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An apparatus (1) for use with a container (100) for storing a substance. Typically, the substance is a volatile liquid, such as hydrocarbon fuels, alcohol or distilled liquids. The apparatus (1) acts to prevent filling and evaporative losses of the liquid, minimise internal corrosion of the containe

An apparatus (1) for use with a container (100) for storing a substance. Typically, the substance is a volatile liquid, such as hydrocarbon fuels, alcohol or distilled liquids. The apparatus (1) acts to prevent filling and evaporative losses of the liquid, minimise internal corrosion of the container (100) and prevent humidification of the liquid. The apparatus (1) employs a bladder (3a, 3b) inside the container (100). The bladder (3a, 3b) is filled with air. A pressure control unit (7) is provided to control the supply of air to the bladder (3a, 3b) such that the pressure in the bladder (3a, 3b) is maintained at or above a selected level, being the vapour pressure inside the container (100). The bladder (3a, 3b) is maintained in an inflated condition such that it fills the space above the substance in the container (100).

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An apparatus (1) for use with a container (100) for storing a substance. Typically, the substance is a volatile liquid, such as hydrocarbon fuels, alcohol or distilled liquids. The apparatus (1) acts to prevent filling and evaporative losses of the liquid, minimise internal corrosion of the containe

An apparatus (1) for use with a container (100) for storing a substance. Typically, the substance is a volatile liquid, such as hydrocarbon fuels, alcohol or distilled liquids. The apparatus (1) acts to prevent filling and evaporative losses of the liquid, minimise internal corrosion of the container (100) and prevent humidification of the liquid. The apparatus (1) employs a bladder (3a, 3b) inside the container (100). The bladder (3a, 3b) is filled with air. A pressure control unit (7) is provided to control the supply of air to the bladder (3a, 3b) such that the pressure in the bladder (3a, 3b) is maintained at or above a selected level, being the vapour pressure inside the container (100). The bladder (3a, 3b) is maintained in an inflated condition such that it fills the space above the substance in the container (100). 0.22; US-5383247, 19950100, Nickel, 015/250.04; US-5418567, 19950500, Boers et al.; US-5518553, 19960500, Moulder, 134/022.18 ially the same chemical composition. 15. A method of cleaning a silicon wafer to remove a contaminant, said method comprising the sequential steps of: immersing the wafer in a first chemical megasonic bath for a first sub-cycle lasting for a first period of time; immersing the wafer in a second chemical megasonic bath for a second sub-cycle lasting a second period of time, said first and second sub-cycles comprising a single chemical cycle; dipping the wafer in a solution of hydrofluoric acid and water; immersing the wafer in a third chemical megasonic bath for a chemical cycle; dipping the wafer in a solution of sulfuric acid and hydrogen peroxide; and immersing the wafer in a fourth chemical megasonic bath for a chemical cycle. 16. The method of claim 15 wherein the first, second, and third chemical megasonic baths are a solution of water, ammonium hydroxide and hydrogen peroxide, and the fourth chemical megasonic bath is a solution of water, hydrochloric acid, and hydrogen peroxide. 17. The method of claim 15 wherein the contaminant and the first chemical megasonic bath have approximately matching pH values. 18. The method of claim 15 wherein the first and second chemical megasonic baths have substantially the same chemical composition.