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Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/44
출원번호 US-0632502 (2000-08-03)
발명자 / 주소
  • Cheung, David
  • Raoux, Sebastien
  • Huang, Judy H.
  • Taylor, Jr., William N.
  • Fodor, Mark
  • Fairbairn, Kevin
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Townsend and Townsend and Crew, LLP
인용정보 피인용 횟수 : 27  인용 특허 : 20

초록

An apparatus for converting PFC gases exhausted from semiconductor processing equipment to less harmful, non-PFC gases. One embodiment of the apparatus includes a silicon filter and a plasma generation system. The plasma generation system forms a plasma from the effluent PFC gases. Constituents from

대표청구항

An apparatus for converting PFC gases exhausted from semiconductor processing equipment to less harmful, non-PFC gases. One embodiment of the apparatus includes a silicon filter and a plasma generation system. The plasma generation system forms a plasma from the effluent PFC gases. Constituents from

이 특허에 인용된 특허 (20)

  1. Sherman Robert C. (Austin TX), Baffle/settling chamber for a chemical vapor deposition equipment.
  2. Krogh Ole D. (110 Point Lobos Ave. San Francisco CA 94121), ECR plasma source for gas abatement.
  3. Obuchi Akira (Tsukuba JPX) Yoshiyama Hidenori (Tsukuba JPX) Ohi Akihiko (Tsukuba JPX) Aoyama Hyogoro (Tsukuba JPX) Ohuchi Hideo (Tsukuba JPX) Ogata Atsushi (Tsukuba JPX) Mizuno Koichi (Ibaraki JPX) M, Exhaust gas cleaner.
  4. Pollock James F. (Old Windsor GBX), Exhaust particulate filter.
  5. Kurokawa Takashi (Yokohama JPX), Exhaust system for chemical vapor deposition apparatus.
  6. Maeba Yoshiyasu (Samukawa JPX) Toyoda Satoru (Chigasaki JPX) Naruse Humio (Yokohama JPX), Fine particle collector trap for vacuum evacuating system.
  7. Singh Bawa (Cherry Hill NJ) Arie Yehuda (East Windsor NJ) Mesker Ormond R. (Lambertville NJ), Hollow cathode plasma assisted apparatus and method of diamond synthesis.
  8. Gu Youfan, Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace.
  9. Cheung David ; Raoux Sebastien ; Huang Judy H. ; Taylor ; Jr. William N. ; Fodor Mark ; Fairbairn Kevin, Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions.
  10. Chiu Kin-Chung R. (Scotts Valley CA), Method and system for vapor extraction from gases.
  11. Tsuji Osamu (Ohotsu JPX), Method of and system for processing halogenated hydrocarbons.
  12. Kelly Eugene P. (Spring Valley CA) Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Method of rapid sample handling for laser processing.
  13. Raoux Sebastien ; Tanaka Tsutomu ; Kelkar Mukul ; Ponnekanti Hari ; Fairbairn Kevin ; Cheung David, Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment.
  14. Russell Stephen D. (San Diego CA) Sexton Douglas A. (San Diego CA), Photon controlled decomposition of nonhydrolyzable ambients.
  15. Tsuchimoto ; Takashi, Plasma processor.
  16. Lee Young H. (Somers NY), Plasma reactor for processing substrates.
  17. Wofford Bill ; Jackson Marc ; Bevan John, Process and device for destruction of halohydrocarbons.
  18. Blalock Guy T. (Boise ID), Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors.
  19. Kanter Ira E. (Monroeville PA) Hundstad Richard L. (Forest Hills Boro PA), Stack gas emissions control system.
  20. Wang David N. (Cupertino) White John M. (Hayward) Law Kam S. (Union City) Leung Cissy (Union City) Umotoy Salvador P. (Pittsburg) Collins Kenneth S. (San Jose) Adamik John A. (San Ramon) Perlov Ilya , Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planar.

이 특허를 인용한 특허 (27)

  1. Park, Jun-Sig, Apparatus and method for producing a semiconductor device including a byproduct control system.
  2. Langan, John Giles; Johnson, Andrew David, CVD chamber cleaning using mixed PFCs from capture/recycle.
  3. Raj, Govinda; Agarwal, Monika; Mohiuddin, Hamid; Narendrnath, Kadthala R., Corrosion resistant abatement system.
  4. Chen, Lee; Funk, Merritt, DC and RF hybrid processing system.
  5. Mauro,Schiavon, Device and method for production of carbon nanotubes, fullerene and their derivatives.
  6. Hosch, Jimmy W.; Goeckner, Matthew J.; Whelan, Mike; Kueny, Andrew Weeks; Harvey, Kenneth C.; Thamban, P.L. Stephan, Electron beam exciter for use in chemical analysis in processing systems.
  7. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Ted; Yao, Andrew, Enhanced passivation process to protect silicon prior to high dose implant strip.
  8. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  9. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  10. Goto, Haruhiro Harry; Cheung, David, High dose implantation strip (HDIS) in H2 base chemistry.
  11. Huang, Yongzhang; Colvin, Neil K; Hoyt, Kevin J, Ion source arc chamber seal.
  12. Cheung, David; Li, Ted; Guha, Anirban; Ostrowski, Kirk, Low damage photoresist strip method for low-K dielectrics.
  13. Shufflebotham, Paul Kevin; Barnes, Michael, Method and apparatus for abatement of reaction products from a vacuum processing chamber.
  14. Shufflebotham, Paul Kevin; Barnes, Michael, Method and apparatus for abatement of reaction products from a vacuum processing chamber.
  15. Chen, David L.; Su, Yuh-Jia; Chiu, Eddie Ka Ho; Pozzoli, Maria Paola; Li, Senzi; Colangelo, Giuseppe; Alba, Simone; Petroni, Simona, Method for post-etch cleans.
  16. Chen, David; Goto, Haruhiro Harry; Martina, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  17. Chen, David; Goto, Haruhiro Harry; Su, Martina; Greer, Frank; Alokozai, Shamsuddin, Methods for stripping photoresist and/or cleaning metal regions.
  18. Radoiu, Marilena; Smith, James Robert; Seeley, Andrew James, Microwave plasma abatement apparatus.
  19. Slingerland, Hendrik Nicolaas; Knowles, William Ralph, Particle optical apparatus with a predetermined final vacuum pressure.
  20. Thedjoisworo, Bayu Atmaja; Jacobs, Bradley Jon; Berry, Ivan; Cheung, David, Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films.
  21. Goto, Haruhiro Harry; Kalinovski, Ilia; Mohamed, Khalid, Photoresist strip method for low-k dielectrics.
  22. Shaviv, Roey; Ostrowski, Kirk; Cheung, David; Park, Joon; Thedjoisworo, Bayu; Lord, Patrick J., Photoresist strip processes for improved device integrity.
  23. Cheung, David; Ostrowski, Kirk J, Plasma based photoresist removal system for cleaning post ash residue.
  24. Cheung, David; Ostrowski, Kirk J., Plasma based photoresist removal system for cleaning post ash residue.
  25. Hur, Min; Kang, Woo Seok; Lee, Jae Ok, Plasma reactor for abatement of hazardous material.
  26. Goto, Haruhiro Harry; Cheung, David, Simultaneous front side ash and backside clean.
  27. Cheung, David; Fang, Haoquan; Kuo, Jack; Kalinovski, Ilia; Li, Zhao; Yao, Guhua; Guha, Anirban; Ostrowski, Kirk J., Ultra low silicon loss high dose implant strip.
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