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Method of surface preparation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/00
출원번호 US-0482222 (2000-01-13)
발명자 / 주소
  • Jeffery W. Butterbaugh
  • Brent Schwab
출원인 / 주소
  • FSI International, Inc.
대리인 / 주소
    Vidas, Arrett & Steinkraus, P.A.
인용정보 피인용 횟수 : 9  인용 특허 : 59

초록

A semiconductor substrate is heated via exposure to ultraviolet radiation substantially in the absence of a halogen containing chemical and subsequently exposed to a halogen-containing gas in the absence of ultraviolet radiation to remove contaminants therefrom.

대표청구항 ▼

1. A method of treating a semiconductor substrate comprising the steps of:providing a semiconductor substrate having oxides on the surface thereof in a process chamber; applying ultraviolet radiation to the substrate substantially in the absence of a halogen containing chemical to heat the substrate

이 특허에 인용된 특허 (59)

  1. Mizosaki Kengo,JPX ; Yoshida Masaaki,JPX, Apparatus and method for cleaning substrate surface by use of Ozone.
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  2. Moslehi Mehrdad M. (Dallas TX) Paranjpe Ajit P. (Dallas TX) Davis Cecil J. (Greenville TX), Apparatus and method for in-situ deep ultraviolet photon-assisted semiconductor wafer processing.
    상세보기
  3. Liu Yung S. (Schenectady NY) Grubb Willard T. (Schenectady NY), Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides.
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  4. Panico C. Richard (Medford MA), Apparatus for rapid curing of resinous materials and method.
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  5. Hayashi Noriyuki (Shiga JPX) Murayama Hiromi (Kyoto JPX) Ishino Yukihiko (Kyoto JPX), Apparatus for removing organic substance from substrate.
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  6. Hiatt C. Fred (Burnsville MN) Gray David C. (Sunnyvale CA) Butterbaugh Jeffery W. (Chanhassen MN), Apparatus for surface conditioning.
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  7. Norman John A. T. (Whitehall PA) Ivankovits John C. (Northampton PA) Roberts David A. (Carlsbad CA) Bohling David A. (Emmaus PA), Cleaning agents comprising beta-diketone and beta-ketoimine ligands and a process for using the same.
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  8. Bohling David A. (Emmaus PA) Ivankovits John C. (Allentown PA) Roberts David A. (Carlsbad CA), Cleaning agents for fabricating integrated circuits and a process for using the same.
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  9. Grant Robert W. (Excelsior MN) Novak Richard E. (Plymouth MN), Cluster tool dry cleaning system.
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  10. Grant Robert W. (Allenstown PA) Ruzyllo Jerzy (State College PA) Torek Kevin (State College PA), Controlled etching of oxides via gas phase reactions.
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  11. Bhat Suresh A. (Fremont CA), Controlled, gas phase process for removal of trace metal contamination and for removal of a semiconductor layer.
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  12. Fayfield Robert T. ; Heitxinger John M., Direct vapor delivery of enabling chemical for enhanced HF etch process performance.
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  13. Sugino Rinji (Kawasaki JPX) Okuno Masaki (Kawasaki JPX) Sato Yasuhisa (Kawasaki JPX), Dry cleaning process for cleaning a surface.
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  14. Sugino Rinji,JPX ; Okuno Masaki,JPX ; Sato Yasuhisa,JPX, Dry cleaning process for cleaning a surface.
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  15. Tsujii Kanji (Nishitama JPX) Yajima Yusuke (Musashino JPX) Murayama Seiichi (Kokubunji JPX), Dry etching apparatus.
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  16. Terakado Shingo (Tsukuba JPX), Dry etching method.
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  17. Roberts David A. (Carlsbad CA) Ivankovits John C. (Northampton PA) Norman John A. T. (Whitehall PA) Bohling David A. (Emmaus PA), Etching agents comprising bb 상세보기
  • Haigh John (Ipswich GB2) Aylett Martin R. (Felixstowe GB2), Etching method.
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  • Yamazaki Shunpei (Tokyo JPX), Etching method for the manufacture of a semiconductor integrated circuit.
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  • George Mark A. (Allentown PA) Bohling David A. (Emmaus PA), Gas phase cleaning agents for removing metal containing contaminants from integrated circuit assemblies and a process fo.
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  • Blackwood Robert S. (Lubbock TX) Biggerstaff Rex L. (Lubbock TX) Clements L. Davis (Lincoln NE) Cleavelin C. Rinn (Lubbock TX), Gaseous process and apparatus for removing films from substrates.
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  • Ivankovits John C. (Allentown PA) Bohling David A. (Emmaus PA) Roberts David A. (Carlsbad CA), Halogenated carboxylic acid cleaning agents for fabricating integrated circuits and a process for using the same.
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  • Okuhira Hidekazu (Kokubunji JPX) Wada Yasuo (Bunkyo JPX), Manufacturing apparatus for semiconductor devices.
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  • Bersin Richard L. (Orange CT), Method and apparatus for dry processing of substrates.
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  • Bersin Richard L. (Orange CT), Method and apparatus for dry processing of substrates.
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  • Bender Jim, Method and apparatus for removal of material utilizing near-blackbody radiator means.
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  • Butterbaugh Jeffery W. ; Gray David C. ; Fayfield Robert T. ; Siefering Kevin ; Heitzinger John ; Hiatt Fred C., Method and apparatus for surface conditioning.
