초록 ▼

The invention relates to a valve for admitting atmospheric air into the waste pipe system in response to pressure reduction in the system for protecting the water traps in the system and to prevent atmospheric discharge of contaminated air from the waste pipe system. The valve consists of a valve bo

The invention relates to a valve for admitting atmospheric air into the waste pipe system in response to pressure reduction in the system for protecting the water traps in the system and to prevent atmospheric discharge of contaminated air from the waste pipe system. The valve consists of a valve body having at least two air inlet openings in communication with the atmospheric air, each of the openings alternating with a passage towards the waste pipe system, the openings and passages being equally distributed within the valve housing viewed in horizontal cross-section about the valve seat level. The valve member resting, in a normal closed position, on the valve seat separating the openings from the passages and having a substantially butterfly shaped sealing surface for a valve embodiment having two diametrically opposed openings situated perpendicular respectively to two diametrically opposed passages.

대표청구항 ▼

The invention relates to a valve for admitting atmospheric air into the waste pipe system in response to pressure reduction in the system for protecting the water traps in the system and to prevent atmospheric discharge of contaminated air from the waste pipe system. The valve consists of a valve bo

The invention relates to a valve for admitting atmospheric air into the waste pipe system in response to pressure reduction in the system for protecting the water traps in the system and to prevent atmospheric discharge of contaminated air from the waste pipe system. The valve consists of a valve body having at least two air inlet openings in communication with the atmospheric air, each of the openings alternating with a passage towards the waste pipe system, the openings and passages being equally distributed within the valve housing viewed in horizontal cross-section about the valve seat level. The valve member resting, in a normal closed position, on the valve seat separating the openings from the passages and having a substantially butterfly shaped sealing surface for a valve embodiment having two diametrically opposed openings situated perpendicular respectively to two diametrically opposed passages. ubstrates from the waiting portion to the processing portion, and wherein the lifter supports the substrates placed in the processing portion and lowers the substrates thereby moving the substrates from the processing portion to the waiting portion, and wherein the substrate processing portion is provided with a substrate holding device configured to hold the substrates while the structures are being treated and a first covering member defining at least part of a processing chamber in which the substrate holding device is disposed, and wherein the substrate waiting portion and the substrate lifter are disposed below the substrate holding device, and substrates are transferred between the substrate holding device and a substrate supporting member. 2. The substrate processing apparatus according to claim 1 further comprising a substrate container carrier configured to carry a substrate container into the substrate waiting portion and to carry the substrate container from the substrate waiting portion, wherein the substrates are contained in the substrate container while the substrates are standing by at the waiting portion. 3. The substrate processing apparatus according to claim 1 further comprising a shock absorber preventing application of an excessive load to the substrates when the substrates are raised and brought into contact with the substrate holding device by the substrate lifter. 4. The substrate processing apparatus according to claim 3, wherein the shock absorber comprises: a cylinder actuator that supports the substrate supporting member of the substrate lifter, the cylinder actuator having a relief mechanism; a load sensor that measures a load applied to the substrates; and a controller that actuates the relief mechanism to discharge a working medium for operating the cylinder actuator from the cylinder actuator when the load measured by the load sensor exceeds a threshold. 5. The substrate processing apparatus according to claim 1, wherein the covering member is capable of moving between a first position to define the processing chamber surrounding the substrate holding device and a second position apart from the substrate holding device to expose the substrate holding device. 6. The substrate processing apparatus according to claim 1 further comprising a liquid supplying portion configured to supply a processing liquid into the processing chamber. 7. The substrate processing apparatus according to claim 6, wherein the covering member is capable of moving between a first position to define the processing chamber surrounding the substrate holding device and a second position apart from the substrate holding device to expose the substrate holding device; and the covering member is provided with a drip preventing device configured to prevent dripping of the processing liquid when the covering member is moved from the first position to the second position. 8. The substrate processing apparatus according to claim 7 further comprising a wall with which the covering member is engaged to define at least part of the processing chamber; wherein the drip preventing device includes a processing liquid receiving element configured to receive the processing liquid, and a pressing element configured to press the processing liquid receiving element against the wall when the covering means is placed at the first position. 9. The substrate processing apparatus according to claim 1, wherein the substrate processing portion is further provided with a second covering member defining at least part of a second processing chamber in the first processing chamber defined by the first covering member, the second covering member being capable of moving between a first position to surround the substrate holding device in the first processing chamber and a second position outside the first processing chamber. 10. The substrate processing apparatus according to claim 1, wherein the substrate holding device is a rotor. 11. T