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Apparatus and method for objective measurement of optical systems using wavefront analysis

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • A61B-003/10
출원번호 US-0091616 (2002-03-06)
발명자 / 주소
  • Rudolph W. Frey
  • James H. Burkhalter
  • Neil Zepkin
  • Edward Poppeliers
  • John Alfred Campin
출원인 / 주소
  • Alcon, Inc. CH
대리인 / 주소
    Jeffrey S. Schira
인용정보 피인용 횟수 : 85  인용 특허 : 115

초록

An apparatus for determining aberrations of an eye includes a patient head rest allowing for positioning adjustment. The patient head rest is operable with an optical table having a base. The base includes a probe beam generating apparatus, probe beam directing optics which itself comprises a beam s

대표청구항

1. A method for determining higher order aberrations of an eye requiring a correction of greater than +3 or -3 diopters, the method comprising:directing an optical beam onto a retina of an eye; reflecting the optical beam from the retina of the eye; determining characteristics of a wavefront in the

이 특허에 인용된 특허 (115)

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