IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0747095
(2000-12-22)
|
발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
5 인용 특허 :
26 |
초록
▼
A heat-formable mirror comprising a flat substrate capable of plastic flow upon application of heat and a sputter-deposited coating formed on the surface of the substrate. From the substrate outwardly, the coating comprises a transparent amorphous layer and a reflective layer comprising contiguous f
A heat-formable mirror comprising a flat substrate capable of plastic flow upon application of heat and a sputter-deposited coating formed on the surface of the substrate. From the substrate outwardly, the coating comprises a transparent amorphous layer and a reflective layer comprising contiguous first and second different metal films. The first metal film, positioned nearer the substrate than the second metal film, is a reflective metal film, and the second metal film comprises a protective film that is less reflective than the reflective metal film, the second metal film being of niobium, tungsten, tantalum, iron and nickel and being present in a thickness sufficient to protect the first metal film and avoid significant reduction of reflectance during heat forming of the mirror.
대표청구항
▼
1. A heat formable mirror comprising a flat substrate capable of plastic deformation upon application of heat, and a sputter-deposited coating formed on a surface of the substrate, the coating comprising, from the substrate outwardly, a transparent amorphous layer and a reflective layer comprising c
1. A heat formable mirror comprising a flat substrate capable of plastic deformation upon application of heat, and a sputter-deposited coating formed on a surface of the substrate, the coating comprising, from the substrate outwardly, a transparent amorphous layer and a reflective layer comprising contiguous first and second different metal films, the first metal film being a reflective metal film positioned nearer the substrate than the second metal film, and the second metal film comprising a protective film less reflective than the reflective metal film and selected from the group consisting of niobium, tungsten, tantalum, iron and nickel, the reflective metal film being of a thickness providing said mirror with a reflectivity of at least 50% and said second metal film being present in a thickness sufficient to protect said first metal film and to avoid significant reduction of reflectance during heat forming of said mirror. 2. The heat formable mirror of claim 1 including a durable protective layer positioned further from the substrate than the second metal film. 3. The heat formable mirror of claim 2 wherein the durable protective layer comprises silicon nitride, aluminum oxide or silicon oxide. 4. The heat formable mirror of claim 1 wherein said first and second metal films comprise aluminum and niobium, respectively. 5. The heat formable mirror of claim 1 wherein said amorphous layer comprises an oxide or a nitride having a thickness range of from 250 to 400 .ANG.. 6. The heat formable mirror of claim 5 wherein said amorphous layer comprises silicon nitride, titanium nitride or tin oxide. 7. The heat formable mirror of any one of claims 1 through 6 wherein said substrate is glass and wherein said amorphous layer is silicon nitride. 8. A heat formable mirror comprising a flat glass substrate and a sputter-deposited coating formed on a surface of the substrate, the heat formable mirror being formable at elevated temperatures without significant damage to the coating, the coating comprising, from the substrate outwardly: a. an amorphous dielectric film comprising silicon nitride at a thickness ranging from 250 .ANG. to 400 .ANG.; b. a reflective layer comprising contiguous first and second different metal films, the first metal film being selected from the group consisting of aluminum, titanium, zirconium, molybdenum, copper, hafnium, stainless steel and gold and combinations thereof, and positioned nearer the substrate than the second metal film, and the second metal film comprising niobium at a thickness in the range of 50 .ANG. to 400 .ANG.. 9. The heat formable mirror of claim 8 including a durable protective layer of silicon nitride positioned further from the substrate than the niobium film and providing oxygen permeation inhibition as to prevent the reflectance of the heat formable mirror from decreasing upon heat bending to less than 50%. 10. A heat formable mirror comprising a flat glass substrate and a sputter-deposited coating formed on a surface of the substrate, the coating comprising, from the substrate outwardly, a transparent amorphous layer and a reflective layer comprising contiguous aluminum and niobium films with the aluminum film being positioned nearer the sub rate than the niobium film, said aluminum film being of a thickness providing said mirror with a reflectivity of at least 50% and said niobium film ranging in thickness from 50 .ANG. to 400 .ANG.. 11. The heat formable mirror of claim 10 wherein said amorphous layer comprises silicon nitride at a thickness of from 250 .ANG. to 400 .ANG..
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