$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Container chemical guard 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F17C-013/00
출원번호 US-0146407 (1998-09-03)
발명자 / 주소
  • Gregg, John N.
  • Harris, Gregory W.
  • Cook, Frank L.
  • Jackson, Robert M.
출원인 / 주소
  • Advanced Technology Materials, Inc.
대리인 / 주소
    Chappuis, MargaretRyann, William
인용정보 피인용 횟수 : 20  인용 특허 : 11

초록

In a first respect this invention is a container, comprising: a cylindrical, hollow body capped on both ends by a base and a top; a conduit that bisects the top and extends into the interior of the container; and a perforated housing that encompasses the portion of the conduit that extends into the

대표청구항

1. A method for the depressurizing a canister that contains a chemical, comprising: attaching a splash guard to a line that runs to the canister; attaching a second line and valving that connects the splash guard to a vacuum source; subjecting the canister to a vacuum as a depressurization step

이 특허에 인용된 특허 (11)

  1. Wu Wen Sheng,TWX ; Cho Cheng Li,TWX ; Li Hung-Yeh,TWX, Apparatus and method for replacing an attachment on a vacuum chamber.
  2. Siegele Stephen H. (Campbell CA) Noah Craig M. (Mountain View CA) Gregg John N. (Marble Falls TX), Bulk containers for high purity chemical delivery systems.
  3. Lipisko Bruce A. (Carlsbad CA) Schumacher John C. (Rancho Santa Fe CA) Howard Richard E. (Escondido CA) Randtke Peter T. (San Marcos CA) Sandu Adrian (La Mesa CA) Fletcher Robert E. (Vista CA) Graf H, Chemical refill system.
  4. Siegele Stephen H. (Campbell CA) Noah Craig M. (Mountain View CA) Gregg John N. (Marble Falls TX), Chemical refill system for high purity chemicals.
  5. Siegele Stephen H. (Campbell CA) Noah Craig M. (Mountain View CA) Gregg John N. (San Jose CA), Chemical refill system for high purity chemicals.
  6. Klotz Maynard F. ; Schueman Gary K., Controller for tank-filling system.
  7. Suzuki Nobumasa,JPX, High-speed soft evacuation process and system.
  8. Siegele Stephen H. ; Noah Craig M. ; Gregg John N., Level control systems for high purity chemical delivery systems.
  9. Siegele Stephen H. (Campbell CA) Noah Craig M. (Mountain View CA) Gregg John N. (Marble Falls TX), Manifold systems for high purity chemical delivery systems.
  10. Mattern Charles C. (Wintergarden FL), System for removal of unknown, corrossive, or potentially hazardous gases from a gas container.
  11. Fisher Larry Nelson ; Groseclose Warren Peery, Use of inert gas in transfer of comminuted product to tank.

이 특허를 인용한 특허 (20)

  1. Lee, Wei Ti; Chiao, Steve H., Ampoule splash guard apparatus.
  2. Lee,Wei Ti; Chiao,Steve H., Ampoule splash guard apparatus.
  3. Chen,Ling; Ku,Vincent W.; Chang,Mei; Wu,Dien Yeh; Chung,Hua, Apparatus and method for hybrid chemical processing.
  4. Ma, Paul; Shah, Kavita; Wu, Dien-Yeh; Ganguli, Seshadri; Marcadal, Christophe; Wu, Frederick C.; Chu, Schubert S., Apparatus and process for plasma-enhanced atomic layer deposition.
  5. Chen, Ling; Ku, Vincent W.; Chang, Mei; Wu, Dien Yeh; Chung, Hua, Apparatus for hybrid chemical processing.
  6. Chung,Hua; Chen,Ling; Yu,Jick; Chang,Mei, Apparatus for integration of barrier layer and seed layer.
  7. Gunzinam, Franz; Strauch, Roland; Ress, Wolfgang; Stemick, Ulrich, Apparatus for manufacturing fluid reaction products.
  8. Gregg, John N.; Naito, Donn, Canister guard.
  9. Nguyen, Son T.; Sangam, Kedarnath; Schwartz, Miriam; Choi, Kenric; Bhat, Sanjay; Narwankar, Pravin K.; Kher, Shreyas; Sharangapani, Rahul; Muthukrishnan, Shankar; Deaton, Paul, Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system.
  10. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus and method for atomic layer deposition.
  11. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus for atomic layer deposition.
  12. Birtcher,Charles Michael; Dunning,Richard J.; Clark,Robert Daniel; Hochberg,Arthur Kenneth; Steidl,Thomas Andrew, Method and vessel for the delivery of precursor materials.
  13. Myo, Nyi Oo; Cho, Kenric; Kher, Shreyas; Narwankar, Pravin; Poppe, Steve; Metzner, Craig R.; Deaten, Paul, Methods for atomic layer deposition of hafnium-containing high-K dielectric materials.
  14. Cao, Wei; Chung, Hua; Ku, Vincent W.; Chen, Ling, Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor.
  15. Cao, Wei; Chung, Hua; Ku, Vincent; Chen, Ling, Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor.
  16. Birtcher, Charles Michael; Steidl, Thomas Andrew, Solid source container with inlet plenum.
  17. Birtcher, Charles Michael; Steidl, Thomas Andrew; Lei, Xinjian, Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel.
  18. Steidl, Thomas Andrew; Birtcher, Charles Michael; Lei, Xinjian, Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel.
  19. Birtcher, Charles Michael; Steidl, Thomas Andrew, Splashguard for high flow vacuum bubbler vessel.
  20. Birtcher, Charles Michael; Steidl, Thomas Andrew, Splashguard for high flow vacuum bubbler vessel.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로