초록 ▼

The method is used to fabricate pure copper sputter targets. It includes first heating a copper billet to a temperature of at least 500.degree. C. The copper billet has a purity of at least 99.99 percent. Then warm working the copper billet applies at least 40 percent strain. Cold rolling the warm w

The method is used to fabricate pure copper sputter targets. It includes first heating a copper billet to a temperature of at least 500.degree. C. The copper billet has a purity of at least 99.99 percent. Then warm working the copper billet applies at least 40 percent strain. Cold rolling the warm worked copper billet then applies at least 40 percent strain and forms a copper plate. Finally, annealing the copper plate at a temperature above about 250.degree. C. forms a target blank. The target blank has equiaxed grains having an average grain size of less than 40 .mu.m. The grains of the target blank have (111), (200), (220) and (311) orientations with the amount of the grains having each of the orientations being less than 50 percent.

대표청구항 ▼

1. A method of fabricating copper sputter targets comprising the steps of:heating a copper billet to at least about 500.degree. C., the copper billet having a purity of at least 99.99 percent; warm working the heated copper billet to apply at least about 40 percent strain; cold rolling the warm work

1. A method of fabricating copper sputter targets comprising the steps of:heating a copper billet to at least about 500.degree. C., the copper billet having a purity of at least 99.99 percent; warm working the heated copper billet to apply at least about 40 percent strain; cold rolling the warm worked copper billet to apply at least about 40 percent strain and to form a copper plate; and annealing the copper plate at a temperature above about 250.degree. C. to form a target blank, the target blank having equiaxed grains, the grains having an average grain size of less than about 40 .mu.m and having (111), (200), (220) and (311) orientations with the amount of the grains having each of the orientations being less than about 50 percent.