Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B05D-005/12
B05D-003/00
C25D-005/02
C25D-005/18
C25D-003/38
출원번호
US-0740701
(2000-12-18)
발명자
/ 주소
Basol, Bulent
출원인 / 주소
Nutool, Inc.
대리인 / 주소
Pillsbury Winthrop LLP
인용정보
피인용 횟수 :
66인용 특허 :
6
초록▼
The present invention relates to methods and apparatus for plating a conductive material on a substrate surface in a highly desirable manner. The invention removes at least one additive adsorbed on the top portion of the workpiece more than at least one additive disposed on a cavity portion, thereby
The present invention relates to methods and apparatus for plating a conductive material on a substrate surface in a highly desirable manner. The invention removes at least one additive adsorbed on the top portion of the workpiece more than at least one additive disposed on a cavity portion, thereby allowing plating of the conductive material take place before the additive fully re-adsorbs onto the top portion and causing greater plating of the cavity portion relative to the top portion.
대표청구항▼
The present invention relates to methods and apparatus for plating a conductive material on a substrate surface in a highly desirable manner. The invention removes at least one additive adsorbed on the top portion of the workpiece more than at least one additive disposed on a cavity portion, thereby
The present invention relates to methods and apparatus for plating a conductive material on a substrate surface in a highly desirable manner. The invention removes at least one additive adsorbed on the top portion of the workpiece more than at least one additive disposed on a cavity portion, thereby allowing plating of the conductive material take place before the additive fully re-adsorbs onto the top portion and causing greater plating of the cavity portion relative to the top portion. brane-forming amphipathic lipid that does not tend to form micelle structures, wherein the solid particles have mean diameters between about 0.05 μm and 10 μm. 2. A method according to claim 1, wherein the pharmaceutical composition is thermally sterilized prior to administration. 3. A method according to claim 1 wherein the patient has uncontrolled cell proliferation, the camptothecin serving to control the cell proliferation. 4. A method according to claim 1 wherein the patient has cancer, the camptothecin serving to treat the cancer. 5. A method according to claim 1 wherein the camptothecin is selected from the group consisting of 9-nitro-20(S)-camptothecin, 9-amino-20(S)-camptothecin, 9-methyl-camptothecin, 9-chloro-camptothecin, 9-flouro-camptothecin, 7-ethyl camptothecin, 10-methyl-camptothecin, 10-chloro-camptothecin, 10-bromo-camptothecin, 10-fluoro-camptothecin, 9-methoxy-camptothecin, 11-fluoro-camptothecin, 7-ethyl-1 0-hydroxy camptothecin, 10,11 -methylenedioxy camptothecin, and 10,11-ethylenedioxy camptothecin, and 7-(4-methylpiperazinomethylene)-10,11-methylenedioxy camptothecin. 6. A method according to claim 1 wherein the camptothecin is selected from the group consisting of 9-nitro-20(S)-camptothecin, 9-amino-20(S)-camptothecin, 7-ethyl-10-(4-(1-piperdino)-1-piperdino)-carbonyloxy-camptothecin, 7-ethyl-10-hydroxy-20(S)-camptothecin, 10,11-methylenedioxy-20(S)-camptothecin, 9-chloro-20(S)-camptothecin, 9-bromo-20(S)-camptothecin, 9-hydroxy-20(S)-camptothecin, and 11-hydroxy-20(S)-camptothecin. 7. A method according to claim 1 wherein the camptothecin is 9-nitro-20(S)-camptothecin. 8. A method according to claim 1 wherein the pharmaceutical composition has a pH less than 7. 9. A method according to claim 1 wherein the pharmaceutical composition has a pH less than 6. 10. A method according to claim 1 wherein the pharmaceutical composition has a pH between 5 and 6. 11. A method according to claim 1 wherein the pharmaceutical composition comprises an isotonic solution. 12. A method according to claim 1 wherein the pharmaceutical composition comprises mannitol or trehalose. 13. A method according to claim 1 wherein the composition has been thermally sterilized. 14. A method according to claim 1 wherein the composition has been thermally sterilized by heating to at least 121° C. for at least 15 minutes. 15. A method according to claim 1 wherein the membrane-forming amphipathic lipid comprises a phospholipid. 16. A method according to claim 15 wherein the phospholipid is selected from the group consisting of saturated phospholipids, unsaturated phospholipids, synthetic phospholipids, natural phospholipids, and combinations thereof. 17. A method according to claim 15 wherein the phospholipid is selected from the group consisting of natural and synthetic lipids, hen egg-derived phospholipid, egg phospholipid, purified egg phospholipid, soy phospholipid, dimyristoyl lecithin, didodecanoyl lecithin, dioeoyl lecithin, dilinoeoyl lecithin, alpha-palmito-beta-oleoyl lecithin, alpha-palmitoyl-beta-linoleoyl lecithin, alpha-oleoyl-beta-palmitoyl lecithin, diarachidonyl lecithin, alpha-palmito-beta-myristoyl lecithin, dimyristoyl phosphatidic acid, dipalmitoyl phosphatidic acid, distearoyl phosphatidic acid, phosphatidyl serine, phosphatidyl inositol, dimyristoyl phosphatidyl glycerol, dipalmitoyl phosphatidyl glycerol, dioctadecanoyl phosphatidyl ethanolamine, dioleoyl phosphatidyl ethanolamine, dihexadecyl phosphatidyl ethanolamine, dilauryl phosphatidyl ethanolamine, dimyristoyl phosphatidyl ethanolamine and dipalmitoyl phosphatidyl ethanolamine. 18. A method according to claim 15 wherein the phospholipid comprises egg phospholipid. 19. A method according to claim 1 wherein the outer layer further comprises cholesterol. 20. A method according to claim 1 wherein the camptothecin is present in amounts of up to about 25% w/w. 21. A method according to claim 1 wherein the camptothecin is present in amounts of from about 0.0
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (6)
Taylor E. Jennings ; Sun Jenny J. ; Zhou Chengdong, Electrodeposition of metals in small recesses using modulated electric fields.
Tsai Ming-Hsing,TWX ; Tsai Wen-Jye,TWX ; Shue Shau-Lin,TWX ; Yu Chen-Hua,TWX, Method for improvement of gap filling capability of electrochemical deposition of copper.
Ashjaee,Jalal; Nagorski,Boguslaw; Basol,Bulent M.; Talieh,Homayoun; Uzoh,Cyprian, Apparatus for processing surface of workpiece with small electrodes and surface contacts.
Mayer, Steven T.; Stowell, Marshall R.; Drewery, John S.; Hill, Richard S.; Archer, Timothy M.; Kepten, Avishai, Selective electrochemical accelerator removal.
Mayer, Steven T.; Rea, Mark L.; Hill, Richard S.; Kepten, Avishai; Stowell, R. Marshall; Webb, Eric G., Topography reduction and control by selective accelerator removal.
Mayer, Steven T.; Rea, Mark L.; Hill, Richard S.; Kepten, Avishai; Stowell, R. Marshall; Webb, Eric G., Topography reduction and control by selective accelerator removal.
Uzoh, Cyprian E.; Basol, Bulent M., Workpiece surface influencing device designs for electrochemical mechanical processing and method of using the same.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.