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  • Fukuda Hisashi (Tokyo JPX), Method and device for cleaning substrates.
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  • Dettling Allen ; Martin Alan ; Aronow Kurt, Method for ambient light subtraction in a photoplethysmographic measurement instrument.
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  • Peckman Robert, Method for cleaning semiconductor wafers with an external heat source.
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  • Itoh Hiromi (Hyogo JPX) Iwasaki Masanobu (Hyogo JPX) Tokui Akira (Hyogo JPX) Tsukamoto Katsuhiro (Hyogo JPX), Method for pretreating semiconductor substrate by photochemically removing native oxide.
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  • Izumi Akira (Kyoto JPX) Toei Keiji (Kyoto JPX) Watanabe Nobuatsu (Kyoto JPX) Chong Yong-Bo (Kyoto JPX), Method for removing a film on a silicon layer surface.
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  • Vig John R. (Colts Neck NJ) LeBus John W. (Farmingdale NJ), Method of cleaning surfaces by irradiation with ultraviolet light.
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  • Nishizawa, Jun-ichi, Method of fabricating semiconductor device by dry process utilizing photochemical reaction, and apparatus therefor.
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  • Kawai Kenji (Hyogo JPX), Method of forming interconnection patterns.
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  • Murayama Seiichi (Kokubunji JPX) Tsujii Kanji (Tokyo JPX) Yajima Yusuke (Musashino JPX), Method of photochemical surface treatment.
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  • Izumi Akira (Kyoto JPX) Matsuka Takeshi (Kyoto JPX), Method of removing native oxide film from a contact hole on silicon wafer.
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  • Morishige Yukio (Tokyo JPX), Optical CVD method with a strong optical intensity used during an initial period and device therefor.
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  • Yamazaki Shunpei (Tokyo JPX) Imatoh Shinji (Kanagawa JPX) Hayashi Shigenori (Kanagawa JPX), Photochemical vapor phase reaction apparatus and method of causing a photochemical vapor phase reaction.
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  • Panico C. Richard (21 Leighton St. Medford MA 02155), Photoresist curing method.
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  • Sugino Rinshi (Odawara JPX), Process and apparatus for dry cleaning by photo-excited radicals.
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  • Kinoshita Keizo (Tokyo JPX), Process and apparatus for etching iron-containing materials.
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  • Sugino Rinshi (Atsugi JPX) Ito Takashi (Kawasaki JPX), Process for cleaning surface of semiconductor substrate.
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  • Green Martin Laurence ; Ma Yi, Process for semiconductor device fabrication.
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  • Holmer Arthur Edward ; Litwin Michael Mark ; Albaugh Kevin Bruce, Removal of carbon from substrate surfaces.
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  • Ohmori Toshiaki (Itami JPX) Fukumoto Takaaki (Itami JPX), Semiconductor manufacturing apparatus.
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  • Oda Masao (Amagasaki JPX) Kobayashi Toshiyuki (Amagasaki JPX) Kinoshita Yoshimi (Amagasaki JPX), Semiconductor producing apparatus.
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  • Khan Ashraf R. ; Ramanathan Sasangan ; Foggiato Giovanni Antonio, Surface modification of semiconductors using electromagnetic radiation.
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  • Kubodera Masao (Yamanashi JPX) Narushima Masaki (Yamanashi JPX) Ozawa Masahito (Yamanashi JPX) Kumagai Hiromi (Tokyo JPX) Yonenaga Tomihiro (Yamanashi JPX) Tanaka Sumi (Yamanashi JPX), Surface processing apparatus.
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  • Ninomiya Ken (Nakano JPX) Suzuki Keizo (Hachioji JPX) Nishimatsu Shigeru (Kokubunji JPX), Surface treatment apparatus.
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  • Lawing Andrew Scott ; Fayfield Robert T. ; Sawin Herbert H. ; Chang Jane, UV/halogen metals removal process.
    상세보기
  • Fayfield Robert T. ; Schwab Brent D., UV/halogen treatment for dry oxide etching.
    상세보기
  • Tanaka Masato (Hikone JPX) Nishizawa Hisao (Hikone JPX) Hirai Nobuyuki (Hikone JPX) Shinbara Kaoru (Hikone JPX) Yoshioka Hitoshi (Hikone JPX), Wafer cleaning method and apparatus therefore.
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    • 이 특허를 인용한 특허 (9)

    1. Gao, David; Mieno, Fumitake, Application of millisecond heating source for surface treatment.
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    2. Elliott, David J.; Millman, Jr., Ronald P.; Tardif, Murray; Aiello, Krista, Method for surface cleaning.
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    3. Gao, David; Mieno, Fumitake, Method of rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of epitaxial materials.
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    4. Vane, Ronald A., Oxidative cleaning method and apparatus for electron microscopes using UV excitation in an oxygen radical source.
      상세보기
    5. Wang, Yen-Kun Victor; Chou, Shang-I; Augustino, Jason, Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates.
      상세보기
    6. Wang, Yen-Kun Victor; Chou, Shang-I; Autustino, Jason, Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates.
      상세보기
    7. Augustino, Jason; Hart, Tim, Quartz window for a degas chamber.
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    8. Kawamura, Shigeru; Hayashi, Teruyuki, Substrate processing method and substrate processing apparatus.
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    9. Hart, William T.; Egley, Fred Dennis, UV lamp assembly of degas chamber having rotary shutters.
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