초록 ▼

Methods for Heating a Fluidized Bed Silicon Deposition Apparatus with the steps of: one or more heaters and entries to the reactor for the gas or gases which can be heated without decomposition separate from one or more heaters and entries for the gas or gases which decompose to form silicon when he

Methods for Heating a Fluidized Bed Silicon Deposition Apparatus with the steps of: one or more heaters and entries to the reactor for the gas or gases which can be heated without decomposition separate from one or more heaters and entries for the gas or gases which decompose to form silicon when heated, heating the gas or gases which do not decompose to temperatures between 400-2000 C., more preferably 800-1600 C., heating the gases which do decompose thermally to temperatures less than the temperature at which they decompose, typically 25-400 C., preferably 300-350 C., and alternatively or in combination with the above steps also providing a means for removal of the silicon beads, heating the beads to a temperature between 800-1200 C. and preferably to a temperature between 900-1100 C. and returning the beads to the reactor. Providing localized cooling of the entries for the thermally decomposable gases. These two heating methods either alone or in combination can provide all the heat needed to operate the reactor in the desired operating range of 800-1100 C. and can provide the heat at the inlet of the reactor where the cold silicon containing gases need to be raised to the operating temperature of the reactor. Heating the non decomposing gases and the silicon beads outside the reactor can be accomplished easily with a variety of low cost heating techniques. Other benefits include, higher flow rates in the reactor, higher production rates, larger and more spherical beads, increased deposition efficiency and reduced risk of sintering and plugging.

대표청구항 ▼

1. A method for heating a fluidized bed silicon deposition apparatus comprising:providing a plurality of silicon beads into a reactor having a chamber that is sized and shaped to contain the beads in a fluidized bed and defines one or more fluidizing inlets suitable for injection of a first gas whic

1. A method for heating a fluidized bed silicon deposition apparatus comprising:providing a plurality of silicon beads into a reactor having a chamber that is sized and shaped to contain the beads in a fluidized bed and defines one or more fluidizing inlets suitable for injection of a first gas which can be heated without decomposing to form silicon separately from one or more fluidizing inlets suitable for injection of a second gas which decomposes to form silicon when heated; providing into the reactor a source of the first gas at temperatures between 600-1600.degree. C., the source of the first gas being operable to maintain the beads in a fluidized state when mixed in the reactor with the second gas; providing into the reactor a source of the second gas at a temperature less than 400.degree. C., wherein the second gas decomposes to form silicon; wherein the reactor has means to remove some of the beads, heat the removed beads to a temperature between 800-1200.degree. C. and then return the heated beads to the reactor.