[특허]Freezing cycle apparatus

Freezing cycle apparatus 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	F25B-001/00 F25B-049/00
출원번호	US-0799459 (2001-03-06)
우선권정보	JP-0077831 (2000-03-15)
발명자 / 주소	Takano, Yoshiaki Izawa, Satoshi
출원인 / 주소	Denso Corporation
대리인 / 주소	Harness, Dickey & Pierce, PLC
인용정보	피인용 횟수 : 22 인용 특허 : 4

초록 ▼

대표청구항 ▼

In a freezing cycle apparatus that switches between a cooling mode and a heating mode, wherein a low-pressure refrigerant is evaporated in an evaporator 18 for cooling the air during a cooling mode and a hot gas refrigerant is introduced from the discharge side of a compressor 10 directly into the evaporator 18. A variable displacement type compressor capable of varying the displacement is used as the compressor 10. The displacement of the compressor 10 is controlled such that the refrigerant flow rate in the cooling or heating cycle is a predetermined target flow rate during the cooling and the heating mode. on thereof are prevented from destroying; playing with a refrigerator by children and so on are avoidable; the foods can be further stably stored; a labor time for house holding is reduced; an energy saving capability is enhanced; and a food value is maintained to make a person ingest a higher food value.

이 특허에 인용된 특허 (4)

Sayo Kosaku (Katsuta JPX) Tani Seijiro (Ibaraki JPX) Miyamoto Seigo (Katsuta JPX) Emi Kenji (Katsuta JPX) Fukushima Toshihiko (Ibaraki JPX), Apparatus for measuring refrigerant flow rate in refrigeration cycle.
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Abersfelder Guenter (Sindelfingen DEX) Maue Juergen (Leinfelden-Echterdingen DEX) Wertenbach Juergen (Fellbach DEX), Method for operating an air conditioning cooling system for vehicles and a cooling system for carrying out the method.
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Kishita Hiroshi,JPX ; Inoue Yoshimitsu,JPX ; Ito Hajime,JPX ; Takano Yoshiaki,JPX ; Izawa Satoshi,JPX ; Wakisaka Takeshi,JPX, Refrigeration cycle apparatus.
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Hanson Jay L. (Bloomington MN) Nixon James E. (Woodbury MN) Herrig Doyle G. (Elko MN) Ladendorf Gerald J. (Bloomington MN), Refrigeration unit and method of operating same.
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이 특허를 인용한 특허 (22)

Takano, Yoshiaki; Izawa, Satoshi; Kurata, Shun, Air conditioner.
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Takano, Yoshiaki; Izawa, Satoshi; Kurata, Shun, Air conditioner.
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Wakuda, Susumu, Air conditioning system.
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Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution.
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Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Capacitively coupled plasma reactor having very agile wafer temperature control.
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Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Capacitively coupled plasma reactor having very agile wafer temperature control.
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Yoshida, Satohisa; Yamashita, Koji; Ohya, Shigeki; Umebayashi, Makoto, Compressor system and vehicle air conditioning system having the same.
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Furukawa, Tomofumi; Murao, Hiromi; Kobayashi, Kazuhira, Control device for motor fan of vehicle.
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Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, Williams W.; Zubillaga, Glenn W.; Millian, Isaac, Method for agile workpiece temperature control in a plasma reactor using a thermal model.
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Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor.
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Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor.
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Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of operating a capacitively coupled plasma reactor with dual temperature control loops.
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Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of processing a workpiece in a plasma reactor using feed forward thermal control.
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Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control.
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Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Plasma reactor with a multiple zone thermal control feed forward control apparatus.
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Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Plasma reactor with a multiple zone thermal control feed forward control apparatus.
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Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes.
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Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes.
상세보기
Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops.
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Ueda, Mitsuo; Yoshida, Makoto; Yakumaru, Yuuichi, Refrigeration cycle apparatus.
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Kurata,Shun; Takano,Yoshiaki; Izawa,Satoshi, Refrigeration cycle system.
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Fukumi, Shigenobu; Hayashi, Hiroyuki, Vehicle air conditioner with variable displacement compressor.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Freezing cycle apparatus 원문보기