초록 ▼

The present invention extends the above referenced continuation-in-part application by in addition creating high quality electrical components, such as inductors, capacitors or resistors, on a layer of passivation or on the surface of a thick layer of polymer. In addition, the process of the inventi

The present invention extends the above referenced continuation-in-part application by in addition creating high quality electrical components, such as inductors, capacitors or resistors, on a layer of passivation or on the surface of a thick layer of polymer. In addition, the process of the invention provides a method for mounting discrete electrical components at a significant distance removed from the underlying silicon surface.

대표청구항 ▼

1. A capacitor for high performance integrated circuits on the surface of a semiconductor substrate, said capacitor comprising a top plate and a bottom plate and a layer of dielectric interspersed between said top and said bottom plate, comprising:a semiconductor substrate, in or on the surface of w

1. A capacitor for high performance integrated circuits on the surface of a semiconductor substrate, said capacitor comprising a top plate and a bottom plate and a layer of dielectric interspersed between said top and said bottom plate, comprising:a semiconductor substrate, in or on the surface of which semiconductor devices have been created, having points of electrical contact provided to said semiconductor devices in or on the active surface of said substrate; an overlaying interconnecting metalization structure comprising one or more layers of interconnects over the active surface of said substrate, said layers of interconnects comprising conductive interconnect lines or conductive contact points or conductive vias in one or more layers, with points of electrical contact having been provided in or on the surface of said overlaying interconnecting metalization structure, at least one of said points of electrical contact making contact with at least one of said conductive interconnect lines or said conductive contact points or said conductive vias provided in said one or more layers of said overlaying interconnecting metalization structure, at least one of said metal lines or said contact points or said conductive vias making contact with at least one of said points of electrical contact provided to said semiconductor devices in or on the surface of said substrate, said points of electrical contact provided on the surface of said overlaying interconnecting metalization structure being divided into pairs of even and odd numbered adjacent contact points whereby one point of electrical contact can belong to only one pair; a passivation layer deposited over said overlaying interconnecting metalization structure; openings created in said layer of passivation, at least one opening overlaying at least one even contact point of said points of electrical contact having been provided in or on the surface of said overlaying interconnecting metalization structure; a first layer of conductive material deposited over the surface of said layer of passivation, including said openings created in said layer of passivation; an opening created in said first layer of conductive material to at least one of said even numbered points of electrical contact provided in or on the surface of said overlaying interconnecting metalization structure, said first layer of conductive material forming said bottom plate of said capacitor; a layer of dielectric deposited over the surface of said first layer of conductive material, including said opening to at least one of said even numbered points of electrical contact; an opening in said layer of dielectric to at least one of said even numbered points of electrical contact, partially exposing at least one of said even numbered points of electrical contact, forming said layer of dielectric interspersed between said top plate and said bottom plate; a second layer of conductive material deposited over the surface of said layer of dielectric, including at least one opening created in said layer of dielectric; and said top plate of said capacitor created by patterning and etching said second layer of conductive material.