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Method and apparatus for magnetron sputtering 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/34
출원번호 US-0545817 (2000-04-07)
발명자 / 주소
  • Konstantin K. Tzatzov CA
  • Alexander S. Gorodetsky CA
출원인 / 주소
  • Surface Engineered Products Corp. CA
대리인 / 주소
    Greenlee, Winner & Sullivan
인용정보 피인용 횟수 : 17  인용 특허 : 45

초록

A cathode assembly for magnetron sputtering of a workpiece, and sputtering apparatus and methods of sputtering using same are provided. The cathode assembly includes a tubular cathode, which may be cylindrical in cross section along its length, or which may be curved or flexible, depending on the sh

대표청구항

1. A cathode assembly for magnetron sputtering inside an annular cavity of a hollow, curved workpiece having a non-linear axis of symmetry, comprising: a tubular cathode having a sputtering length of Ls, and being generally curved along a non-linear axis of symmetry to follow the non-linear axis of

이 특허에 인용된 특허 (45)

  1. Dickey Eric R. (Northfield MN) Bjornard Erik J. (Northfield MN) Hoffmann James J. (Boise ID), Anode structures for magnetron sputtering apparatus.
  2. Barber ; Jr. Thomas A. (Pawtucket RI) Kisterskaya Lioudmila D. (Providence RI) Kistersky Leonid L. (Providence RI), Apparatus and method for localized ion sputtering.
  3. Anderson Robert L. (Palo Alto CA), Apparatus and method for multiple ring sputtering from a single target.
  4. Fu Jianming, Apparatus for sputtering magnetic target materials.
  5. Gaertner Walter (Gmunden ATX) Koroschetz Franz (Gmunden ATX) Wagendristel Alfred (Perchtoldsdorf ATX) Bangert Herwig (Vienna ATX), Bar-shaped magnetron or sputter cathode arrangement.
  6. Bourez Allen J. (San Jose CA) Lal Brij Bihari (San Jose CA) Russak Michael A. (Los Gatos CA), Cathode assembly having rotating magnetic-field shunt and method of making magnetic recording media.
  7. McKelvey Harold E. (Plymouth MI), Cathodic sputtering apparatus.
  8. Hinterschuster Reiner (Hammersbach DEX) Ocker Berthold (Hanau DEX) Gesche Roland (Seligenstadt DEX) Saunders Mark (Horstein DEX), Cathodic sputtering system.
  9. Zega Bogdan (Geneva CHX), Cylindrical cathode for magnetically-enhanced sputtering.
  10. Hedgcoth Virgle (Claremont CA), Cylindrical hollow cathode/magnetron sputtering system and components thereof.
  11. Zega Bogdan (Geneva CHX), Cylindrical magnetron sputtering cathode and apparatus.
  12. Hawton ; Jr. John T. (Colorado Springs CO) Shumate William G. (Colorado Springs CO), Cylindrical magnetron sputtering source.
  13. Hoffman David W. (Ann Arbor MI), Cylindrical post magnetron sputtering system.
  14. Penfold Alan S. (Playa del Rey CA) Thornton John A. (Los Angeles CA), Electrode type glow discharge apparatus.
  15. Bryan William J. (Granby CT) Perrotti Patrick A. (Newington CT), Fuel assembly sputtering process.
  16. Moslehi Mehrdad M. ; Heimanson Dorian ; Davis Cecil J. ; Omstead Thomas R., High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition.
  17. Stevenson David E. (Northfield MN) Humberstone Geoffrey H. (Holland MI), Linear planar-magnetron sputtering apparatus with reciprocating magnet-array.
  18. Ooshio Hirosuke (Zama JPX) Aikawa Tetsuo (Zama JPX) Jo Hidetaka (Zama JPX) Okano Haruo (Kawasaki JPX) Yamazaki Takashi (Kawasaki JPX), Magnet driving method and device for same.
  19. Taylor Clifford L. (Nerstrand MN) Crowley Daniel T. (Owatonna MN), Magnet housing for a sputtering cathode.
  20. Penfold Alan S. (Playa del Rey CA), Magnetic field generator for use in sputtering apparatus.
  21. Cann Gordon L. (P.O. Box 279 Laguna Beach CA 92652), Magnetoplasmadynamic apparatus and process for the separation and deposition of materials.
  22. McKelvey Harold E. (Plymouth MI), Magnetron cathode sputtering apparatus.
  23. McKelvey Harold E. (Plymouth MI), Magnetron cathode sputtering apparatus.
  24. McKelvey Harold E. (Plymouth MI), Magnetron cathode sputtering apparatus.
  25. Scobey Michael A. (Santa Rosa CA) Seddon Richard I. (Santa Rosa CA) Seeser James W. (Santa Rosa CA) Austin R. Russel (Santa Rosa CA) LeFebvre Paul M. (Santa Rosa CA) Manley Barry W. (Boulder CO), Magnetron sputtering apparatus and process.
  26. Yumshtyk Gennady,CAX ; Ioumchtyk Michael,CAX, Magnetron sputtering method and apparatus.
  27. Marshall ; III John (Longmont CO), Method and apparatus for linear magnetron sputtering.
  28. Harding ; Geoffrey L. ; McKenzie ; David R. ; Window ; Brian, Method and apparatus for reactive sputtering.
  29. Thornton ; John A., Method and apparatus for sputter cleaning and bias sputtering.
  30. Manley Barry W. (Boulder CO), Method and apparatus for sputtering magnetic target materials.
  31. Wolfe Jesse D. (San Ramon CA) Boehmler Carolynn (Vacaville CA) Hofmann James J. (Northfield MN), Method for coating substrates with silicon based compounds.
  32. Harding Geoffrey L. (Glebe AUX) McKenzie David R. (Artarmon AUX) Window Brian (Hornsby Heights AUX) Collins Anthony R. (Paddington AUX), Method of and apparatus for reactively sputtering a graded surface coating onto a substrate.
  33. Hughes John L. ; Davis Gary A. ; Kolenkow Robert J. ; Petersen Carl T. ; Pond Norman H. ; Weiss Robert E., Methods and apparatus for linear scan magnetron sputtering.
  34. Halsey Harlan I. ; Demaray Richard E. ; Black Russell ; Hosokawa Akihiro ; De Salvo Allan ; Hall Victoria L., Non-planar magnet tracking during magnetron sputtering.
  35. Tepman, Avi, Planar magnetron sputtering source producing improved coating thickness uniformity, step coverage and step coverage uniformity.
  36. Kljuchko Gennady V. (prospekt Kurchatova ; 27 ; kv. 68 Kharkov SUX) Padalka Valentin G. (ulitsa Danilevskogo ; 10 ; kv. 122 Kharkov SUX) Sablev Leonid P. (ulitsa P. Morozova ; 3 ; kv. 3 Kharkov SUX) , Plasma arc apparatus for applying coatings by means of a consumable cathode.
  37. Yamazaki Shunpei (Tokyo JPX), Plasma-enhanced CVD of oxide superconducting films by utilizing a magnetic field.
  38. McKelvey Harold E. (Plymouth MI), Rotatable sputtering apparatus.
  39. Dickey Eric R. ; Bjornard Erik J., Shielding for arc suppression in rotating magnetron sputtering systems.
  40. Harding Geoffrey L. (Sydney AUX), Solar collector.
  41. Hosokawa Naokichi (Fuchu JPX) Kim Kyungshik (Fuchu JPX), Sputtering apparatus.
  42. Anderson Robert L. (Palo Alto CA) Helmer John C. (Palo Alto CA), Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile.
  43. Kuriyama Noboru (Kawasaki JPX), Sputtering device.
  44. Broadbent Eliot K. (San Jose CA) Miller Kenneth C. (Mountain View CA), Sweeping method and magnet track apparatus for magnetron sputtering.
  45. Benzing David W. (San Jose CA), Troide plasma reactor with magnetic enhancement.

