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End-effector with integrated cooling mechanism 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/07
출원번호 US-0565833 (2000-05-05)
발명자 / 주소
  • Albert Wang
출원인 / 주소
  • Matrix Integrated Systems, Inc.
대리인 / 주소
    Knobbe, Martens, Olson & Bear LLP
인용정보 피인용 횟수 : 33  인용 특허 : 20

초록

An end-effector with integrated cooling features comprises heat transferring mechanisms that transfer heat energy away from the end-effector. The end-effector advantageously minimizes the cooling overhead of a processed substrate as it is transported from a process module to a low-cost storage casse

대표청구항

1. An end-effector for transporting substrates within a semiconductor fabrication environment:the end-effector comprising a paddle portion configured to underlie at least 60% of a substrate and thereby support and conductively exchange heat with the substrate; a handle portion in conductive thermal

이 특허에 인용된 특허 (20)

  1. Tateyama Kiyohisa,JPX, Cooling method, cooling apparatus and treatment apparatus.
  2. Akimoto Masami,JPX, Cooling process system.
  3. Burgio ; Jr. Joseph T. (725 Jennings St. Bethlehem PA 18017), Dryer-cooler apparatus.
  4. Crane, Randolph W.; Marts, Donna J., Electromagnetic fasteners.
  5. Allen Ronald ; Bae Peter S. ; Fukui Kenneth D. ; Oshiro Gen E., End effector and method for loading and unloading disks at a processing station.
  6. Marohl Dan A. ; Ngan Kenny King-Tai, End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector.
  7. Shidahara Hitoshi (Okayama JPX) Yamamoto Syozi (Ibara JPX), Equipment for heating and cooling substrates for coating photo resist thereto.
  8. Brooks Ray G. (Irving TX) Brooks Timothy W. (Irving TX), Method and apparatus for maintaining sensitive articles in a contaminant-free environment.
  9. Ohmori Toshiaki (Itami JPX) Hama Masaharu (Itami JPX) Fukumoto Takaaki (Itami JPX), Method and apparatus for vapor drying.
  10. Hendrickson Ruth Ann ; Hofmeister Christopher ; Muka Richard S., Method for heating or cooling wafers.
  11. Tsui Chiu-Wing (613 Azevedo Ct. Santa Clara CA 95051) Crockett Richard H. (2783 Creekside Dr. San Jose CA 95132), Method for transferring heat to or from a semiconductor wafer using a portion of a process gas.
  12. Maydan Dan ; Somekh Sasson ; Wang David Nin-Kou ; Cheng David ; Toshima Masato ; Harari Isaac ; Hoppe Peter D., Multiple chamber integrated process system.
  13. Matthews Robert Roger, Process for treatment of semiconductor wafers in a fluid.
  14. Weigand Peter,DEX ; Shoda Naohiro, Semiconductor wafer temperature measurement and control thereof using gas temperature measurement.
  15. Aswad Thomas W., Substrate cooling system and method.
  16. Snail Keith A. (Silver Spring MD) Thorpe Thomas P. (Alexandria VA), Substrate temperature control apparatus and technique for CVD reactors.
  17. Ohkase Wataru (Sagamihara JPX), Thermal processing apparatus with heat shielding member.
  18. Bear Mark P. (Newburyport MA) Schneider F. Howard (Cambridge MA), Vertical culture system with removable culture unit.
  19. Kroeker Tony R., Wafer cooling in a transfer chamber of a vacuum processing system.
  20. Goodwin Dennis L. (Tempe AZ) Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Ferro Armand P. (Scottsdale AZ), Wafer handling system with Bernoulli pick-up.

