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Gas purification system and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/04
출원번호 US-0887761 (2001-06-22)
발명자 / 주소
  • Spiegelman, Jeffrey J.
  • Abber, Russell L.
출원인 / 주소
  • Aeronex, Inc.
대리인 / 주소
    Brown, Martin, Haller & McClain, LLP
인용정보 피인용 횟수 : 20  인용 특허 : 9

초록

A gas purification system has at least one purifier in a purifier line with a gas supply inlet at one end and a process outlet at an opposite end for connection to a process tool using the purified gas. A vent line having a vent outlet is connected to the outlet end of the purifier. A control valve

대표청구항

A gas purification system has at least one purifier in a purifier line with a gas supply inlet at one end and a process outlet at an opposite end for connection to a process tool using the purified gas. A vent line having a vent outlet is connected to the outlet end of the purifier. A control valve

이 특허에 인용된 특허 (9)

  1. Kawai Masaki (Fujisawa JPX), Gas separator system.
  2. Lorimer D\Arcy H. (Pismo Beach CA), Method and apparatus for predicting end-of-life of a consumable in a fluid purification system.
  3. Briesacher Jeffrey L. (Pismo Beach CA) Applegarth Charles H. (San Luis Obispo CA) Lorimer D\Arcy H. (Pismo Beach CA), Method and apparatus for removing residual hydrogen from a purified gas.
  4. Alvarez ; Jr. Daniel ; Spiegelman Jeffrey J., Method for water removal from corrosive gas streams.
  5. Alvarez ; Jr. Daniel ; Spiegelman Jeffrey J., Method, composition and apparatus for water removal from non-corrosive gas streams.
  6. Campbell Michael J. (Clarence Center NY) Smolarek James (Boston NY) Pietruszewski John J. (Buffalo NY), Oxygen enriched air system.
  7. Succi Marco,ITX ; Vergani Giorgio,ITX ; Lorimer D'Arcy H., Safety system for gas purifier.
  8. Lorimer D'Arcy H. ; Applegarth Charles H., Semiconductor manufacturing system with getter safety device.
  9. McCombs, Norman R.; Bansal, Ravinder K., Single bed pressure swing adsorption gas separation system.

이 특허를 인용한 특허 (20)

  1. Oosterlaken, Theodorus; de Ridder, Chris; Jdira, Lucian, Apparatus and method for manufacturing a semiconductor device.
  2. den Hartog Besselink, Edwin; Garssen, Adriaan; Dirkmaat, Marco, Cassette holder assembly for a substrate cassette and holding member for use in such assembly.
  3. Raisanen, Petri; Shero, Eric; Haukka, Suvi; Milligan, Robert Brennan; Givens, Michael Eugene, Deposition of metal borides.
  4. Milligan, Robert Brennan, Formation of boron-doped titanium metal films with high work function.
  5. Van Der Net,Antonius Johannes; Spiegelman,Jeffrey J.; Van Bragt,Johannus Josephus, Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system.
  6. Parekh, Bipin S.; Spiegelman, Jeffrey J.; Zeller, Robert S.; Holmes, Russell J., Lithographic projection apparatus, purge gas supply system and gas purging method.
  7. Parekh, Bipin S.; Spiegelman, Jeffrey J.; Zeller, Robert S.; Holmes, Russell J., Lithographic projection apparatus, purge gas supply system and gas purging method.
  8. Pore, Viljami, Method and apparatus for filling a gap.
  9. Pore, Viljami; Knaepen, Werner; Jongbloed, Bert; Pierreux, Dieter; Van Der Star, Gido; Suzuki, Toshiya, Method and apparatus for filling a gap.
  10. Knaepen, Werner; Maes, Jan Willem; Jongbloed, Bert; Kachel, Krzysztof Kamil; Pierreux, Dieter; De Roest, David Kurt, Method of forming a structure on a substrate.
  11. Lee, Choong Man; Yoo, Yong Min; Kim, Young Jae; Chun, Seung Ju; Kim, Sun Ja, Method of forming metal interconnection and method of fabricating semiconductor apparatus using the method.
  12. Chun, Seung Ju; Yoo, Yong Min; Choi, Jong Wan; Kim, Young Jae; Kim, Sun Ja; Lim, Wan Gyu; Min, Yoon Ki; Lee, Hae Jin; Yoo, Tae Hee, Method of processing a substrate and a device manufactured by using the method.
  13. Kohen, David; Profijt, Harald Benjamin, Methods for depositing a doped germanium tin semiconductor and related semiconductor device structures.
  14. Raisanen, Petri; Givens, Michael Eugene, Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures.
  15. Billingham, John Fredric; Mahl, Jerry Michael, Process and system for purifying gases.
  16. Billingham,John Fredric; Mahl,Jerry Michael, Process and system for purifying gases.
  17. Margetis, Joe; Tolle, John; Bartlett, Gregory; Bhargava, Nupur, Process for forming a film on a substrate using multi-port injection assemblies.
  18. Alokozai, Fred; Milligan, Robert Brennan, Process gas management for an inductively-coupled plasma deposition reactor.
  19. Choi, Chul-Hwan; Jeon, Jin-Ho; Kim, Yong-Gab; Yi, Jong-Seung; Lee, Min-Woo; Kim, Kyung-Tae; Cho, Chan-Hyung, Residual gas removing device and method thereof.
  20. Zhu, Chiyu, Selective film deposition method to form air gaps.
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