이 특허를 인용한 특허 (17)

  1. Yumshtyk, Gennady, Advanced gun barrel.
  2. White, John M.; Le, Hien Minh H.; Hosokawa, Akihiro, Apparatus and method of positioning a multizone magnetron assembly.
  3. Boardman,William John; Mercado,Raul Donate; Tudhope,Andrew William, Apparatus for directing plasma flow to coat internal passageways.
  4. Hartig, Klaus; Smith, Steve E.; Madocks, John E., Cylindrical target with oscillating magnet for magnetron sputtering.
  5. Lacoste,Ana; Arnal,Yves Alban Marie; Bechu,St챕phane; Pelletier,Jacques, Device for confinement of a plasma within a volume.
  6. Bernick, Mark A., High power cathode.
  7. Weaver, Scott Andrew; Carter, William Thomas; Marruso, Paul Mario, Method and apparatus for cathodic arc ion plasma deposition.
  8. Weaver, Scott Andrew; Carter, William Thomas; Marruso, Paul Mario, Method and apparatus for cathodic arc ion plasma deposition.
  9. Le, Hien Minh Huu; Hosokawa, Akihiro; Tepman, Avi, Method and apparatus for sputtering onto large flat panels.
  10. Boardman, William John; Mercado, Raul Donate; Tudhope, Andrew William, Method for directing plasma flow to coat internal passageways.
  11. Yumshtyk, Gennady; Ivanov, Dmitri, Sputtering devices and methods.
  12. Yumshtyk, Gennady; Ivanov, Dmitri, Sputtering devices and methods.
  13. Takamatsu, Yasutake; Takahashi, Katsunori; Matsuo, Shin-ichiro, Sputtering method and apparatus.
  14. Yumshtyk, Gennady, Sputtering targets and methods.
  15. Walters, Dean R.; Este, Grantley O., Thin film application device and method for coating small aperture vacuum vessels.
  16. Tepman, Avi, Two dimensional magnetron scanning for flat panel sputtering.
  17. Likhanskii, Alexandre; Radovanov, Svetlana B., Uniformity control using adjustable internal antennas.
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