초록 ▼

Purification of a hydrogen-based gas mixture containing impurities such as carbon monoxide, nitrogen and methane is effected by contacting the gaseous mixture with a zeolite adsorbent which is a shaped product comprised of at least 95%, as determined on the basis of the moisture equilibrium adsorpti

Purification of a hydrogen-based gas mixture containing impurities such as carbon monoxide, nitrogen and methane is effected by contacting the gaseous mixture with a zeolite adsorbent which is a shaped product comprised of at least 95%, as determined on the basis of the moisture equilibrium adsorption value, of a low-silica type X zeolite having a SiO2/Al2O3molar ratio of 1.9 to 2.1. The zeolite adsorbent is preferably ion-exchanged with lithium and/or calcium. The zeolite adsorbent is preferably prepared by a process including a step of contacting with a caustic solution a calcined product of a mixture of a low-silica type X zeolite and kaolin clay whereby the kaolin clay is converted to a low-silica type X zeolite.

대표청구항 ▼

Purification of a hydrogen-based gas mixture containing impurities such as carbon monoxide, nitrogen and methane is effected by contacting the gaseous mixture with a zeolite adsorbent which is a shaped product comprised of at least 95%, as determined on the basis of the moisture equilibrium adsorpti

Purification of a hydrogen-based gas mixture containing impurities such as carbon monoxide, nitrogen and methane is effected by contacting the gaseous mixture with a zeolite adsorbent which is a shaped product comprised of at least 95%, as determined on the basis of the moisture equilibrium adsorption value, of a low-silica type X zeolite having a SiO2/Al2O3molar ratio of 1.9 to 2.1. The zeolite adsorbent is preferably ion-exchanged with lithium and/or calcium. The zeolite adsorbent is preferably prepared by a process including a step of contacting with a caustic solution a calcined product of a mixture of a low-silica type X zeolite and kaolin clay whereby the kaolin clay is converted to a low-silica type X zeolite. ycle for processing samples, and wherein the gas supply flow controller and exhaust flow controller regulate the flow of gas through the oven enclosure to purge oxygen from within the oven enclosure prior to the heating cycle. 14. The chromatography system of claim 11 having a heating cycle and a cooling cycle for processing samples, and wherein the gas supply flow controller and exhaust flow controller regulate the flow of gas through the oven enclosure to accelerate cooling of the column during the cooling cycle. 15. A chromatography system having a heating cycle and a cooling cycle for processing a series of samples, said chromatography system comprising: an oven having a pneumatically-sealable interior enclosure; a chromatographic column within the oven enclosure; a gas supply for supplying gas substantially devoid of oxygen; a gas supply flow controller regulating the flow of gas from the gas supply into the oven enclosure prior to the heating cycle to thereby purge oxygen from within the oven enclosure; and an exhaust system having a exhaust flow controller for regulating the flow of gas from within the oven enclosure during the cooling cycle. 16. The chromatography system of claim 15 wherein the gas comprises nitrogen. 17. The chromatography system of claim 15 wherein the gas comprises carbon dioxide. 18. The chromatography system of claim 15 wherein the chromatographic column comprises a bundled coil. 19. The chromatography system of claim 18 wherein the oven enclosure has a substantially annular cavity to contain the coil. 20. The chromatography system of claim 15 wherein the gas supply flow controller and exhaust flow controller regulate the flow of gas through the oven enclosure to purge oxygen from within the oven enclosure prior to the heating cycle. 21. The chromatography system of claim 15 wherein the gas supply flow controller and exhaust flow controller regulate the flow of gas through the oven enclosure to accelerate cooling of the column during the cooling cycle. 22. The chromatography system of claim 15 wherein the gas supply flow controller maintains the oven enclosure at a positive pressure to prevent diffusion of oxygen into the oven enclosure. 23. The chromatography system of claim 15 wherein the exhaust flow controller releases gas from the oven enclosure if the pressure within the oven enclosure exceeds a predetermined limit.