IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0124839
(1998-07-30)
|
발명자
/ 주소 |
- Takayoshi Hamaguchi JP
- Kazuyuki Minato JP
- Toshimi Matsumoto JP
- Tadashi Shimomura JP
|
출원인 / 주소 |
- Mitsubishi Gas Chemical Company, Inc. JP
|
대리인 / 주소 |
Antonelli, Terry, Stout & Kraus, LLP
|
인용정보 |
피인용 횟수 :
16 인용 특허 :
8 |
초록
▼
A deodorant, for substances containing hydrogen sulfide or mercaptans, which includes a combination of a peroxide and a nitrate ion, a combination of a peroxide, a nitrate ion and a metal salt, or a combination of a chelating agent and one of the above combinations, and a process for deodorization c
A deodorant, for substances containing hydrogen sulfide or mercaptans, which includes a combination of a peroxide and a nitrate ion, a combination of a peroxide, a nitrate ion and a metal salt, or a combination of a chelating agent and one of the above combinations, and a process for deodorization comprising treating a substance for treatment, containing hydrogen sulfide or mercaptans, with the above deodorant. Smell caused by hydrogen sulfide or mercaptans is effectively removed by the deodorant. Smell from waste water, sludge, and water discharged from washing apparatuses can be efficiently removed with use of the deodorant in a small amount in accordance with this process.
대표청구항
▼
1. A deodorant for substances containing at least one of hydrogen sulfide and mercaptans which comprises a combination of a peroxide, a chelating agent and a nitrate ion, wherein the chelating agent is included in the deodorant in an amount of 1 to 50,000 ppm by weight of the total amount of the per
1. A deodorant for substances containing at least one of hydrogen sulfide and mercaptans which comprises a combination of a peroxide, a chelating agent and a nitrate ion, wherein the chelating agent is included in the deodorant in an amount of 1 to 50,000 ppm by weight of the total amount of the peroxide and the nitrate ion, and wherein the chelating agent is at least one compound selected from the group consisting of ethylenediaminetetraacetic acid, nitrilotriacetic acid, diethylenetriaminepentaacetic acid, triethylenetetraminehexaacetic acid, polyhydroxycarboxylic acids, 1-hydroxyethylidene-1, 1-diphosphonic acid, aminotri-(methylenephosphonic acid), ethylenediaminetetra(methylene-phosphonic acid), diethylenetriaminepenta(methylenephosphonic acid), 1,2-propylenediaminetetra-(methylenephosphonic acid), hexamethylenediaminetetra-(methylenephosphonic acid), triethylenetetraminehexa-(methylenephosphonic acid), triaminotriethylaminehexa-(methylenephosphonic acid), trans-1,2-cyclohexanediaminetetra-(methylenephosphonic acid), glycol ether diaminetetra-(methylenephosphonic acid), and tetraethylenehepta-(methylenephosphonic acid).
※ AI-Helper는 부적절한 답변을 할 수 있습니다.