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Vacuum pressure control apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16K-031/42
  • F16K-051/02
출원번호 US-0438956 (1999-11-12)
우선권정보 JP-0323690 (1998-11-13)
발명자 / 주소
  • Kouketsu, Masayuki
출원인 / 주소
  • CKD Corporation
대리인 / 주소
    Finnegan, Henderson, Farabow, Garrett & Dunner L.L.P.
인용정보 피인용 횟수 : 32  인용 특허 : 4

초록

A vacuum pressure control apparatus includes a vacuum proportional opening and closing valve 18 which is disposed on a pipe connecting a vacuum chamber 11 and a vacuum pump 19 and changes its opening to control the vacuum pressure in the vacuum chamber 11, and a pressure sensor 17 which measures the

대표청구항

1. A vacuum pressure control apparatus for controlling vacuum pressure in a vacuum vessel from which gas is sucked by means of a vacuum pump, the apparatus including: a vacuum proportional opening and closing valve which is disposed between the vacuum pump and the vacuum vessel and changes its op

이 특허에 인용된 특허 (4)

  1. Lorimer D\Arcy H. (Pismo Beach CA), Low particulate slit valve system and method for controlling same.
  2. Kouketsu Masayuki,JPX ; Watanabe Masayuki,JPX ; Nitta Shinichi,JPX ; Takehara Hiroshi,JPX, Vacuum pressure control system.
  3. Hurwitt ; deceased Steven D., Vacuum processing apparatus with low particle generating vacuum seal.
  4. Pipinias John (Eliot ME), Valve for controlling flow.

이 특허를 인용한 특허 (32)

  1. Okerson, Ryan; Doyle, Andrew; Close, Cameron; Finodeyev, Filip; Giegel, Joshua; Hosseini, Kaveh, Adjustable variable atmospheric condition testing apparatus and method.
  2. Gealy, Dan; Weimer, Ronald A., Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers.
  3. Carpenter,Craig M.; Mardian,Allen P.; Dando,Ross S.; Tschepen,Kimberly R.; Derderian,Garo J., Apparatus and method for depositing materials onto microelectronic workpieces.
  4. Mardian, Allen P.; Rodriguez, Santiago R., Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes.
  5. Derderian,Garo J., Apparatus and methods for plasma vapor deposition processes.
  6. Carpenter,Craig M.; Dando,Ross S.; Mardian,Allen P., Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.
  7. Okamura, Yoshimasa; Mori, Yoji, Corrosion resistant coating for process gas control valve.
  8. Yamada, Yoshiyuki; Umezawa, Shunsuke, External seal structure of vacuum valve.
  9. Inayama, Naoto; Kajitani, Masao, Fluid pressure regulator.
  10. Zheng,Lingyi A.; Doan,Trung T.; Breiner,Lyle D.; Ping,Er Xuan; Beaman,Kevin L.; Weimer,Ronald A.; Kubista,David J.; Basceri,Cem, Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces.
  11. Beaman,Kevin L.; Weimer,Ronald A.; Breiner,Lyle D.; Ping,Er Xuan; Doan,Trung T.; Basceri,Cem; Kubista,David J.; Zheng,Lingyi A., Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers.
  12. Beaman, Kevin L.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Ping, Er-Xuan; Kubista, David J.; Basceri, Cem; Zheng, Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD deposition.
  13. Beaman,Kevin L.; Doan,Trung T.; Breiner,Lyle D.; Weimer,Ronald A.; Ping,Er Xuan; Kubista,David J.; Basceri,Cem; Zheng,Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition.
  14. Carpenter,Craig M.; Dynka,Danny, Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers.
  15. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  16. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  17. Basceri,Cem; Doan,Trung T.; Weimer,Ronald A.; Beaman,Kevin L.; Breiner,Lyle D.; Zheng,Lingyi A.; Ping,Er Xuan; Sarigiannis,Demetrius; Kubista,David J., Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces.
  18. Hashimoto, Yasuhiko, Monitoring apparatus for robot.
  19. Snijders,Gert Jan, Pressure control system.
  20. Carpenter,Craig M.; Dando,Ross S.; Dynka,Danny, Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  21. Dando, Ross S., Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  22. Miller, Matthew W.; Basceri, Cem, Reactors, systems and methods for depositing thin films onto microfeature workpieces.
  23. Sonoda,Kouji; Murai,Masakazu; Hikichi,Kouetsu; Sasaki,Hideki; Saito,Yoshio; Katano,Koji; Fukuma,Kazunori; Ozaki,Hiroyasu; Miyano,Kouji; Sahoda,Katsumi, Solenoid valve for fuel cell.
  24. Salo Darder, Jordi; Godayol Martí, Antoni, Support device for a skin treatment assembly.
  25. Bush, Shawn D., System and method for a diaphragm valve controlled through measurement of water pressure and solenoid opening time.
  26. Bush, Shawn D., System and method for a diaphragm valve controlled through measurement of water pressure and solenoid opening time.
  27. Bush, Shawn D., System, method, and apparatus for monitoring wear in a flush valve using pressure detection.
  28. Marisi,Margaret Grahn, Urinary catheter with check valve.
  29. Itafuji, Hiroshi; Kouketsu, Masayuki, Vacuum control system and vacuum control method.
  30. Itafuji, Hiroshi; Kouketsu, Masayuki, Vacuum control valve and vacuum control system.
  31. Nishimura, Yasunori; Watanabe, Masayuki; Hashiguchi, Seiji, Vacuum pressure control apparatus.
  32. Ishigaki, Tsuneo, Vacuum valve.
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