Kassa, Abraham; Apfel, Jeffrey R., Magnetic composition.
  17. Finerman, Terry; Carlson, David; Harthcock, Matthew; Knepper, Craig; Chmielewski, Craig; Ferng, William B.; Hable, Christopher; Kassa, Abraham; Jensen, Blair, Method of sealing an interface.
  18. Tsutsumi, Masayuki; Kobayashi, Hisato; Kawahara, Keizo; Yoshida, Shigeto; Yamaguchi, Shinsuke; Okamoto, Kazutake; Takahashi, Akira; Kumagai, Eiji; Nagara, Akinobu; Akitomo, Yoshiko; Imai, Kazumoto; Oda, Naonobu, Oriented syndiotactic polystyrene-base film.
  19. Czaplicki, Michael J.; Bradley, Renee; Bradley, Jeff, Paintable material.
  20. Kassa, Abraham; Bradley, Renee, Paintable seal system.
  21. Kassa,Abraham; Bradley,Renee, Paintable seal system.
  22. Carlson, David; Madaus, Brandon; Harthcock, Matthew; Barton, Kearney; Taylor, Charles L.; Walker, Jason, Panel structure.
  23. Husemann, Marc; Zöllner, Stephan, Pressure sensitive adhesive, particularly for apolar surfaces.
  24. Park, Min Soo; Han, In Cheon; Jang, Ki Seok, Pressure-sensitive adhesive composition, polarization plate, and liquid crystal display.
  25. Asai, Takahiro; Misumi, Koichi; Miyanari, Atsushi; Inao, Yoshihiro; Nakamura, Akihiko; Saito, Koji, Process for producing an adhesive composition.
  26. Moroishi, Yutaka; Yamamoto, Michiharu; Inoue, Tetsuo; Doi, Tomoko; Sugimoto, Masakazu; Nakano, Fumiko, Process for producing polymer.
  27. Finerman, Terry; Kassa, Abraham, Sealant material.
  28. Chmielewski, Craig; Madaus, Brandon, Structural composite laminates.
  29. Czaplicki, Michael J.; Kosal, David J.; Antrim, Jeanne, Structural hot melt material and methods.
  30. Czaplicki,Michael J.; Madaus,Keith, Synthetic material and methods of forming and applying same.
  31. Czaplicki, Michael J.; Madaus, Keith, Tacky base material with powder thereon.
  32. Takahira, Hitoshi; Yoshie, Satomi, Thermally removable pressure-sensitive adhesive sheet.
  33. Czaplicki, Michael J.; Kosal, David J.; Madaus, Keith, Two component (epoxy/amine) structural foam-in-place material.
  34. Czaplicki,Michael J.; Kosal,David J.; Hicks,Kevin, Two component (epoxy/amine) structural foam-in-place material.
  35. Czaplicki, Michael J.; Kosal, David J.; Madaus, Keith, Two-component (epoxy/amine) structural foam-in-place material.
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