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Apparatus for electroplating alloy films

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25D-014/00
  • C25B-009/00
출원번호 US-0671223 (2000-09-27)
발명자 / 주소
  • Parijat Bhatnagar
출원인 / 주소
  • International Business Machines Corporation
대리인 / 주소
    Fleit, Kain, Gibbons, Gutman & Bongini P.L.
인용정보 피인용 횟수 : 114  인용 특허 : 4

초록

An electroplating bath includes two electrolytes that are separated by a low ionic mobility barrier substance. Electroplating substrates can be transferred between the two electrolytes, through the barrier substance. Successive layers can be deposited by alternately electroplating in the two electro

대표청구항

1. An electroplating apparatus comprising:an electroplating bath container, a first electrolyte contained in the container; a second electrolyte contained in the container; a first anode contained in the container so as to be in contact with the first electrolyte; a first dummy electrode contained i

이 특허에 인용된 특허 (4)

  1. Copping William J. ; Lekki William Clayton ; Cassoni John Paul, Apparatus and method for electroplating tin with insoluble anodes.
  2. Gomez Rodolfo,AUX, Electrochemical system and method.
  3. Haynes Richard (East Windsor Township ; Mercer County NJ), Emulsion electrowinning.
  4. Sala Batrice (Jonzieux FRX) Guerin Laurent (St-Just-Malmont FRX) Michaut Bernard (Lyons FRX), Method and apparatus for nickel electro-plating.

이 특허를 인용한 특허 (114)

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