초록

Multicurved copper films having fine-line elements suitable for radome applications can be improved by cutting the elements with reproducible precision to close tolerance (typically line widths of 3-10±0.25 mil) using an etchant comprising a concentrated saline solution of CuCl2.

대표청구항 ▼

Multicurved copper films having fine-line elements suitable for radome applications can be improved by cutting the elements with reproducible precision to close tolerance (typically line widths of 3-10±0.25 mil) using an etchant comprising a concentrated saline solution of CuCl2. ncy approximately w

Multicurved copper films having fine-line elements suitable for radome applications can be improved by cutting the elements with reproducible precision to close tolerance (typically line widths of 3-10±0.25 mil) using an etchant comprising a concentrated saline solution of CuCl2. ncy approximately within the second operating frequency range, the resonant circuit having a high resistance for frequencies of the first operating frequency range. 6. The antenna arrangement according to claim 4, wherein: the electronic circuit is a semiconductor component. 7. The antenna arrangement according to claim 6, wherein: the semiconductor is configured to be switched into a blocking state when the radiating element is supplied with signals having a frequency within the first operating frequency range; and the semiconductor is configured to be switched into a conductive state when the radiating element is supplied with signals having a frequency within the second operating frequency range. 8. The antenna arrangement according to claim 4, wherein: a length of the radiating element, a height of the supply connection, a height of the reference potential connection, and a distance between the supply connection and the reference potential connection are configured so that an input resistance of the antenna arrangement at the supply connection is approximately the same for the first operating frequency range and the second operating frequency range. 9. The antenna arrangement according to claim 8, wherein: the length of the radiating element is approximately 80 mm; the height of the supply connection is approximately 15 mm; the height of the reference potential connection is approximately 15 mm; the distance between the supply connection and the reference potential connection is approximately 15 mm; the first operating frequency range is 1.8 GHz to 1.9 GHz; and the second operating frequency range is 0.9 GHz to 1 GHZ, so that in the first operating frequency range and the second operating frequency range, the input resistance of the antenna arrangement at the supply connection is 50 ohms. 10. The antenna arrangement according to claim 4, further comprising: a second impedance transforming an output resistance of an antenna network so that in the first operating frequency range and the second operating frequency range the output resistance is adjusted to a respective input resistance of the antenna arrangement at the supply connection. 11. The antenna arrangement according to claim 10, wherein: the second impedance is a line impedance having a length approximately equal to one fourth of operating wavelengths of the second operating frequency range, the second operating frequency range having frequencies that are approximately half as large as frequencies of the first operating frequency range. 12. The antenna arrangement according to claim 4, wherein: the radiating element is bent. 13. The antenna arrangement according to claim 4, wherein: the antenna arrangement is embedded in a material having a dielectric constant significantly larger than one. 14. The antenna arrangement according to claim 4, wherein: the radiating element, the supply connection, and the reference potential connection are an inverted-F antenna.