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Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • C23C-016/40
  • C23C-016/50
  • C23C-016/56
출원번호 US-0392944 (1999-09-09)
발명자 / 주소
  • Seshu B. Desu
  • John J. Senkevich
출원인 / 주소
  • Virginia Tech Intellectual Properties, Inc.
대리인 / 주소
    Fliesler Dubb Meyer & Lovejoy LLP
인용정보 피인용 횟수 : 16  인용 특허 : 34

초록

Nanocomposite thin films with low dielectric constants are made by the simultaneous deposition of an oxide dielectric and an organic polymer at near room temperatures. Suitable oxides include SiO2, and suitable organic polymers include poly(chloro-para-xylylene). The two dielectric materials, when d

대표청구항

1. A method for manufacturing a composite dielectric material comprising:selecting a precursor of a metal oxide dielectric material selected from the group consisting of aluminum (III) n-butoxide, yttrium isopropoxide, titanium-di-n-butoxide (bis-2,4-pentanedionate), zirconium isopropoxide, tantalum

이 특허에 인용된 특허 (34)

  1. Yu Chen-Hua D. (Allentown PA), Anisotropic deposition of dielectrics.
  2. Caporiccio Gerardo (Milan ITX) D\Agostino Riccardo (Bari ITX) Favia Pietro (Bari ITX), Articles by plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes.
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  8. Eissa Mona ; Gaynor Justin, Integrated circuit insulator and method.
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  11. Beach William F. (Bridgewater NJ) Olson Roger A. (Amery WI) Wary John (Noblesville IN), Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers.
  12. Yira Joseph H. (Amery WI) Beach William F. (Bridgewater NJ), Method for inducing fluorescence in parylene films by an active plasma.
  13. Wary John (Noblesville IN) Olson Roger A. (Amery WI) Beach William F. (Bridgewater NJ), Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device.
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  17. Wary John (Noblesville IN) Olson Roger A. (Amery WI) Beach William F. (Bridgewater NJ), Parylene deposition apparatus including an atmospheric shroud and inert gas source.
  18. Olson Roger A. (Amery WI) Wary John (Noblesville IN) Beach William F. (Bridgewater NJ), Parylene deposition apparatus including dry vacuum pump system and downstream cold trap.
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  26. Klinedinst Keith A. (Marlborough MA) Lester Joseph E. (Lincoln MA), Process for the formation of SiO2 films.
  27. Hrtner Hartmut (Mhltal DEX), Process for the preparation of [2,2]-paracyclophane.
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  29. Dolbier ; Jr. William R. (Gainsville FL) Asghar M. A. (Gainsville FL) Pan He-Qi (Gainsville FL), Processes for the preparation of octafluoro-[2,2]paracyclophane.
  30. Gotoh Hideto (Ibaraki-ken JPX) Utsugi Masaru (Ibaraki-ken JPX), Semiconductor device fabrication method.
  31. Aoyama Masaharu (Fujisawa JPX) Abe Masahiro (Yokohama JPX) Ajima Takashi (Kamakura JPX) Yonezawa Toshio (Kitakyushu JPX), Semiconductor device having a multilayer wiring structure using a polyimide resin.
  32. Pan Chuanbin ; Chiang Chien, Silicon-rich block copolymers to achieve unbalanced vias.
  33. Uemura Gosei (Osaka JPX) Satoda Yoshinari (Osaka JPX) Shigemura Eiji (Osaka JPX), Thin adhesive sheet for working semiconductor wafers.
  34. You Lu (Troy NY) Yang Guang-Rong (Troy NY) Lu Toh-Ming (Loudonville NY) Moore James A. (Wynantskill NY) McDonald John F. P. (Clifton Park NY), Vapor deposition of parylene-F using 1,4-bis (trifluoromethyl) benzene.

이 특허를 인용한 특허 (16)

  1. Todd,Michael A., Apparatus, precursors and deposition methods for silicon-containing materials.
  2. Lee, Chung J.; Kumar, Atul, Composite polymer dielectric film.
  3. Kim, Tae Won; Yan, Min; Heller, Christian Maria Anton; Schaepkens, Marc; Gorczyca, Thomas Bert; McConnelee, Paul Alan; Erlat, Ahmet Gun, High integrity protective coatings.
  4. Mahler, Joachim; Otremba, Ralf; Betz, Bernd; Hosseini, Khalil, Integrated circuit component with passivation layer.
  5. Chappa, Ralph A., Method for depositing a polymeric coating on a substrate.
  6. Elsayed Ali,Hani E.; Waldbusser,Edwin, Method for deposition of inert barrier coating to increase corrosion resistance.
  7. Lee,Jae Suk, Method for fabricating semiconductor device.
  8. Lee, Chung J.; Kumar, Atul; Chen, Chieh; Tzeng, George, Method of encapsulating an organic light emitting device.
  9. Lee, Chung J.; Kumar, Atul; Chen, Chieh, Method of encapsulating an organic light-emitting device.
  10. Lee,Chung J.; Chen,Chieh; Kumar,Atul, Organic light emitting device having a protective barrier.
  11. Hayashi,Yoshihiro, Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film.
  12. Merkel, Till; Lehnert, Christian, Process for depositing ceramic or organoceramic material on a substrate.
  13. Lee,Chung J.; Kumar,Atul, Single and dual damascene techniques utilizing composite polymer dielectric film.
  14. Pingree, Liam S. C.; Sundaram, Vasan S.; Sirkis, Michael R.; Pare, Shawn M., System and method for applying abrasion-resistant coatings.
  15. Elsayed-Ali, Hani E.; Waldbusser, Edwin, System for deposition of inert barrier coating to increase corrosion resistance.
  16. Lee,Chung J.; Kumar,Atul; Chen,Chieh; Pikovsky,Yuri, System for forming composite polymer dielectric film.
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