Photoinitiator combinations comprisingat least one compound of formula (I) [EQU1] whereinR1 is C1-C4alkyl, C1-C4alkoxy or halogen; R2 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen; R3 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl or biphenylyl or an O-, S- or N
Photoinitiator combinations comprisingat least one compound of formula (I) [EQU1] whereinR1 is C1-C4alkyl, C1-C4alkoxy or halogen; R2 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen; R3 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl or biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; and at least one compound of formula (II) [EQU2] whereinR1 and R2 are as defined above; R9 is, for example, C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; and R10 is, for example, C1-C20alkyl, C2-C20alkyl interrupted by one or more O atoms, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring; are reactive photohardeners causing only a low degree of yellowing in the cured substrates.
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1. A photopolymerizable composition comprising(A) at least one ethylenically unsaturated photopolymerizable compound, and (B) a photoinitiator mixture which comprises (a) 5-50 wt.-% of at least one compound of formula I, based on 100 wt-% (I) and (II) [EQU12] wherein R1 is C1-C4alkyl, C1-C4alkoxy or
1. A photopolymerizable composition comprising(A) at least one ethylenically unsaturated photopolymerizable compound, and (B) a photoinitiator mixture which comprises (a) 5-50 wt.-% of at least one compound of formula I, based on 100 wt-% (I) and (II) [EQU12] wherein R1 is C1-C4alkyl, C1-C4alkoxy or halogen; R2 is hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen; R3 is C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl or a group of formula (III) [EQU13]or R3 is naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring, the naphthyl, biphenylyl and O-, S- or N-containing 5- or 6-membered heterocyclic ring radicals being unsubstituted or substituted by C1-C4alkyl, C1-C4alkoxy, halogen, C1-C4alkylthio; R4, R5, R6, R7 and R8 are each independently of the others hydrogen, halogen, C1-C20alkyl, cyclopentyl, cyclohexyl, C2-C21alkenyl, C2-C20alkyl interrupted by one or more non-consecutive O atoms, phenyl-C1-C4alkyl, C1-C20alkoxy, or phenyl that is unsubstituted or substituted by one or two C1-C4alkyl or/and C1-C4alkoxy substituents; and (b) 50 -95 wt.-% of at least one compound of formula II based on 100 wt.-% (I) and (II) [EQU14] wherein R1 and R2 are as defined above; R9 is C1-C20alkyl, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, a group of formula (III), naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring, the naphthyl, biphenylyl and O-, S- or N-containing 5- or 6-membered heterocyclic ring radicals being unsubstituted or substituted by C1-C4alkyl, C1-C4alkoxy, halogen, C1-C4-ALKYLTHIO; and R10 is C, C20alkyl, C2-C20alkyl interrupted by one or more non-consecutive O atoms, C1-C20alkoxy, cyclopentyl, cyclohexyl, phenyl-C1-C4alkyl, a group of formula (III), naphthyl, biphenylyl or an O-, S- or N-containing 5- or 6-membered heterocyclic ring, the naphthyl, biphenylyl and O-, S- or N-containing 5- or 6-membered heterocyclic ring radicals being unsubstituted or substituted by C1-C4alkyl, C1-C4alkoxy, halogen, C1-C4alkylthio.
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