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Apparatus and method for endpoint control and plasma monitoring

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-007/66
출원번호 US-0036217 (1998-03-06)
발명자 / 주소
  • Birang, Manush
  • Kolte, Gregory L.
  • Doyle, Terry Lee
  • Johansson, Nils
  • Luscher, Paul E.
  • Poslavsky, Leonid
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Janah and Associates
인용정보 피인용 횟수 : 12  인용 특허 : 63

초록

A substrate processing system having a bi-directional interface and concomitant communication protocol to allow a controller to communicate with an external endpoint system is disclosed. More specifically, the substrate processing system comprises a controller and an endpoint detection system that a

대표청구항

A substrate processing system having a bi-directional interface and concomitant communication protocol to allow a controller to communicate with an external endpoint system is disclosed. More specifically, the substrate processing system comprises a controller and an endpoint detection system that a

이 특허에 인용된 특허 (63)

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  31. Ebbing Peter (Los Altos CA) Birang Manoocher (Santa Clara CA), Method and apparatus for endpoint detection in a semiconductor wafer etching system.
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  36. Bobel Friedrich (Uttenreuth DEX) Bauer Norbert (Erlangen DEX), Method and arrangement for determining the layer-thickness and the substrate temperature during coating.
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  1. Ellis, Raymond Walter; Pendleton, Mark Theodore; Baylis, Charles Merritt, Apparatus and method for web-based tool management.
  2. Ellis, Ray; Wagner, Evzen, Automated job management.
  3. Ellis, Raymond Walter; Pendleton, Mark Theodore; Baylis, Charles Merritt, Automated tool management in a multi-protocol environment.
  4. Ellis,Raymond Walter; Pendleton,Mark Theodore; Baylis,Charles Merritt, Automated tool management in a multi-protocol environment.
  5. Dunkle, Mark Vandevert, Communications interface database for electronic diagnostic apparatus.
  6. Taraboukhine, Mikhail, Full spectrum adaptive filtering (FSAF) for low open area endpoint detection.
  7. Chen, Yan; Vuong, Vi; Komarov, Serguei, Method of endpoint detection of plasma etching process using multivariate analysis.
  8. Baylis, Charles M.; Ellis, Raymond W.; Guckert, Toni; Yoas, Timothy, Multi-protocol multi-client equipment server.
  9. Bayliss, Charles M.; Ellis, Raymond W.; Guckert, Toni; Yoas, Timothy, Multi-protocol multi-client equipment server.
  10. Shirakawa, Makoto, Substrate processing apparatus and non-transitory computer-readable recording medium.
  11. Lee,Yuk Tong; Lin,Chun Ching, System and method for acquiring semiconductor process status information.
  12. Cordova, Sherry; Doyle, Terry L.; Kroupnova, Natalia; Lobovski, Evgueni; Louneva, Inna; Lyon, Richard C.; Nishimura, Yukari; Nolet, Clari; Reiss, Terry; Toh, Woon Young; Wilmer, Michael E., Wafer fabrication data acquisition and management systems.
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