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Surface treatment of semiconductor substrates

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/08
  • B08B-003/10
출원번호 US-0968265 (2001-10-01)
발명자 / 주소
  • Paul A. Kittle
대리인 / 주소
    Howson & Howson
인용정보 피인용 횟수 : 20  인용 특허 : 16

초록

Surface cleaning, chemical treatment and drying of semiconductor substrates is carried out using foam as a medium instead of a condensed phase liquid medium. In cleaning and chemical treatment, by introducing a foam into an overflow vessel the foam is caused to pass over the substrate in moving cont

대표청구항

1. An apparatus for treatment of a semiconductor substrate having a surface to which undesired particles adhere, the apparatus comprising:a support for holding a semiconductor substrate; a foam generator for producing a foam consisting of gas bubbles and a liquid component; and means for causing the

이 특허에 인용된 특허 (16)

  1. Simmons Bobby G. (Tulsa OK), Apparatus for making foamed cleaning solutions and method of operation.
  2. Mohindra Raj (Los Altos Hills CA) Bhushan Abhay (Palo Alto CA) Bhushan Rajiv (Mountain View CA) Puri Suraj (Los Altos CA) Anderson John H. (Milpitas CA) Nowell Jeffrey (San Francisco CA), Method for cleaning and drying a semiconductor wafer.
  3. Simmons Bobby G. (7524 S. Evanston Tulsa OK 74136), Method for recycling foamed solvents.
  4. Leenaars Adriaan F. M. (Eindhoven NLX) Huethorst Johanna A. M. (Eindhoven NLX) Marra Johannes (Eindhoven NLX), Method for removing in a centrifuge a liquid from a surface of a substrate.
  5. Verbiest Jan Hendrik Maria,BEX ; Wevers Jean,BEX, Method of cleaning textile fabrics.
  6. Leenaars Adriaan F. M. (Eindhoven NLX), Method of removing undesired particles from a surface of a substrate.
  7. McConnell Christopher F. (West Chester PA) Walter Alan E. (Exton PA), Process and apparatus for drying surfaces.
  8. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), Process for surface and fluid cleaning.
  9. Matthews Robert Roger, Process for treatment of semiconductor wafers in a fluid.
  10. Olesen Michael B. ; Bran Mario E., Semiconductor wafer cleaning method.
  11. Olesen Michael B. (Yorba Linda CA) Bran Mario E. (Garden Grove CA), Semiconductor wafer cleaning system.
  12. Olesen Michael B. ; Bran Mario E., Semiconductor wafer cleaning system.
  13. Kittle Paul A., Surface treatment of semiconductor substrates.
  14. Kittle Paul A., Surface treatment of semiconductor substrates.
  15. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), System for surface and fluid cleaning.
  16. Bennett Robert W. (Downingtown PA), Variable proportioning valve for balanced pressure proportioning systems, and system containing the valve.

이 특허를 인용한 특허 (20)

  1. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Apparatus and system for cleaning a substrate.
  2. de Larios,John M.; Owczarz,Aleksander; Schoepp,Alan; Redeker,Fritz, Apparatuses and methods for cleaning a substrate.
  3. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a semiconductor substrate.
  4. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a semiconductor substrate.
  5. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a substrate using non-Newtonian fluids.
  6. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fred C., Method and apparatus for cleaning a substrate using non-newtonian fluids.
  7. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fritz; Owczarz, Aleksander, Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids.
  8. Peng, Fu-Sheng, Method and apparatus for drying semiconductor wafers.
  9. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fritz C., Method and apparatus for particle removal.
  10. Zhu, Ji; Mendiratta, Arjun; Mui, David, Method and apparatus for removing contaminants from substrate.
  11. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John, Method and apparatus for removing contamination from substrate.
  12. de Larios,John M.; Ravkin,Mike; Parks,John; Korolik,Mikhail; Redeker,Fred C., Method and apparatus for transporting a substrate using non-Newtonian fluid.
  13. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C., Method and material for cleaning a substrate.
  14. Korolik, Mikhail; Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz, Method and system for using a two-phases substrate cleaning compound.
  15. Korolik, Mikhail; Ravkin, Michael; deLarios, John; Redeker, Fritz C.; Boyd, John M., Method for removing material from semiconductor wafer and apparatus for performing the same.
  16. Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz; de Larios, John M.; Freer, Erik M.; Korolik, Mikhail, Methods for contained chemical surface treatment.
  17. Cotte, John M.; Ivers, Catherine; McCullough, Kenneth J.; Moreau, Wayne M.; Purtell, Robert J.; Simons, John P.; Syverson, William A.; Taft, Charles J., Solid CO2 cleaning.
  18. Freer, Erik M.; deLarios, John M.; Ravkin, Michael; Korolik, Mikhail; Redeker, Fritz C., Substrate cleaning technique employing multi-phase solution.
  19. Freer, Erik M.; de Larios, John M.; Ravkin, Michael; Korolik, Mikhail; Mikhaylichenko, Katrina; Redeker, Fritz C., Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions.
  20. Kittle, Paul A., Surface treatment of semiconductor substrates.
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