이 특허를 인용한 특허 (33)

  1. Jung, Choong Hoon; Gil, Jong Gu; Lee, Woo Kyu; Hwang, In Seok, Apparatus for testing a wafer in a wafer testing process.
  2. Friedman,Glenn M.; Kochersperger,Peter; Laganza,Joseph, Apparatus for transferring and loading a reticle with a robotic reticle end-effector.
  3. Halpin, Michael W., Bonded structures for use in semiconductor processing environments.
  4. Shimada, Masaru; Takarabe, Sayako; Matsuo, Hideki, Carrier device.
  5. Shimada, Masaru; Takarabe, Sayako; Matsuo, Hideki, Carrier device.
  6. Shimada, Masaru; Takarabe, Sayako; Matsuo, Hideki, Carrier device.
  7. Sun, Shih Ying, Glass substrate transfer system and robot arm thereof.
  8. Sanders, Daniel G.; Schergen, Mark T., Handling apparatus for structural members.
  9. Kulp,John M., Inline physical shape profiling for predictive temperature correction during baking of wafers in a semiconductor photolithography process.
  10. Quach, David H.; Salinas, Martin Jeff, Integrated thermal unit having a shuttle with a temperature controlled surface.
  11. Quach,David H.; Salinas,Martin Jeff, Integrated thermal unit having a shuttle with a temperature controlled surface.
  12. Quach, David H.; Salinas, Martin Jeff, Integrated thermal unit having a shuttle with two-axis movement.
  13. Quach,David H.; Salinas,Martin Jeff, Integrated thermal unit having a shuttle with two-axis movement.
  14. Quach,David H.; Ishikawa,Tetsuya, Integrated thermal unit having laterally adjacent bake and chill plates on different planes.
  15. Friedman,Glenn M.; Kochersperger,Peter; Laganza,Joseph, Method for transferring and loading a reticle.
  16. Ng, Edward; Hudgens, Jeffrey C.; Majumdar, Ayan; Koshti, Sushant S., Methods and systems for improved mask processing.
  17. Edwards, Jesse W.; June, M. Sean; Therrien, Robert Joseph; Yadav, Abhishek, Parallel thermoelectric heat exchange systems.
  18. Edwards, Jesse W.; Therrien, Robert Joseph; June, M. Sean, Physically separated hot side and cold side heat sinks in a thermoelectric refrigeration system.
  19. Kim, Young Gi; Lee, Myoung Ho, Robot arm for die casting.
  20. Takemura, Shinichi; Ihara, Hiroyasu, Robot hand.
  21. Gettings, Nathan D.; Gettings, Adam M.; Penn, Taylor J.; Siler, III, Edward John; Stevens, Andrew G.; Schneider, Michael; Appleby, Jon; Gawlowski, Matthew, Robotic system and methods of use.
  22. Yang,Jong Ahn, Substrate conveyance device for fabrication of liquid crystal display device.
  23. Mizunaga, Kouichi, Substrate processing apparatus.
  24. Stanley, Marshall; Barus, Daniel, Systems and methods for operating a thermoelectric module to increase efficiency.
  25. Edwards, Jesse W.; June, M. Sean; Therrien, Robert Joseph; Yadav, Abhishek, Systems and methods to mitigate heat leak back in a thermoelectric refrigeration system.
  26. Fukumoto, Yasuhiro; Masuda, Mitsuhiro; Azuma, Toru, Thermal processing apparatus, thermal processing method, and substrate processing apparatus.
  27. Edwards, Jesse W.; June, M. Sean; Therrien, Robert Joseph; Yadav, Abhishek, Thermoelectric heat exchange system comprising cascaded cold side heat sinks.
  28. June, M. Sean; Therrien, Robert Joseph; Yadav, Abhishek; Edwards, Jesse W., Thermoelectric heat exchanger component including protective heat spreading lid and optimal thermal interface resistance.
  29. Edwards, Jesse W.; Therrien, Robert Joseph; June, M. Sean, Thermoelectric refrigeration system control scheme for high efficiency performance.
  30. Inao, Yoshihiro; Kobari, Satoshi; Nakamura, Akihiko, Transport arm, transport apparatus and transport method.
  31. Koike, Toshio, Transport robot and transport apparatus.
  32. Edwards, Jesse W.; June, M. Sean; Therrien, Robert Joseph; Yadav, Abhishek, Two-phase heat exchanger mounting.
  33. Ingram-Goble, Robbie; Simmons, Michael E.; Wolf, Philip; Garrison, Ryan; Storm, Christopher, Wafer-handling end effectors with wafer-contacting surfaces and sealing structures.
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