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Method for abatement of gaseous pollutants 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/56
  • B01J-008/00
출원번호 US-0892729 (2001-06-27)
발명자 / 주소
  • Herman, Timothy L.
  • Ellis, Jack
  • Tsang, Floris Y.
  • Clark, Daniel O.
  • Flippo, Belynda G.
  • Inori, David
  • Kaarup, Keith
  • Morgenlaender, Mark
  • Mao, Aaron
출원인 / 주소
  • Advanced Technology Materials, Inc.
대리인 / 주소
    Zitzmann, Oliver A.Hultquist, Steven J.
인용정보 피인용 횟수 : 12  인용 특허 : 22

초록

An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through whi

대표청구항

1. A process for abating chemical pollutants in a pollutant-containing gas stream comprising the steps of introducing said gas stream into a reaction chamber through a pre-reaction section comprising at least one conduit accommodating at least one secondary inlet for introducing at least one additio

이 특허에 인용된 특허 (22)

  1. Kleinert Michael (Dresden DDX) Mller Rainer (Dresden DDX) Stelzer Horst (Dresden DDX), Apparatus for guiding gas for LP CVD processes in a tube reactor.
  2. Hartung Rolf,DEX ; Autenrieth Hans,DEX ; Kroedel Gunter,DEX ; Fabian Lutz,DEX ; Resch Dietmar,DEX, Apparatus for purifying waste gases.
  3. Itoh Fumio (Sakai JPX) Sasaki Tutomu (Takarazuka JPX) Kanoh Ikuhisa (Osaka JPX) Fukumoto Takaaki (Kishiwada JPX), Apparatus for removing at least one acidic component from a gas.
  4. Imamura Hiroshi (Suita JPX), Apparatus for removing harmful substances of exhaust gas discharged from semiconductor manufacturing process.
  5. Mller Rainer (Dresden DEX) Resch Dietmar (Dresden DEX) Fabian Lutz (Dresden DEX), Apparatus for the gas-phase processing of disk-shaped workpieces.
  6. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Apparatus, process, and composition for in-situ generation of polyhydridic compounds of group IV-VI elements.
  7. Tom Glenn M. (New Milford CT), Bulk gas sorption and apparatus, gas containment/treatment system comprising same, and sorbent composition therefor.
  8. Clyde Robert A. (P.O. Box 983 Asheville NC 28802), Catalytic heat exchanger.
  9. Belmonte Frank G. ; Abrams Kenneth J. ; Oppenheim Judith P., Catalytic vent gas treatment system for abatement of volatile chemical emissions.
  10. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT) Luxon Bruce A. (Stamford CT), Composition, apparatus, and process, for sorption of gaseous compounds of group II-VII elements.
  11. Smith James W. (Toronto CAX) Lee Nim Y. (Toronto CAX), Dual impeller method and apparatus for effecting chemical conversion.
  12. Anderson Lawrence B. (Encinitas CA), Flashback protection apparatus and method for suppressing deflagration in combustion-susceptible gas flows.
  13. Pereira Carmo J. (Silver Spring MD) Schwartz Rodney J. (Green Bay WI), Flow modification devices for reducing emissions from thermal voc oxidizers.
  14. Sheu David,TWX ; Tseng Ling-Hsin,TWX ; Wong Ka-Hing,TWX ; Sheu D. Y.,TWX, Gas exhaust apparatus.
  15. Morlec Jean (Saint-Nazaire FRX) Bourcier Jacques (4 ; rue de l\Etoile du Matin 44600 Saint-Nazaire FRX), Heat transfer and thermal cleaning rotary device applied to gaseous effluents.
  16. Carr William J. (San Jose CA) Krummen Raymond S. (Los Gatos CA), Hydrodynamic fume scrubber.
  17. Anderson Lawrence B. (Encinitas CA) Hammon Timothy E. (Cardiff CA) Frieler Cliff (Highland Park CA), Incinerator for complete oxidation of impurities in a gas stream.
  18. Boll Wolf (Weinstadt DEX) Steinkmper Reinhard (Winnenden DEX) Kempka Karl-Heinz (Esslingen DEX) Zeilinger Karl (Winnenden DEX), Internal combustion engine exhaust system.
  19. Tom Glenn M. (New Milford CT), Method for concentration and recovery of halocarbons from effluent gas streams.
  20. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds.
  21. Wang Chi S. (5923 Fairmont Dr. Woodridge IL 60517), Ultra-pyrolysis reactor for hazardous waste destruction.
  22. Park Young-bae,KRX ; Seo Sang-hoon,KRX ; Kim Hyung-youl,KRX, Waste gas disposal apparatus and method of the same.

이 특허를 인용한 특허 (12)

  1. Ferron, Shawn; Kelly, John; Vermeulen, Robbert, Apparatus and method for controlled combustion of gaseous pollutants.
  2. Moore, Robert R.; Getty, James D.; Safiullin, Ravil, Apparatus and method for controlled decomposition oxidation of gaseous pollutants.
  3. Shiban, Samir S., Apparatus for dynamic oxidation of process gas.
  4. Shiban,Samir S., Combined chemical agent and dynamic oxidation treatment of hazardous gas.
  5. Shiban, Samir S., Dynamic oxidation of process gas.
  6. Shiban, Samir S., Hazardous gas abatement system using electrical heater and water scrubber.
  7. Shiban, Samir S., Hazardous gas abatement system using electrical heater and water scrubber.
  8. Clark, Daniel O.; Raoux, Sebastien; Vermeulen, Robert M.; Crawford, Shaun W., Methods and apparatus for sensing characteristics of the contents of a process abatement reactor.
  9. Chiu, Ho-Man Rodney; Clark, Daniel O.; Crawford, Shaun W.; Jung, Jay J.; Loldj, Youssef A.; Vermeulen, Robbert M., Methods for starting and operating a thermal abatement system.
  10. Chiu, Ho-Man Rodney; Clark, Daniel O.; Crawford, Shaun W.; Jung, Jay J.; Todd, Leonard B.; Vermeulen, Robbert, Reactor design to reduce particle deposition during process abatement.
  11. Au-Yeung, Patrick H.; Jewell, Dennis W.; Pendergast, Jr., John G., Rich gas absorption apparatus and method.
  12. Chiu, Ho-Man Rodney; Clark, Daniel O.; Crawford, Shaun W.; Jung, Jay J.; Loldj, Youssef A.; Vermeulen, Robbert, Safety, monitoring and control features for thermal abatement reactor.
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